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公开(公告)号：US20050126711A1
公开(公告)日：2005-06-16
申请号：US10764528
申请日：2004-01-27
CPC分类号： H01J37/32082 , H01J37/32165
摘要： A plasma processing apparatus capable of extending a period of maintenance and continuing stable processing is provided. The apparatus comprises a vacuum reactor 1 having a processing gas introduction device and a evacuating device, a shield electrode 14 formed on the outer circumferential wall of the vacuum reactor, and a specimen placing device 101 having an antenna electrode 51 for radiating high frequency power into the vacuum reactor, in which first high frequency power is supplied to the antenna electrode, and high frequency power at a frequency lower than that of the first high frequency power is supplied to the antenna electrode 51 and the shield electrode 15.
摘要翻译： 提供了能够延长维护期和持续稳定处理的等离子体处理装置。 该装置包括具有处理气体引入装置和抽真空装置的真空反应器1，形成在真空反应堆的外周壁上的屏蔽电极14和具有用于将高频功率辐射的天线电极51的试样放置装置101 向天线电极供给第一高频电力的真空电抗器和低于第一高频功率的频率的高频电力被供给到天线电极51和屏蔽电极15。
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公开(公告)号：US20060000804A1
公开(公告)日：2006-01-05
申请号：US11224967
申请日：2005-09-14
IPC分类号： H01L21/302
CPC分类号： H01J37/32082 , H01J37/32935 , H01J37/3299 , H01L21/31138 , H01L21/76802 , Y10S438/905 , Y10S438/907
摘要： For a surface processing apparatus using a plasma, a mixed gas of a fluorine-containing gas and an oxygen gas is used as an ashing gas. A mixed gas of an oxygen gas and a fluorine-containing gas is introduced as an ashing gas. This allows the following steps to be carried out at the same time: removal of the silicon component left on the mask material surface and the mask material in the area including the cured mask layer and the like; and the removal of the carbon-based, and silicon-based deposits deposited on the inner wall of a vacuum chamber. In addition, the removal of the mask material is performed under low pressure, and in the subsequent step to a step using a mixed gas of a fluorine-containing gas and an oxygen gas, a plasma of only an oxygen gas is used. As a result, it becomes possible to reduce the damages (etching) to the film layer after etching.
摘要翻译： 对于使用等离子体的表面处理装置，使用含氟气体和氧气的混合气体作为灰化气体。 引入氧气和含氟气体的混合气体作为灰化气体。 这允许同时执行以下步骤：去除掩模材料表面上残留的硅成分和包括固化掩模层等的区域中的掩模材料; 以及沉积在真空室的内壁上的碳基和硅基沉积物的去除。 此外，在低压下进行掩模材料的除去，在随后的工序中，使用含氟气体和氧气的混合气体的工序，仅使用氧气的等离子体。 结果，可以减少蚀刻后对膜层的损伤（蚀刻）。
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公开(公告)号：US07354525B2
公开(公告)日：2008-04-08
申请号：US11224967
申请日：2005-09-14
IPC分类号： B44C1/22
CPC分类号： H01J37/32082 , H01J37/32935 , H01J37/3299 , H01L21/31138 , H01L21/76802 , Y10S438/905 , Y10S438/907
摘要： For a surface processing apparatus using a plasma, a mixed gas of a fluorine-containing gas and an oxygen gas is used as an ashing gas. A mixed gas of an oxygen gas and a fluorine-containing gas is introduced as an ashing gas. This allows the following steps to be carried out at the same time: removal of the silicon component left on the mask material surface and the mask material in the area including the cured mask layer and the like; and the removal of the carbon-based, and silicon-based deposits deposited on the inner wall of a vacuum chamber. In addition, the removal of the mask material is performed under low pressure, and in the subsequent step to a step using a mixed gas of a fluorine-containing gas and an oxygen gas, a plasma of only an oxygen gas is used. As a result, it becomes possible to reduce the damages (etching) to the film layer after etching.
摘要翻译： 对于使用等离子体的表面处理装置，使用含氟气体和氧气的混合气体作为灰化气体。 引入氧气和含氟气体的混合气体作为灰化气体。 这允许同时执行以下步骤：去除掩模材料表面上残留的硅成分和包括固化掩模层等的区域中的掩模材料; 以及沉积在真空室的内壁上的碳基和硅基沉积物的去除。 此外，在低压下进行掩模材料的除去，在随后的工序中，使用含氟气体和氧气的混合气体的工序，仅使用氧气的等离子体。 结果，可以减少蚀刻后对膜层的损伤（蚀刻）。
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公开(公告)号：US06919274B2
公开(公告)日：2005-07-19
申请号：US10780670
申请日：2004-02-19
申请人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
发明人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
IPC分类号： H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/44
CPC分类号： H01L21/31116
摘要： An apparatus for performing a plasma-etching of a LSI device including a Cu interconnection, a low-k film, and a diffusion prevention film has a treatment chamber, into which an etching gas is introduced, and a support table which is equipped with electrodes and on which said LSI device is placed. In this apparatus, the etching gasses are turned into plasma by supplying radio frequency power to electrodes provided within the treatment chamber, so that the LSI device is etched with ions of the plasma. In this apparatus, a sulfur-containing gas and a fluorine-containing gas are mixed to the etching gasses, so that the diffusion prevention film is selectively etched against the low-k film.
