Substrate treatment apparatus, printers, and methods to treat a print substrate
    2.
    发明授权
    Substrate treatment apparatus, printers, and methods to treat a print substrate 有权
    基板处理装置,打印机和处理打印基板的方法

    公开(公告)号:US09527308B2

    公开(公告)日:2016-12-27

    申请号:US14567874

    申请日:2014-12-11

    Abstract: Substrate treatment apparatus, printers, and methods to treat a print substrate are disclosed. An example apparatus includes a first roller having a rigid surface to receive a treatment fluid from a reservoir, a blade to apply a first pressure to the first roller to adjust an amount of the treatment fluid present on the first roller, and a second roller having a non-rigid surface to apply a second pressure to the first roller, to receive an adjusted amount of the treatment fluid from the first roller and to apply the treatment fluid to a substrate, the first pressure and the second pressure being selected such that the second roller applies the treatment fluid to the substrate in an amount resulting in a layer of treatment fluid less than about 0.4 micrometers thick on the substrate.

    Abstract translation: 公开了用于处理印刷基板的基板处理设备,打印机和方法。 示例性装置包括具有刚性表面以从贮存器接收处理流体的第一辊,将第一压力施加到第一辊以调节存在于第一辊上的处理流体的量的刀片,以及具有 用于向第一辊施加第二压力的非刚性表面,以接收来自第一辊的调节量的处理流体并将处理流体施加到基底,第一压力和第二压力被选择为使得 第二辊将处理流体施加到基底上,其量导致在基底上小于约0.4微米厚的处理流体层。

Patent Agency Ranking