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    Substrate handler, lithographic apparatus and device manufacturing method
    2.
    发明申请
    Substrate handler, lithographic apparatus and device manufacturing method 有权
    基板处理器，光刻设备和器件制造方法

    公开(公告)号：US20070008512A1

    公开(公告)日：2007-01-11

    申请号：US11175037

    申请日：2005-07-06

    申请人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Bernardus Luttikhuis ,  Petrus Vosters ,  Johannes Hazenberg ,  Aart Van Beuzekom

    发明人： Harmen Van Der Schoot ,  Hernes Jacobs ,  Bernardus Luttikhuis ,  Petrus Vosters ,  Johannes Hazenberg ,  Aart Van Beuzekom

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70875 ,  G03F7/7075

    摘要： Embodiments of the invention relates to a substrate handler for handling a substrate, including a conditioning device for conditioning the substrate. In an embodiment, the substrate handler includes a displacing device configured to displace the substrate in a direction substantially parallel to the support surface, wherein the displacing device is configured to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. According to another embodiment of the invention, the substrate handler includes a float device for providing an air bed above a support surface of the substrate handler, the substrate handler being configured to support the substrate on an air bed during conditioning of the substrate.

    摘要翻译： 本发明的实施例涉及一种用于处理基板的基板处理器，包括用于调节基板的调节装置。 在一个实施例中，衬底处理器包括移位装置，其配置成在基本上平行于支撑表面的方向上移动衬底，其中，移位装置构造成在调节过程期间将衬底从一个调节位置移位到一个或多个其他调节 职位 根据本发明的另一实施例，衬底处理器包括用于在衬底处理器的支撑表面上方提供空气床的浮动装置，衬底处理器被配置为在衬底调节期间将衬底支撑在空气床上。

    Lithographic apparatus and device manufacturing method
    4.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20060132734A1

    公开(公告)日：2006-06-22

    申请号：US11018928

    申请日：2004-12-22

    申请人： Bernardus Luttikhuis ,  Harmen Van Der Schoot ,  Petrus Vosters

    发明人： Bernardus Luttikhuis ,  Harmen Van Der Schoot ,  Petrus Vosters

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70991 ,  G03F7/70616 ,  G03F7/70733

    摘要： A lithographic method and apparatus comprises an illumination system that supplies a beam of radiation, a patterning device that patterns the beam, and a projection system that projects the patterned beam onto a target portion of a substrate. A metrology system is provided adjacent the projection system for aligning the substrate with the projection system. Two or more movable chucks are each arranged to support a substrate and move between a loading device and the projection system. The chucks are independently movable so that one substrate can be passed through the metrology system and patterned beam while the other substrates are moved between the loading system and projection system.

    摘要翻译： 光刻方法和装置包括提供辐射束的照明系统，对光束进行图案化的图案形成装置，以及将图案化光束投影到基板的目标部分上的投影系统。 在投影系统附近提供了一种计量系统，用于将基板与投影系统对准。 两个或更多个可移动卡盘分别布置成支撑基板并在加载装置和投影系统之间移动。 卡盘可独立移动，使得一个基板可以通过计量系统和图案化梁，同时其它基板在装载系统和投影系统之间移动。

    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
    5.
    发明申请
    Lithographic apparatus and device manufacturing method utilizing substrate stage compensating 有权
    利用基板台补偿的平版印刷设备和器件制造方法

    公开(公告)号：US20060279716A1

    公开(公告)日：2006-12-14

    申请号：US11147467

    申请日：2005-06-08

    申请人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

    发明人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

    IPC分类号： G03B27/42

    CPC分类号： G03F7/709

    摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.

    摘要翻译： 光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。 图案形成装置对辐射束进行图案化。 光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基​​板支撑驱动器 至少一个方向。 光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体 帧。

    Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table
    8.
    发明申请
    Lithographic apparatus and device manufacturing method utilizing a positioning device for positioning an object table 有权
    利用定位装置定位物体台的平版印刷设备和装置制造方法

    公开(公告)号：US20060221323A1

    公开(公告)日：2006-10-05

    申请号：US11098608

    申请日：2005-04-05

    申请人： Henrikus Cox ,  Sven Hol ,  Petrus Vosters

    发明人： Henrikus Cox ,  Sven Hol ,  Petrus Vosters

    IPC分类号： G03B27/58

    CPC分类号： G03F7/70791 ,  G03F7/70716 ,  G03F7/70758

    摘要： A positioning device for positioning an object table comprises a frame for supporting the object table in a first direction, a motor unit constructed and arranged for exerting a first force on the object table in a second direction substantially perpendicular to the first direction and a second force on the object table in a third direction substantially perpendicular to the first direction and the second direction. The motor unit comprises a first part constructed and arranged to co-operate with a second part for generating the first and second force, the first part being arranged on the object table, such that both the first force and the second force are directed substantially through the centre of gravity of the object table.

    摘要翻译： 用于定位物体台的定位装置包括：用于在第一方向上支撑物体台的框架;马达单元，被构造和布置成在基本上垂直于第一方向的第二方向上施加在物台上的第一力;以及第二力 在基本上垂直于第一方向和第二方向的第三方向上在物体台上。 马达单元包括构造和布置成与第二部分配合以产生第一和第二力的第一部分，第一部分布置在对象台上，使得第一力和第二力都基本上通过 对象表的重心。