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12 条记录 (耗时 0.027 秒)

    Wavelength division multiplexing optical repeating transmission method and repeating apparatus
    6.
    发明授权
    Wavelength division multiplexing optical repeating transmission method and repeating apparatus 失效
    波分复用光中继传输方法和中继装置

    公开(公告)号：US07616893B2

    公开(公告)日：2009-11-10

    申请号：US10781783

    申请日：2004-02-20

    申请人： Hiroki Ooi ,  Takashi Iwabuchi ,  Takafumi Terahara ,  George Ishikawa

    发明人： Hiroki Ooi ,  Takashi Iwabuchi ,  Takafumi Terahara ,  George Ishikawa

    IPC分类号： H04J14/02

    CPC分类号： H04J14/0201 ,  H04B10/2513

    摘要： A repeating apparatus disposed at an end point of each divisional repeating interval of a light transmission line performs a first dispersion compensation step, an optical add/drop multiplexing step and a second dispersion compensation step to perform repeating transmission. The ratio of an over compensation amount at the second dispersion compensation step to the sum of dispersion compensation amounts at the first and second dispersion compensation steps is set so as to gradually vary together with the transmission distance from the terminal apparatus for transmission at which the repeating apparatus is disposed on the light transmission line so that degradation of wavelengths to be received by the terminal apparatus for reception is suppressed while dispersion compensation is performed with a high degree of accuracy at each optical add/drop multiplexing point on the transmission line.

    摘要翻译： 设置在光传输线的每个分割重复间隔的终点处的中继装置执行第一色散补偿步骤，光分插复用步骤和第二色散补偿步骤，以执行重复发送。 在第二色散补偿步骤中的过度补偿量与第一和第二色散补偿步骤之间的色散补偿量之和的比率被设置为随着与重复发送的终端装置的传输距离一起逐渐变化 装置设置在光传输线上，从而抑制由终端装置接收的波长的劣化，同时在传输线上的每个光分插复用点处以高精度执行色散补偿。

    Antireflection film
    9.
    发明授权
    Antireflection film 失效
    防反射膜

    公开(公告)号：US4738497A

    公开(公告)日：1988-04-19

    申请号：US783090

    申请日：1985-10-02

    申请人： Takeo Miyata ,  Takuhiro Ono ,  Takashi Iwabuchi ,  Masaru Ikedo ,  Masafumi Watari

    发明人： Takeo Miyata ,  Takuhiro Ono ,  Takashi Iwabuchi ,  Masaru Ikedo ,  Masafumi Watari

    IPC分类号： G02B1/11 ,  G02B6/10 ,  G02B6/24 ,  G02B6/34 ,  G02B13/14 ,  G02B5/28

    CPC分类号： G02B6/4207 ,  G02B1/115 ,  G02B6/02052 ,  G02B6/10 ,  G02B6/241 ,  G02B6/4296 ,  Y10S359/90

    摘要： An antireflection film composed of a layer of arsenic triselenide having an optical thickness in the range between 2.518 and 2.783 .mu.m, a layer of potassium chloride having an optical thickness in the range between 1.151 and 1.272 .mu.m and a layer of arsenic triselenide having an optical thickness in the range between 0.577 and 0.749 .mu.m which are successively formed on a member of infrared radiation transmitting material formed of a mixture of thalium iodide and thalium bromide. The member provided with the three-layer antireflection film is used in an atmosphere of protective gas, such as dry air or dry N.sub.2 gas.

    摘要翻译： 一种防反射膜，其由光致厚度在2.518和2.783μm之间的三层硒化物层组成，光学厚度在1.151和1.272μm之间的氯化钾层和具有 光学厚度在0.577和0.749μm之间的范围内，其依次形成在由碘化铊和溴化钡的混合物形成的红外辐射透射材料的构件上。 设置有三层抗反射膜的构件用于保护气体的气氛中，例如干燥空气或干燥的N 2气体。

    Antireflection coating for potassium chloride
    10.
    发明授权
    Antireflection coating for potassium chloride 失效
    氯化钾防反射涂层

    公开(公告)号：US4533593A

    公开(公告)日：1985-08-06

    申请号：US533273

    申请日：1983-09-16

    申请人： Takeo Miyata ,  Takuhiro Ono ,  Takashi Iwabuchi

    发明人： Takeo Miyata ,  Takuhiro Ono ,  Takashi Iwabuchi

    IPC分类号： C30B33/00 ,  G02B1/02 ,  G02B1/11 ,  B32B7/00 ,  B32B15/04 ,  G02B5/26

    CPC分类号： G02B1/115 ,  C30B29/12 ,  C30B33/00 ,  G02B1/02 ,  Y10T428/24967 ,  Y10T428/261 ,  Y10T428/265

    摘要： An antireflection coating for a potassium chloride substrate has a first arsenic trisulfide (As.sub.2 S.sub.3) layer, a lead fluoride (PbF.sub.2) layer and a second arsenic trisulfide (As.sub.2 S.sub.3) layer which are formed on at least one major surface of the potassium chloride (KCl) substrate in the order named. The antireflection coating withstands to irradiate of a high-power carbon dioxide gas laser. The antireflection coating also has good optical characteristics and moisture resistance.

    摘要翻译： 用于氯化钾底物的抗反射涂层具有在氯化钾（KCl）的至少一个主表面上形成的第一砷三氧化物（As 2 S 3）层，氟化铅（PbF 2）层和第二砷三硫化物（As 2 S 3） 底物按顺序命名。 抗反射涂层可承受大功率二氧化碳气体激光器的照射。 抗反射涂层也具有良好的光学特性和耐湿性。