利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.027 秒)

    Reduced mist laser shock peening
    3.
    发明授权
    Reduced mist laser shock peening 失效
    减少雾化激光冲击硬化

    公开(公告)号：US06713716B1

    公开(公告)日：2004-03-30

    申请号：US10448966

    申请日：2003-05-30

    申请人： Wayne Lee Lawrence ,  Paul Michael Perozek

    发明人： Wayne Lee Lawrence ,  Paul Michael Perozek

    IPC分类号： B23K2600

    CPC分类号： B23K26/146 ,  B23K26/356 ,  B23K2101/001 ,  C21D10/005

    摘要： A laser unit includes a laser beam source for generating a laser beam along a laser beam centerline. A beam tube surrounds at least a portion of the beam centerline. A beam aperture is located at an exit of the tube. A final beam optical lens is mounted within the tube upstream of the aperture. A gas purging means flows purge gas into the tube between the lens and the aperture. A converging section of the tube is located between the lens and the aperture. At least one telescoping section in the tube is located between the lens and the aperture in the converging section of the tube. The lens has a focal number less than 8 and may be less than 7 and down to about 5. A gas knife located between the aperture and the focal point of the lens is used for flowing a large volume of clearing gas across the laser beam between the aperture and the focal point.

    摘要翻译： 激光单元包括用于沿着激光束中心线产生激光束的激光束源。 光束管围绕光束中心线的至少一部分。 光束孔位于管的出口处。 最终光束透镜安装在孔的上游的管内。 气体吹扫装置将净化气体流入透镜和孔径之间的管中。 管的会聚部分位于透镜和孔之间。 管中的至少一个伸缩部分位于透镜和管的会聚部分中的孔之间。 透镜具有小于8的焦点数，并且可以小于7并且低至约5.位于透镜的孔和焦点之间的气刀用于使大体积的清除气体跨越激光束在 光圈和焦点。

    Continuous motion laser shock peening
    4.
    发明授权
    Continuous motion laser shock peening 有权
    连续运动激光冲击硬化

    公开(公告)号：US08319150B2

    公开(公告)日：2012-11-27

    申请号：US10887634

    申请日：2004-07-09

    申请人： Wayne Lee Lawrence ,  Paul Michael Perozek ,  Mark Samuel Bailey

    发明人： Wayne Lee Lawrence ,  Paul Michael Perozek ,  Mark Samuel Bailey

    IPC分类号： B23K26/00 ,  B23K26/02 ,  B23K26/08 ,  H01S3/00 ,  C21D1/09 ,  C22F3/00

    CPC分类号： B23K26/0661 ,  B23K26/03 ,  B23K26/066 ,  B23K26/08 ,  B23K26/356 ,  B23K2101/001 ,  C21D10/005 ,  F01D5/286 ,  F05D2230/90

    摘要： A continuous motion laser shock peening apparatus and method for laser shock peening a workpiece. A laser controller modulates and fires a laser beam from a laser unit. A motion controller is controllably connected to a manipulator and to the laser controller to fire the laser beam based on axis position feedback from a speed control of the motion controller. The laser controller has a standby mode for flashing a laser flash lamp at a flash rate without triggering the laser beam and a firing mode that triggers and fires the laser beam in laser beam pulses. The laser controller includes a synchronizing means for synchronizing a triggering signal provided to the laser interface controller by the computerized motion controller to fire the laser beam pulses and the flash rate substantially at a time when the laser beam pulses are to be generated.

    摘要翻译： 一种用于激光冲击硬化工件的连续运动激光冲击硬化设备和方法。 激光控制器调制并激发来自激光单元的激光束。 运动控制器可控地连接到操纵器和激光控制器，以基于来自运动控制器的速度控制的轴位置反馈来激发激光束。 激光控制器具有用于以闪光速率闪烁激光闪光灯而不触发激光束的待机模式，并且以激光束脉冲触发和激发激光束的点火模式。 该激光控制器包括同步装置，用于通过计算机运动控制器同步提供给激光接口控制器的触发信号，以在激光束脉冲产生时基本上激发激光束脉冲和闪光速率。

    Reducing electromagnetic feedback during laser shock peening
    5.
    发明授权
    Reducing electromagnetic feedback during laser shock peening 失效
    在激光冲击硬化过程中减少电磁反馈

    公开(公告)号：US06917012B2

    公开(公告)日：2005-07-12

    申请号：US10613501

    申请日：2003-07-03

    申请人： Paul Michael Perozek ,  Wayne Lee Lawrence

    发明人： Paul Michael Perozek ,  Wayne Lee Lawrence

    IPC分类号： B23K26/06 ,  C21D10/00

    CPC分类号： B23K26/0652 ,  B23K26/064 ,  B23K26/0643 ,  C21D10/005

    摘要： A laser shock peening apparatus includes a laser unit for generating at least one laser beam aimed at a laser shock peening area and an anti-feedback means for preventing electromagnetic radiation reflections from the target area from entering the laser unit during laser shock peening and the anti-feedback means is located between the laser unit and a final focusing lens. The anti-feedback means may include an optical isolator at an output of the laser unit such as a faraday isolator. Alternative optical isolators may include thin film polarizers, glan prism polarizers, independent pig tailed optical isolators, mirrors with enhanced P or S polarization coatings. The laser unit may include an oscillator and a final amplifier and the output of the laser unit located after the final amplifier.

    摘要翻译： 激光冲击喷丸装置包括：激光单元，用于产生至少一个针对激光冲击硬化区域的激光束;以及防反射装置，用于防止来自目标区域的电磁辐射反射在激光冲击喷丸处理期间进入激光单元， 反馈装置位于激光单元和最终聚焦透镜之间。 反馈装置可以包括在诸如法拉第隔离器的激光单元的输出处的光隔离器。 替代的光隔离器可以包括薄膜偏振器，幻影棱镜偏振器，独立的猪尾光学隔离器，具有增强的P或S偏振涂层的镜子。 激光单元可以包括振荡器和最终放大器以及位于最终放大器之后的激光单元的输出。