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公开(公告)号：US20050026431A1
公开(公告)日：2005-02-03
申请号：US10780670
申请日：2004-02-19
申请人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
发明人： Hideyuki Kazumi , Tsuyoshi Yoshida , Eiji Ikegami , Kouichi Nakaune , Masamichi Sakaguchi , Yasuyuki Miyamoto , Akihiro Sano
IPC分类号： H01L21/3065 , H01L21/311 , H01L21/3213 , H01L21/44
CPC分类号： H01L21/31116
摘要： An apparatus for performing a plasma-etching of a LSI device including a Cu interconnection, a low-k film, and a diffusion prevention film has a treatment chamber, into which an etching gas is introduced, and a support table which is equipped with electrodes and on which said LSI device is placed. In this apparatus, the etching gasses are turned into plasma by supplying radio frequency power to electrodes provided within the treatment chamber, so that the LSI device is etched with ions of the plasma. In this apparatus, a sulfur-containing gas and a fluorine-containing gas are mixed to the etching gasses, so that the diffusion prevention film is selectively etched against the low-k film.
摘要翻译： 用于进行包括Cu互连，低k膜和防扩散膜的LSI器件的等离子体蚀刻的设备具有其中引入蚀刻气体的处理室和配备有电极的支撑台 并在其上放置所述LSI器件。 在该装置中，通过向设置在处理室内的电极提供射频功率使蚀刻气体变成等离子体，从而利用等离子体的离子蚀刻LSI器件。 在该装置中，将含硫气体和含氟气体混合到蚀刻气体中，使得防扩散膜针对低k膜选择性地蚀刻。
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公开(公告)号：US20050051273A1
公开(公告)日：2005-03-10
申请号：US10654010
申请日：2003-09-04
申请人： Kenji Maeda , Kenetsu Yokogawa , Tsuyoshi Yoshida
发明人： Kenji Maeda , Kenetsu Yokogawa , Tsuyoshi Yoshida
IPC分类号： C25B9/00 , H01J37/32 , H01L21/306 , H01L21/311
CPC分类号： H01J37/32082 , H01L21/31116
摘要： A plasma processing apparatus capable of processing a wafer having a diameter of 300 mm or greater with high accuracy and uniformity, the apparatus comprising a decompressable container 1, a stage 2 disposed within container 1 and supporting a wafer 3 thereon, a substantially circular conductive plate 7 disposed substantially in parallel with the wafer 3 and opposing the stage 2, and a high frequency power source 11 connected to the conductive plate 7 and supplying power to generate a plasma within a space interposed between the stage 2 and the conductive plate 7, characterized in that a frequency f1 of the power is within the range of 100 MHz
摘要翻译： 一种能够以高精度和均匀性处理直径为300mm以上的晶片的等离子体处理装置，该装置包括可减压容器1，设置在容器1内并在其上支撑晶片3的载物台2，基本上圆形的导电板 7，其基本上平行于晶片3并与平台2相对，以及高频电源11，其连接到导电板7并且供应功率以在插入在载物台2和导电板7之间的空间内产生等离子体，其特征在于 因为功率的频率f1相对于真空中的光C的速度和正在处理的晶片的直径D在100MHz
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7.发明申请OPTICAL TRANSFER SYSTEM, OPTICAL TRANSMISSION DEVICE, AND OPTICAL RECEPTION DEVICE 有权光传输系统，光传输设备和光接收设备公开(公告)号：US20130136451A1
公开(公告)日：2013-05-30
申请号：US13814617
申请日：2011-09-30
IPC分类号： H04J14/06
CPC分类号： H04J14/06 , H04B10/5053 , H04B10/532 , H04B10/616 , H04J14/002
摘要： In an optical transfer system, an optical transmission unit generates an optical signal in which respective polarization components are alternately present on a time axis, a time period during which the respective polarization components are simultaneously present on the time axis is substantially zero, and a symbol repetition cycle of optical signals of the respective polarization components becomes Ts, an optical reception unit causes an interference between local oscillation light and a received optical signal and converts an interfered optical signal to an electric signal, and a received electric-signal processing unit performs analog-digital conversion of an electric signal, elimination of a delay difference of Ts/2 between the respective polarized signal components, and adaptive equalization of a distortion other than the delay difference.
