摘要:
The present invention provides an optical illumination device that permits an increase in the fill of a multiplicity of light sources that constitute a secondary source formed on an illuminated pupil plane. A fly's eye lens that forms a multiplicity of light sources from a light beam emitted by an optical integrator is disposed in the optical path between the optical integrator and an irradiation surface. The fly's eye lens comprises, in order from the light-source side, a first fly's eye member and a second fly's eye member. A cylindrical lens group arranged in a first direction is formed on each of the light source-side surface of a first fly's eye member and the light source-side surface of a second fly's eye member, and a cylindrical lens is group arranged in a second direction orthogonal to the first direction is formed on each of the irradiation surface side surface of the first fly's eye member and the irradiation surface side surface of the second fly's eye member.
摘要:
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要:
A sensor is used at a substrate level in a lithographic projection apparatus having a projection system with a numeric aperture that is greater than 1 and is configured to project a patterned radiation beam onto a target portion of a substrate The sensor includes a radiation-detector; a transmissive plate having a front surface and a back surface, the transmissive plate being positioned such that radiation projected by the projection system passes into the front surface of the transmissive plate and out of the back surface thereof to the radiation detector; and a luminescent layer provided on the back surface of the transmissive plate, the luminescent layer absorbing the radiation and emitting luminescent radiation of a different wavelength, wherein the back surface is rough.
摘要:
An illumination optical system having a more simplified structure forms various quadrupole-shaped secondary light sources with two-time rotational symmetry with respect to an optical axis. The apparatus can provide illumination conditions that differ in two perpendicular directions on a radiation-receiving plane. In order to form a secondary light source with a quadrupole-shaped light intensity distribution on an illumination pupil plane, a diffractive optical device is provided in which an entrance light beam is converted into four light beams, and a light beam having a shape of four points centered about the optical axis is formed in a far field. The diffractive optical device is provided with a first diffractive optical member that is rotatable about a first axis parallel to the optical axis, and a second diffractive optical member that is rotatable about a second axis parallel to the optical axis, and that is arranged adjacent to the first diffractive optical member. A refractive optical device having first and second refractive optical members accomplishes similar results.
摘要:
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要:
A part of exposure beam through a liquid via a projection optical system enters a light-transmitting section, enters an optical member without passing through gas, and is focused. The exposure apparatus receives the exposure light from the projection optical system to perform various measurements even if the numerical aperture of the projection optical system increases.
摘要:
The present invention is aimed at providing a wavefront dividing type optical integrator which can yield a uniform illuminance distribution substantially over the whole illumination field formed thereby even when the size of each micro lens constituting the optical integrator is made smaller so as to set a large number of wavefront divisions. The optical integrator in accordance with the present invention is a wavefront dividing type optical integrator, having a number of micro lenses arranged two-dimensionally, for forming a number of light sources by dividing a wavefront of an incident beam; each micro lens having a rectangular entrance surface and a rectangular exit surface, and satisfying at least one of the following conditions: (d1/2)(D1/2)/(&lgr;·f)≧3.05 (d2/2)(D2/2)/(&lgr;·f)≧3.05 where f is the focal length of each micro lens, d1 is the length of one side of the entrance surface of each micro lens, d2 is the length of the other side of the entrance surface of each micro lens, D1 is the length of the side of exit surface in each micro lens corresponding to the one side of entrance surface, D2 is the length of the side of exit surface in each micro lens corresponding to the other side of entrance surface, and &lgr; is the wavelength of the incident beam.
摘要:
An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.
摘要:
An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, and a polarization member made of optical material with optical rotatory power, which is arranged in the optical path on an incidence side of the optical integrator, and which changes a polarization state of the illumination light. The illumination light from the polarization member is irradiated onto the pattern through a pupil plane of the illumination optical apparatus.
摘要:
A beam transforming element for forming a predetermined light intensity distribution on a predetermined surface on the basis of an incident beam includes a first basic element made of an optical material with optical activity, for forming a first region distribution of the predetermined light intensity distribution on the basis of the incident beam; and a second basic element made of an optical material with optical activity, for forming a second region distribution of the predetermined light intensity distribution on the basis of the incident beam, wherein the first basic element and the second basic element have their respective thicknesses different from each other along a direction of transmission of light.