公开(公告)号：US20060279716A1

公开(公告)日：2006-12-14

申请号：US11147467

申请日：2005-06-08

申请人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

发明人： Henrikus Cox ,  Hernes Jacobs ,  Harmen Van Der Schoot ,  Petrus Vosters

IPC分类号： G03B27/42

CPC分类号： G03F7/709

摘要： A lithographic apparatus has an illumination system that conditions a radiation beam and a patterning device support that supports a patterning device. The patterning device patterns the radiation beam. The lithographic apparatus also has a substrate support that supports a substrate, a machine frame that supports the substrate support, a projection system that projects the patterned beam onto a target portion of the substrate, and a substrate support drive that moves the substrate support in at least one direction. The lithographic apparatus can have a reaction mass, a balance mass, a base frame, where the substrate support drive is configured to generate a force in the at least one direction between the substrate support and the reaction mass, the balance mass, or the support frame.

摘要翻译： 光刻设备具有调节辐射束的照明系统和支持图案形成装置的图案形成装置支撑件。 图案形成装置对辐射束进行图案化。 光刻设备还具有支撑基板的基板支撑件，支撑基板支撑件的机架，将图案化的光束投影到基板的目标部分上的投影系统以及将基板支撑件移动到基​​板支撑驱动器 至少一个方向。 光刻设备可以具有反应物料，平衡物质，基底框架，其中基底支撑驱动器构造成在基底支撑体和反应块之间的至少一个方向上产生力，平衡块或支撑体 帧。

公开(公告)号：US20070052944A1

公开(公告)日：2007-03-08

申请号：US11593022

申请日：2006-11-06

申请人： Hernes Jacobs ,  Henrikus Cox ,  Petrus Vosters

发明人： Hernes Jacobs ,  Henrikus Cox ,  Petrus Vosters

IPC分类号： G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70766

摘要： A lithographic projection apparatus in which a balance mass is supported by a base frame using at least one supporting member which is coupled to both the base frame and balance mass. Free horizontal movement is provided by providing the supporting member with at least two pivot points.

公开(公告)号：US20050083496A1

公开(公告)日：2005-04-21

申请号：US10925148

申请日：2004-08-25

申请人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

发明人： Michel Dansberg ,  Sebastiaan Cornelissen ,  Henrikus Cox ,  Robert Van Diesen ,  Nicolaas Kemper ,  Robert-Han Munnig-Schmidt ,  Harmen Van Der Schoot ,  Rob Jansen

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/7095

摘要： A lithographic projection apparatus is disclosed. The apparatus includes a radiation system for providing a beam of radiation, a first support structure for supporting a patterning device, a second support structure for supporting a substrate, and a projection system. At least one of the first and second support structures includes a planar base, a movable stage that can be moved over the planar base, and an actuator for moving the stage. The apparatus also includes a contactless position measuring device for measuring a position of the stage, and a first pump for generating a conditioned gas flow in a volume between the measuring device and the stage. The base includes a plurality of gas channels that provide a path for the conditioned gas to flow through the base.

摘要翻译： 公开了一种光刻投影装置。 该装置包括用于提供辐射束的辐射系统，用于支撑图案形成装置的第一支撑结构，用于支撑衬底的第二支撑结构和投影系统。 第一和第二支撑结构中的至少一个包括平面基座，可在平面基座上移动的可移动平台以及用于移动平台的致动器。 该装置还包括用于测量载物台的位置的非接触位置测量装置和用于在测量装置和载物台之间产生体积的调节气流的第一泵。 底座包括多个气体通道，其提供用于经调节的气体流过基座的路径。

公开(公告)号：US20070263197A1

公开(公告)日：2007-11-15

申请号：US11430196

申请日：2006-05-09

申请人： Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

发明人： Bernardus Antonius Luttikhuis ,  Henrikus Cox ,  Erik Loopstra ,  Engelbertus Antonius Van Der Pasch ,  Harmen Van Der Schoot

IPC分类号： G03B27/52

CPC分类号： G03B27/53 ,  G03F7/70733 ,  G03F7/70775

摘要： A displacement measurement system, in particular for measuring the displacement of a substrate table in a lithographic apparatus relative to a reference frame is presented. The displacement measure system includes a plurality of displacement sensors mounted to the substrate table and a target associated with each displacement sensor mounted to the reference frame.