摘要翻译： 在光传输系统中，光传输单元产生在时间轴上交替存在各偏振分量的光信号，时间轴上同时存在各偏振分量的时间段基本上为零，以及符号 各个偏振分量的光信号的重复周期变为Ts，光接收单元引起局部振荡光和接收到的光信号之间的干扰，并将干扰的光信号转换为电信号，并且接收的电信号处理单元执行模拟 电信号的数字转换，消除各极化信号分量之间的Ts / 2的延迟差，以及除了延迟差之外的失真的自适应均衡。
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公开(公告)号：US20130003141A1
公开(公告)日：2013-01-03
申请号：US13467252
申请日：2012-05-09
IPC分类号： H04N1/04
CPC分类号： H04N1/0249 , G03G15/602 , H04N1/0083 , H04N1/0473 , H04N1/1017 , H04N1/103 , H04N1/1039 , H04N1/1043 , H04N2201/0081 , H04N2201/02454 , H04N2201/02466 , H04N2201/02479 , H04N2201/0464 , H04N2201/04725
摘要： An image reading apparatus includes a drive unit that is mounted on a carriage having an image reading sensor, which is moved with respect to an original, mounted thereon and moves the carriage. The drive unit includes: a motor; a gear train for transmitting rotation of the motor so as to move the carriage; an encoder sensor for reading a code wheel fixed to a rotary shaft of the motor; and a support member for holding the motor. The encoder sensor is urged against a part of the support member by a resilient member, to be thus fixed to the support member.
摘要翻译： 图像读取装置包括安装在具有相对于原件移动的图像读取传感器的滑架上的驱动单元，其安装在其上并移动滑架。 驱动单元包括：马达; 用于传递电机的旋转以便移动滑架的齿轮系; 编码器传感器，用于读取固定到电动机的旋转轴的码轮; 以及用于保持电动机的支撑构件。 编码器传感器通过弹性构件被推靠在支撑构件的一部分上，从而被固定到支撑构件上。
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公开(公告)号：US20120288284A1
公开(公告)日：2012-11-15
申请号：US13576276
申请日：2010-02-25
申请人： Tsuyoshi Yoshida , Takashi Sugihara
发明人： Tsuyoshi Yoshida , Takashi Sugihara
IPC分类号： H04B10/04
CPC分类号： H04B10/50575 , H04B10/5053 , H04B10/50595
摘要： An optical transmitter generating an arbitrary optical waveform including an analog optical waveform, which is capable of controlling a bias to a Null point easily. The optical transmitter modulates light from a light source by an optical modulator with use of a data sequence being an electric signal, to thereby generate the arbitrary optical waveform, and includes: a light intensity detector detecting intensity of output light of the optical modulator; a data signal generator generating the data sequence; an average modulation degree calculator calculating an average modulation degree of the data sequence based on the data sequence; and a bias controller performing bias control on the optical modulator based on the intensity of the output light detected by the light intensity detector and the average modulation degree of the data sequence calculated by the average modulation degree calculator.
摘要翻译： 产生包括模拟光波形的任意光波形的光发射机，其能够容易地将偏压控制到空点。 光发射机通过光调制器利用作为电信号的数据序列来调制来自光源的光，从而产生任意的光波形，并且包括：光强检测器，检测光调制器的输出光的强度; 产生数据序列的数据信号发生器; 平均调制度计算器，基于所述数据序列计算所述数据序列的平均调制度; 以及偏置控制器，基于由光强度检测器检测的输出光的强度和由平均调制度计算器计算的数据序列的平均调制度，对光调制器进行偏置控制。
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公开(公告)号：US20100244554A1
公开(公告)日：2010-09-30
申请号：US12714269
申请日：2010-02-26
IPC分类号： B62D55/10 , B62D55/06 , B62D55/104 , B62D55/18
CPC分类号： B62D55/21 , B62D55/104 , B62D55/14
摘要： There is provided a running device for track-laying vehicle, which can resolve a feeling of fear of falling height in a leading end portion of a crawler while relax a large impact when the crawler runs over a raised contact area. The running device includes a spring constant equalizing unit that equalizes an apparent spring constant of a second arm of lower track roller bogie device over a total length. The apparent spring constant is generated in maximum reverse camber of the crawler. The spring constant equalizing unit increases an oscillation angle α of the second arm that can abut on the first arm in the maximum reverse camber of the crawler such that the oscillation angle α of the second arm is larger than a crossing angle β of the connecting link. Desirably the increased maximum oscillation angle of the second arm is 1.3-2.0 times the crossing angle β.
摘要翻译： 提供了一种用于履带铺设车辆的运行装置，其可以在履带运行在凸起的接触区域上的同时放松大的冲击力的同时，消除履带的前端部的下降高度的恐惧感。 运行装置包括弹簧常数均衡单元，其在总长度上均衡下轨道滚子转向架装置的第二臂的表观弹簧常数。 表观弹簧常数是在履带的最大反向弯度中产生的。 弹簧常数均衡单元增加了能够抵靠履带的最大反向弧度中的第一臂上的第二臂的摆动角度α，使得第二臂的摆动角α大于交叉角度＆amp; bgr; 的连接链接。 理想地，第二臂的最大振荡角增加是交叉角度的1.3-2.0倍。
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