公开(公告)号：US6011611A

公开(公告)日：2000-01-04

申请号：US186368

申请日：1998-11-05

申请人： Hiroshi Nomura ,  Takashi Sato ,  Takuya Kono ,  Junichiro Iba

发明人： Hiroshi Nomura ,  Takashi Sato ,  Takuya Kono ,  Junichiro Iba

IPC分类号： G01B11/00 ,  G01M11/00 ,  G01M11/02 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  G03B27/54 ,  G03B27/42 ,  G03C5/00

CPC分类号： G03F7/706 ,  G03F7/70633

摘要： The method of measuring the aberration of the projection optics, according to the present invention includes the following steps. In the first step, the first mask pattern including the first pattern in which a line and space pattern is arranged on a photomask to be linearly symmetrical, and the second pattern in which line patterns having a large line width are arranged on outer sides of the first pattern, to be linearly symmetrical, is transferred on a substrate. In the second step, the second mask pattern in which a patter designed to leave a part of the first pattern and a pattern designed to leave the entire second pattern are arranged to be linearly symmetrical, is transferred on the same substrate, so as to superimpose it on the transferred first pattern. In the third step, the position of the transferred pattern of the second pattern, and the predetermined position of the pattern section of the transferred pattern of the first pattern, which is left in the second step are detected. Thus, from the difference between these positions detected in the third step, the aberration of the projecting optics which is situated between the mask pattern of the photomask and the substrate is measured.

摘要翻译： 根据本发明的测量投影光学器件的像差的方法包括以下步骤。 在第一步骤中，包括在光掩模上布置线状和空间图案为线性对称的第一图案的第一掩模图案和其中具有大线宽的线图案布置在第二图案的第二图案上 线性对称的第一图案被转印到基板上。 在第二步骤中，其中设计成留下第一图案的一部分的图案和设计成保留整个第二图案的图案被布置为线性对称的第二掩模图案被转印在同一基板上，以便叠加 它在转移的第一种模式。 在第三步骤中，检测第二图案的转印图案的位置以及在第二步骤中留下的第一图案的转印图案的图案部分的预定位置。 因此，从第三步骤中检测到的这些位置之间的差异，测量位于光掩模的掩模图案和基板之间的投影光学器件的像差。

公开(公告)号：US06288556B1

公开(公告)日：2001-09-11

申请号：US09204309

申请日：1998-12-03

申请人： Takashi Sato ,  Keita Asanuma ,  Junichiro Iba ,  Toru Ozaki ,  Hiroshi Nomura ,  Tatsuhiko Higashiki

发明人： Takashi Sato ,  Keita Asanuma ,  Junichiro Iba ,  Toru Ozaki ,  Hiroshi Nomura ,  Tatsuhiko Higashiki

IPC分类号： G01R2714

CPC分类号： G03F7/70633 ,  G03F7/70658 ,  H01L22/34 ,  H01L2924/0002 ,  H01L2924/00

摘要： The invention allows for measurement at the same density as an actual device pattern and measures the level of registration of actual patterns with precision. In the measurement of the invention, a first exposure process is performed on a first-level pattern and a second exposure process is then performed on a second-level pattern. After that, the patterns are developed and etched, thereby forming two patterns of different shapes. Next, the resistance between terminals of a pattern which are obtained by means of etching is measured through a four-point measurement. An amount of misregistration of the first-level pattern and the second-level pattern is calculated from the measured resistance.

摘要翻译： 本发明允许以与实际装置图案相同的密度进行测量，并且精确地测量实际图案的配准水平。 在本发明的测量中，对第一级图案执行第一曝光处理，然后对第二级图案执行第二曝光处理。 之后，显影和蚀刻图案，从而形成两种不同形状的图案。 接下来，通过四点测量来测量通过蚀刻获得的图案的端子之间的电阻。 从测量的电阻计算出第一电平图案和第二电平图案的重合不良。

公开(公告)号：US20150113959A1

公开(公告)日：2015-04-30

申请号：US14404368

申请日：2012-05-29

申请人： Shinichi Mitani ,  Hiroshi Nomura

发明人： Shinichi Mitani ,  Hiroshi Nomura

IPC分类号： F01N3/033 ,  F01N3/021

CPC分类号： F01N3/033 ,  B03C3/0175 ,  B03C3/38 ,  B03C3/41 ,  B03C3/49 ,  B03C3/68 ,  B03C2201/10 ,  B03C2201/24 ,  B03C2201/30 ,  F01N3/01 ,  F01N3/021 ,  F01N9/002 ,  Y02T10/20 ,  Y02T10/47

摘要： Aggregation of the particulate matter is facilitated. A particulate matter processing apparatus (1) comprises an electrode (5) which is provided in an exhaust gas passage (3) of an internal combustion engine, which extends from a wall surface of the exhaust gas passage (3) toward an inner side of the exhaust gas passage (3), which is bent at a bent portion (51) toward an upstream side or a downstream side in a flow direction (B) of an exhaust gas, and which extends toward the upstream side or the downstream side in the flow direction (B) of the exhaust gas, wherein the electrode (5) is formed so that a field intensity, which is provided between the electrode (5) and the wall surface of the exhaust gas passage (3) on the upstream side, is larger than that provided on the downstream side.

