Treatment object supporting device
    1.
    发明授权
    Treatment object supporting device 失效
    治疗对象支持装置

    公开(公告)号:US5334257A

    公开(公告)日:1994-08-02

    申请号:US66416

    申请日:1993-05-25

    摘要: A plurality of ring trays supporting loaded treatment objects are arranged in parallel at predetermined spacing in the vertical axis direction and are supported by rods at a minimum of three locations separated from the rod couplings. Cutouts are provided in each ring tray that do not extend to the ring tray center open area. Supporting teeth are provided on the arms driven by drive devices and are inserted via the cutouts. The supporting teeth straddle the ring tray and are shifted relatively on both sides of the vertical direction, and can exchange the wafers between the ring tray and the supporting teeth. By this, problems occurring with regard to various types of heat treatment of the treatment objects, such as treatment object slippage, can be prevented. In addition, a plurality of treatment objects can be exchanged at one time, thereby allowing the exchanging time to be shortened.

    摘要翻译: 支撑负载的处理对象的多个环形托盘在垂直轴线方向上以预定的间隔平行布置,并且在与杆联接件分开的至少三个位置处被杆支撑。 每个环形托盘上都设有不延伸到环形托盘中心开放区域的切口。 支撑齿设置在由驱动装置驱动的臂上,并经由切口插入。 支撑齿跨越环形托盘并相对于垂直方向的两侧相对移动,并且可以在环形托盘和支撑齿之间交换晶片。 由此,可以防止对处理对象的各种热处理(例如处理对象滑动)产生的问题。 此外,可以一次交换多个处理对象,从而可以缩短交换时间。

    Vertical heat-treating apparatus
    5.
    发明授权
    Vertical heat-treating apparatus 失效
    立式热处理装置

    公开(公告)号:US5178639A

    公开(公告)日:1993-01-12

    申请号:US723382

    申请日:1991-06-28

    申请人: Hironobu Nishi

    发明人: Hironobu Nishi

    IPC分类号: H01L21/00 H01L21/677

    摘要: A vertical heat-treating apparatus which is effective for preventing dust or fine particles from being attached to a wafer during the loading/unloading or transport of the wafer thereby to manufacture a high-quality wafers. This apparatus comprises a carrier stocker storing a plurality of wafer carriers, a loading/unloading mechanism for transferring the wafers between the wafer carriers and a heat-treating vessel, a plurality of heat-treating furnaces for heat-treating the wafers, a transport mechanism for transporting the heat-treating vessel to and from the vertical heat-treating furnace, and gas supply means for forming a clear gas stream passing exclusively through the loading/unloading mechanism and/or the transport mechanism.

    摘要翻译: 一种垂直热处理装置,其有效地防止在晶片的加载/卸载或输送期间灰尘或细颗粒附着于晶片,从而制造高质量的晶片。 该装置包括存储多个晶片载体的载体储料器,用于在晶片载体和热处理容器之间传送晶片的装载/卸载机构,用于热处理晶片的多个热处理炉,输送机构 用于将热处理容器运送到垂直热处理炉和从垂直热处理炉运送热气处理容器;以及气体供应装置,用于形成仅通过装载/卸载机构和/或运输机构的澄清气流。

    Heat treatment boat support
    7.
    发明授权
    Heat treatment boat support 失效
    热处理船支持

    公开(公告)号:US5482558A

    公开(公告)日:1996-01-09

    申请号:US430478

    申请日:1995-04-28

    摘要: A heat treatment boat for mounting a number of disc-shaped objects to be treated at a vertical interval for heat treatment thereof in a vertical heat treatment furnace comprises arcuate or ring-shaped support members provided on support rods at a vertical interval for supporting the objects to be treated in surface contact with the undersides of peripheral parts of the objects to be treated. The heat treatment boat is disposed on a ring-shaped intermediate member of high radiant heat absorption disposed on a heat insulating cylinder. The heat treatment boat comprises support rods which are planted on an annular support member circumferentially in accordance with a contour of the objects to be treated and whose upper ends are secured to an annular fixation member. The heat treatment boat of such constitution can reduce occurrences of slips in the disc-shaped objects when heat treated.

    摘要翻译: 在垂直热处理炉中用于安装待处理的多个圆盘形物体进行热处理的热处理船包括以垂直间隔设置在支撑杆上的弓形或环形支撑构件,用于支撑物体 被处理与待处理物体的周边部分的下侧面接触。 热处理舟配置在隔热筒上设置的高辐射吸热性环状中间构件。 热处理舟包括根据待处理物体的轮廓周向地种植在环形支撑构件上的支撑杆,其上端固定在环形固定构件上。 这种结构的热处理舟可以在热处理时减少圆盘形物体中滑动的发生。

    Wafer boat rotating apparatus
    8.
    发明授权
    Wafer boat rotating apparatus 失效
    晶圆船旋转装置

    公开(公告)号:US5356261A

    公开(公告)日:1994-10-18

    申请号:US103666

    申请日:1993-08-10

    申请人: Hironobu Nishi

    发明人: Hironobu Nishi

    摘要: A wafer boat rotating apparatus is disclosed, which includes a boat holding portion for holding both ends of the wafer boat, a vertical rotation drive mechanism for rotating the boat holding portion on a vertical plane, and a horizontal rotation drive mechanism for rotating the boat holding portion on a horizontal plane. A wafer holding member is disposed on the boat holding portion and adapted to keep the wafers held in the wafer boat apart from a bottom portion of the wafer boat by a small distance. Thus, compensation for the difference of coefficients of thermal expansion between the wafers and wafer boat during heat treatment can be made easily.

    摘要翻译: 公开了一种晶片舟旋转装置,其包括用于保持晶片舟皿的两端的船只保持部分,用于使船只保持部分在垂直平面上旋转的垂直旋转驱动机构,以及用于使船体保持部分旋转的水平旋转驱动机构 部分在水平面上。 晶片保持构件设置在舟状物保持部分上并且适于将保持在晶片舟皿中的晶片与晶片舟皿的底部隔开一小段距离。 因此,可以容易地对热处理期间的晶片和晶片舟皿之间的热膨胀系数的差异进行补偿。

    Apparatus and method for transferring wafers between a cassette and a
boat
    10.
    发明授权
    Apparatus and method for transferring wafers between a cassette and a boat 失效
    用于在盒和船之间传送晶片的装置和方法

    公开(公告)号:US4947784A

    公开(公告)日:1990-08-14

    申请号:US281026

    申请日:1988-12-07

    申请人: Hironobu Nishi

    发明人: Hironobu Nishi

    CPC分类号: H01L21/67781

    摘要: An apparatus for transferring wafers comprises a turntable for orienting a plurality of wafers which are loaded in a cassette, a lifting mechanism for lifting the wafers away from the cassette, a plurality of opening/closing chuck mechanisms, and a slide movement mechanism for conveying the wafers which are held by the opening/closing mechanism onto a boat. The cassette on the turntable is turned selectively through an angle of 180.degree. and wafers are lifted by the link mechanism all at a time and selectively held by the opening/closing chuck mechanism. The wafers thus held are conveyed to a location of a boat where they are loaded onto the boat in a face-to-face relation.

    摘要翻译: 用于转移晶片的设备包括用于定向装载在盒中的多个晶片的转台,用于将晶片远离盒子的提升机构,多个打开/关闭卡盘机构,以及用于传送 由开/关机构保持在船上的晶片。 转台上的磁带盒选择性地转动180°的角度,并且晶片被连杆机构一次提升并且被打开/关闭卡盘机构选择性地保持。 将如此保持的晶片传送到船的位置,在那里它们以面对面的关系装载到船上。