摘要翻译： 提出了一种位移测量系统，特别是用于测量光刻设备中的衬底台相对于参考系的位移。 位移测量系统包括安装到衬底台的多个位移传感器和与安装到参考框架的每个位移传感器相关联的目标。

公开(公告)号：US20060221323A1

公开(公告)日：2006-10-05

申请号：US11098608

申请日：2005-04-05

申请人： Henrikus Cox ,  Sven Hol ,  Petrus Vosters

发明人： Henrikus Cox ,  Sven Hol ,  Petrus Vosters

IPC分类号： G03B27/58

CPC分类号： G03F7/70791 ,  G03F7/70716 ,  G03F7/70758

摘要： A positioning device for positioning an object table comprises a frame for supporting the object table in a first direction, a motor unit constructed and arranged for exerting a first force on the object table in a second direction substantially perpendicular to the first direction and a second force on the object table in a third direction substantially perpendicular to the first direction and the second direction. The motor unit comprises a first part constructed and arranged to co-operate with a second part for generating the first and second force, the first part being arranged on the object table, such that both the first force and the second force are directed substantially through the centre of gravity of the object table.

摘要翻译： 用于定位物体台的定位装置包括：用于在第一方向上支撑物体台的框架;马达单元，被构造和布置成在基本上垂直于第一方向的第二方向上施加在物台上的第一力;以及第二力 在基本上垂直于第一方向和第二方向的第三方向上在物体台上。 马达单元包括构造和布置成与第二部分配合以产生第一和第二力的第一部分，第一部分布置在对象台上，使得第一力和第二力都基本上通过 对象表的重心。

公开(公告)号：US20060082753A1

公开(公告)日：2006-04-20

申请号：US10967306

申请日：2004-10-19

申请人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

发明人： Henrikus Cox ,  Sven Hol ,  Hernes Jacobs

IPC分类号： G03B27/58

CPC分类号： G03F7/70758

摘要： An actuator assembly includes a coil moveably positionable in a magnetic field generated by a magnet assembly, each of the coil and the magnet having substantially only one side facing the other. A magnetized field-shaping element is provided for shaping the magnetic field such that the magnetic field is substantially perpendicular to the direction of the electrical current for generating a force in a first degree of freedom. Thus, the coil may easily be mounted, since it does not need to be enclosed by magnet poles.

摘要翻译： 致动器组件包括能够由磁体组件产生的磁场中的可移动地定位的线圈，线圈和磁体中的每一个基本上只有一个面朝向另一侧。 提供磁化场成形元件用于使磁场成形，使得磁场基本上垂直于用于产生第一自由度的电流的方向。 因此，线圈可以容易地安装，因为它不需要被磁极包围。

公开(公告)号：US20060049698A1

公开(公告)日：2006-03-09

申请号：US10936712

申请日：2004-09-09

申请人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

发明人： Koen Maria Zaal ,  Edwin Buis ,  Henrikus Cox ,  Noud Gilissen ,  Harmen Schoot

IPC分类号： H02K41/00 ,  H02N1/00

CPC分类号： G03F7/70716 ,  G03F7/709

摘要： A substrate or a patterning device used in a lithographic apparatus and a lithographic device manufacturing method are presented. The substrate and patterning device are aligned with respect to a patterning beam and are movably supported by a support. Resonances in said support, however, may render the manufactured device unusable and/ or may render the control system complex. Therefore an actuator assembly frame with flexible coupling devices coupled to the support is provided with a number of actuators configured to move the support in a number of degrees of freedom. Thus, the resonances are damped by the flexible coupling devices resulting in a larger bandwidth for the control system and thus enabling a better position accuracy of the support.

