摘要:
A first supporting section 30 is provided between a substrate section 40 and a second supporting section 20. The first supporting section 30 is structured by, e.g., a film formed from a material having a higher acoustic impedance than a piezoelectric body 11 and the substrate section 40, or a film formed from a material having a smaller Q value than the piezoelectric body 11 and substrate section 40. By inserting the first supporting section 30, most vibration from the second supporting section 20 toward the substrate section 40 is reflected (arrow a), and also a vibration having been transmitted to the substrate section 40 from the second supporting section 20 is prevented from reflecting at the bottom of the substrate section 40 and then returning in a direction of the vibration section 10 (arrow b).
摘要:
A first supporting section provided between a substrate section and a second supporting section. The first supporting section is structured by, e.g., a film formed from a material having a higher acoustic impedance than a piezoelectric body and the substrate section, or a film formed from a material having a smaller Q value than the piezoelectric body and substrate section. By inserting the first supporting section, most vibration from the second supporting section toward the substrate section is reflected, and also a vibration having been transmitted to the substrate section from the second supporting section is prevented from reflecting at the bottom of the substrate section 40 and then returning in a direction of the vibration section.
摘要:
The area of an opening C of a cavity 31 is equal to or greater than the area of a horizontal cross section D of a vibrating section 10. The vibrating section 10 is placed on a support section 20 at a position such that a vertical projection of the vibrating section 10 onto a substrate 30 is accommodated within the opening C of the cavity 31. Moreover, the sum of a vertical thickness t1 of the vibrating section 10 and a vertical thickness t2 of the support section 20 is equal to one wavelength of a resonance frequency fr of an acoustic resonator 1 (one wavelength=t1+t2), while the thickness t1 of the vibrating section 10 and the thickness t2 of the support section 20 are different from each other (t1≠t2). Thus, neither the thickness t1 of the vibrating section 10 nor the thickness t2 of the support section 20 is equal to the half wavelength of the resonance frequency fr.
摘要翻译:空腔31的开口C的面积等于或大于振动部分10的水平横截面D的面积。 振动部分10被放置在支撑部分20上,使得振动部分10在基片30上的垂直突起容纳在空腔31的开口C内。 此外,振动部10的垂直厚度t 1和支撑部20的垂直厚度t 2之和等于声谐振器1的共振频率fr的一个波长(一个波长= t 1 + t 2 ),而振动部10的厚度t 1和支撑部20的厚度t 2彼此不同(t 1> t 2)。 因此,振动部10的厚度t 1和支撑部20的厚度t 2都不等于共振频率fr的半波长。
摘要:
In a balanced/unbalanced type coupled FBAR filter 100, an area size of a first lower electrode 102 is generally equal to a total area size of second and third lower electrodes 104 and 106 and an area for isolating the second and third lower electrodes 104 and 106. An area size of a first upper electrode 103 is generally equal to a total area size of second and third upper electrodes 105 and 107 and an area for isolating the second and third upper electrodes 105 and 107. The third lower electrode 106 and the second upper electrode 105 are located to face each other, and the third upper electrode 107 and the second lower electrode 104 are located to face each other. Apart of the second lower electrode 104 and a part of the second upper electrode 105 are located to face each other.
摘要:
In a balanced/unbalanced type coupled FBAR filter 100, an area size of a first lower electrode 102 is generally equal to a total area size of second and third lower electrodes 104 and 106 and an area for isolating the second and third lower electrodes 104 and 106. An area size of a first upper electrode 103 is generally equal to a total area size of second and third upper electrodes 105 and 107 and an area for isolating the second and third upper electrodes 105 and 107. The third lower electrode 106 and the second upper electrode 105 are located to face each other, and the third upper electrode 107 and the second lower electrode 104 are located to face each other. Apart of the second lower electrode 104 and a part of the second upper electrode 105 are located to face each other.
摘要:
An acoustic resonator device includes a substrate, a first acoustic resonator and a second acoustic resonator. The first acoustic resonator is formed on the substrate, and has a first upper electrode, a first piezoelectric layer, and a first lower electrode layer, and resonates in a λ/4 mode at a first resonant frequency. The second acoustic resonator is formed on the substrate, and has a second upper electrode layer, a second piezoelectric layer, and a second lower electrode layer, and resonates in a λ/2 mode at a second resonant frequency different from the first frequency. In the acoustic resonator device, materials and thicknesses of the first lower electrode layer and the second lower electrode layer are common and substantially equal, and materials and thicknesses of the first piezoelectric layer and the second piezoelectric layer are common and substantially equal.
摘要:
An acoustic resonator device includes a substrate, a first acoustic resonator and a second acoustic resonator. The first acoustic resonator is formed on the substrate, and has a first upper electrode, a first piezoelectric layer, and a first lower electrode layer, and resonates in a λ/4 mode at a first resonant frequency. The second acoustic resonator is formed on the substrate, and has a second upper electrode layer, a second piezoelectric layer, and a second lower electrode layer, and resonates in a λ/2 mode at a second resonant frequency different from the first frequency. In the acoustic resonator device, materials and thicknesses of the first lower electrode layer and the second lower electrode layer are common and substantially equal, and materials and thicknesses of the first piezoelectric layer and the second piezoelectric layer are common and substantially equal.
摘要:
A thin film bulk acoustic resonator (507b) comprises a substrate (101b), an acoustic mirror layer (508b) provided on the substrate (101b), including a plurality of impedance layers (502b, 503b) alternatively having a high acoustic impedance and a low acoustic impedance, and a piezoelectric thin film vibrator (509b) provided on the acoustic mirror layer (508b), including a lower electrode (504b), a piezoelectric thin film (105b) and an upper electrode (506b). The sum of a thickness of the lower electrode (504b) and a thickness of the upper electrode (506b) is 5% or more and 60% or less of a whole thickness of the piezoelectric thin film vibrator (509b), and the thickness of the lower electrode (504b) is larger than the thickness of the upper electrode (506b).
摘要:
The area of an opening C of a cavity is equal to or greater than the area of a horizontal cross section D of a vibrating section. The vibrating section is placed on a support section at a position such that a vertical projection of the vibrating section onto a substrate is accommodated within the opening C of the cavity. Moreover, the sum of a vertical thickness t1 of the vibrating section and a vertical thickness t2 of the support section is equal to one wavelength of a resonance frequency fr of an acoustic resonator (one wavelength=t1+t2), while the thickness t1 of the vibrating section and the thickness t2 of the support section are different from each other (t1≠t2). Thus, neither the thickness t1 of the vibrating section nor the thickness t2 of the support section is equal to the half wavelength of the resonance frequency fr.
摘要:
A coupled FBAR filter 100 includes first and second input/output vibration portions 110 and 111 respectively including first and second lower electrodes 104 and 106, first and second upper electrodes 105 and 107, and a piezoelectric thin film 103 interposed therebetween; and a cavity 102 for commonly guaranteeing vibrations of the first and second input/output vibration portions 110 and 111 so as to couple the vibrations. The first and second input/output vibration portions 110 and 111 are located adjacently in contact with each other with a step therebetween, such that the first and second lower electrodes 104 and 106 are not electrically connected to each other and such that the first and second upper electrodes 105 and 107 are not electrically connected to each other. Insulators 108 and 109 are provided in the vicinity of the step.