公开(公告)号：US20180113052A1

公开(公告)日：2018-04-26

申请号：US15785690

申请日：2017-10-17

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： Maximilian SCHMITT ,  Bodo KÜHN

IPC分类号： G01M11/00 ,  G01M11/02

摘要： A method for determining the refractive index profile of a preform is provided. The method involves: preparing the measured deflection angle distribution, including an extreme value determination of the deflection angle distribution, to obtain a prepared deflection angle distribution; transforming the prepared deflection angle distribution into a prepared refractive-index profile; evaluating the prepared refractive-index profile for the fixation of orientation values for the layer radius and for the layer refractive index of a hypothetical refractive index profile; generating a simulated deflection angle distribution on the basis of the hypothetical refractive-index profile with the orientation values, and transforming the deflection angle distribution into a simulated refractive-index profile; fitting the simulated refractive index profile to the prepared refractive-index profile by iterative adaptation of parameters to obtain a fitted, simulated refractive-index profile which is defined by adapted parameters, and obtaining the refractive index profile as the hypothetical refractive-index profile with the adapted parameters.

公开(公告)号：US20160090319A1

公开(公告)日：2016-03-31

申请号：US14864103

申请日：2015-09-24

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： Achim HOFMANN ,  Thomas KAYSER ,  Matthias OTTER ,  Bodo KÜHN

IPC分类号： C03B19/06 ,  C03C3/06

CPC分类号： C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B2201/02 ,  C03C3/06 ,  C03C11/00 ,  C03C12/00 ,  C03C2201/02

摘要： A method for producing synthetic quartz glass by fusion of SiO2 granulate involves synthesizing amorphous SiO2 primary particles, granulating the amorphous SiO2 primary particles to form an open-pore SiO2 granulate, sintering the open-pore SiO2 granulate by heating in a sintering atmosphere at a sintering temperature and for a sintering period to form a densified SiO2 granulate, and melting the densified SiO2 granulate at a melting temperature to form the synthetic quartz glass. To provide an inexpensive production of low-bubble transparent components of quartz glass despite the use of still open-pore SiO2 granulate, the sintering atmosphere, sintering temperature and sintering duration are adjusted such that the densified SiO2 granulate still comprises open pores but manifests a material-specific infrared transmission T1700 at a wavelength of 1700 nm. This transmission is in the range of 50-95% of the infrared transmission T1700 of quartz glass granules of the same material.

摘要翻译： 通过SiO 2颗粒熔融制造合成石英玻璃的方法包括合成无定形SiO 2一次颗粒，造粒无定形SiO 2一次颗粒以形成开孔SiO 2颗粒，通过在烧结气氛中加热烧结开孔SiO 2颗粒 温度和烧结时间以形成致密化的SiO 2颗粒，并且在熔融温度下熔化致密的SiO 2颗粒以形成合成石英玻璃。 尽管使用仍然是开孔的SiO 2颗粒，为了提供石英玻璃的低气泡透明组分的廉价生产，调节烧结气氛，烧结温度和烧结持续时间，使得致密的SiO 2颗粒仍然包括开孔，但表现出一种材料 特定的红外透射T1700，波长为1700nm。 该透射率在相同材料的石英玻璃颗粒的红外透射率T1700的50-95％的范围内。

公开(公告)号：US20180057391A1

公开(公告)日：2018-03-01

申请号：US15797061

申请日：2017-10-30

申请人： Heraeus Quarzglas GmbH & Co. KG

发明人： Bodo KÜHN

IPC分类号： C03C3/06 ,  G02B1/00 ,  C03B32/02 ,  G02B1/02 ,  C03B32/00 ,  C03B19/14 ,  C03C4/04

CPC分类号： C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

摘要： An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.