公开(公告)号：US20050139790A1

公开(公告)日：2005-06-30

申请号：US10747617

申请日：2003-12-30

申请人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

发明人： Martinus Boogaarts ,  Hans Butler ,  Henrikus Cox ,  Martinus Cuijpers ,  Jan Kuit

IPC分类号： G03F9/00 ,  G01N21/88 ,  G03F7/20 ,  H01L21/027 ,  G01N21/86

CPC分类号： G03F7/70808 ,  G01N21/8851 ,  G03F7/709

摘要： The present invention relates to a lithographic projection apparatus comprising a housing, which comprises therein a first exposure system that has at least one movable part, e.g. a movable first substrate holder, or a movable second substrate holder in a twin stage apparatus. The system is further provided with position disturbance correction system for correcting a position of the first substrate holder with respect to the patterned projection beam due to the influence of gas pressure differences or gas movements, caused by movements of the movable part. The invention also generally relates to a device manufacturing method comprising providing a lithographic projection apparatus according to the invention with a first substrate, and exposing said first substrate, wherein during said exposing of the first substrate a position thereof is corrected by means of position disturbance correction system.

摘要翻译： 本发明涉及一种包括壳体的光刻投影设备，其中包括第一曝光系统，该曝光系统具有至少一个可移动部分，例如， 可移动的第一衬底保持器或可移动的第二衬底保持器。 该系统还设置有位置扰动校正系统，用于由于可移动部件的运动引起的气体压力差或气体运动的影响，校正第一衬底保持器相对于图案化的投影梁的位置。 本发明还通常涉及一种器件制造方法，其包括：提供具有第一衬底的根据本发明的光刻投影设备，并且暴露所述第一衬底，其中在所述第一衬底的暴露期间，其位置通过位置干扰校正被校正 系统。

公开(公告)号：US20060119829A1

公开(公告)日：2006-06-08

申请号：US11005480

申请日：2004-12-07

申请人： Henrikus Cox ,  Koen Johannes Maria Zaal

发明人： Henrikus Cox ,  Koen Johannes Maria Zaal

IPC分类号： G03B27/58

CPC分类号： G03F7/70725 ,  G05B2219/45028

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate support constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An actuator assembly is configured to move one of the supports with six degrees of freedom comprising x, y, z, rx, ry and rz directions. A controller controls the actuator assembly, and includes at least one compensator which is designed to dynamically decouple a dynamics of the actuator assembly in the degrees of freedom.

摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统，构造成支撑图案形成装置的图案形成装置支撑件，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束，构造的衬底支架 以保持基板和配置成将图案化的辐射束投影到基板的目标部分上的投影系统。 致动器组件被配置为使包括x，y，z，rx，ry和rz方向的六个自由度中的一个支撑件移动。 控制器控制致动器组件，并且包括至少一个补偿器，其被设计成以自由度动态地解耦致动器组件的动力学。

公开(公告)号：US20060087630A1

公开(公告)日：2006-04-27

申请号：US11212921

申请日：2005-08-29

申请人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

发明人： Nicolaas Kemper ,  Henrikus Cox ,  Sjoerd Donders ,  Roelof Graaf ,  Christiaan Hoogendam ,  Nicolaas Kate ,  Martinus Hendrikus Leenders ,  Jeroen Mertens ,  Frits Meulen ,  Joost Ottens ,  Franciscus Maria Teunissen ,  Jan-Gerard Toorn ,  Martinus Verhagen ,  Marco Polizzi ,  Edwin Augustinus Van Gompel ,  Johannes Smeulers ,  Stefan Belfroid

IPC分类号： G03B27/52

CPC分类号： G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.