摘要翻译： 有利于颗粒物的聚集。 颗粒物处理装置（1）包括设置在内燃机的排气通道（3）中的电极（5），该内燃机从废气通道（3）的壁面向内侧延伸 废气通道（3），其在弯曲部（51）处朝向排气的流动方向（B）的上游侧或下游侧弯曲，并且朝向上游侧或下游侧延伸 排气的流动方向（B），其中，电极（5）形成为在电极（5）和排气通路（3）的上游侧的壁面之间设置的场强 ，大于在下游侧提供的。

公开(公告)号：US08891175B2

公开(公告)日：2014-11-18

申请号：US13554173

申请日：2012-07-20

申请人： Hiroshi Nomura

发明人： Hiroshi Nomura

IPC分类号： G02B15/14 ,  G02B7/08 ,  G02B7/10

CPC分类号： G02B7/102 ,  G02B7/08 ,  G02B7/10

摘要： A lens-frame moving mechanism includes a lens frame guided to move between a ready-to-photograph position and a retracted position, the lens frame being biased forwardly by a biaser; an intermediate linearly movable member, wherein the lens frame contacts the intermediate linearly movable member; a leading screw formed on the drive shaft of a motor; a nut member screw-engaged onto the leading screw, wherein the nut member does not rotate relative to the lens frame and moves the intermediate linearly movable member in the optical axis direction; and a rearwardly-movable member which rearwardly moves the lens frame against the biasing force such that the lens frame moves away from the intermediate linearly movable member in the optical axis direction while the lens frame is moved from the ready-to-photograph position to the retracted position.

摘要翻译： 透镜框架移动机构包括被引导以在准备照相位置和缩回位置之间移动的透镜框架，透镜框架被偏移器向前偏置; 中间线性可移动构件，其中所述透镜框架接触所述中间线性可移动构件; 形成在电动机的驱动轴上的导螺杆; 螺母接合到所述引导螺杆上，其中所述螺母构件不相对于所述透镜框架旋转并沿所述光轴方向移动所述中间线性可移动构件; 以及向后移动的构件，其抵抗偏压力向后移动透镜框架，使得透镜框架在光轴方向上远离中间线性可移动构件移动，同时透镜框架从准备就绪位置移动到 缩回位置。

公开(公告)号：US08687460B2

公开(公告)日：2014-04-01

申请号：US12048201

申请日：2008-03-13

申请人： Emmanuel Coste ,  John Richard Tulett ,  Hiroshi Nomura ,  James Edward Martin

发明人： Emmanuel Coste ,  John Richard Tulett ,  Hiroshi Nomura ,  James Edward Martin

IPC分类号： G01V1/38

CPC分类号： G01V1/3835 ,  G01V1/42

摘要： Methods and apparatus for generating borehole seismic surveys are disclosed. The methods and apparatus enable more accurate surveys than previous surveying systems. In some embodiments, firing of remote seismic sources is synchronized with data recording in a borehole. In some embodiments, the synchronization is based on a universal time standard. In some embodiments, GPS positioning technology is used to predict firing times and synchronize firing times with downhole and surface recording.

摘要翻译： 公开了生成井眼地震勘测的方法和装置。 这些方法和装置比以前的测量系统能够进行更准确的调查。 在一些实施例中，远程地震源的发射与井眼中的数据记录同步。 在一些实施例中，同步基于通用时间标准。 在一些实施例中，GPS定位技术用于预测点火时间并且同步点火时间与井下和表面记录。

公开(公告)号：US20120212743A1

公开(公告)日：2012-08-23

申请号：US13236037

申请日：2011-09-19

申请人： Masanori TAKAHASHI ,  Hiroshi Nomura

发明人： Masanori TAKAHASHI ,  Hiroshi Nomura

IPC分类号： G01J4/00

CPC分类号： G01J4/04

摘要： The embodiments relate to a method of calculating an image for simulating by calculation an image imaged by a projection optical system. In this method, a Stokes vector showing a characteristic of an illumination light is acquired first. Next, this Stokes vector is divided into a polarized light component vector and a non-polarized light component vector. The polarized light component vector is divided into a first coherent component vector and a first non-coherent component vector. The non-polarized light component vector is divided into a second coherent component vector and a second non-coherent component vector. Then, imaging calculation is performed at least for the first coherent component vector and the second coherent component vector, respectively.

摘要翻译： 实施例涉及一种计算图像的方法，用于通过计算模拟由投影光学系统成像的图像。 在该方法中，首先获得表示照明光的特性的斯托克斯矢量。 接下来，该斯托克斯矢量被分为偏振光分量矢量和非偏振光分量矢量。 偏振光分量矢量被分成第一相干分量矢量和第一非相干分量矢量。 非偏振光分量矢量被分成第二相干分量矢量和第二非相干分量矢量。 然后，至少对于第一相干分量矢量和第二相干分量矢量分别执行成像计算。

公开(公告)号：US08199417B2

公开(公告)日：2012-06-12

申请号：US12817239

申请日：2010-06-17

申请人： Hiroshi Nomura

发明人： Hiroshi Nomura

IPC分类号： G02B9/08

CPC分类号： G02B7/10 ,  G02B5/005 ,  G03B9/24 ,  G03B17/04

摘要： A zoom lens includes a variable aperture-stop mechanism positioned in front or behind an aperture-control lens group; a first rotation imparting member, which rotates an opening/closing ring of the variable aperture-stop mechanism by a relative movement between the variable aperture-stop mechanism and the first rotation imparting member in the optical axis direction so as to hold an adjustable aperture of the variable aperture-stop mechanism at a small aperture size when the aperture-control lens group moves within in the zooming range; and a second rotation imparting member, which rotates the opening/closing ring by a relative movement between the variable aperture-stop mechanism and the second rotation imparting member to open and hold the adjustable aperture at a large aperture size when the aperture-control lens group moves to the accommodated position, at which the aperture-control lens group is partly positioned in the adjustable aperture held at the large aperture size.

摘要翻译： 变焦镜头包括位于光圈控制透镜组前面或后面的可变孔径光阑机构; 第一旋转赋予构件，其通过所述可变孔径限制机构和所述第一旋转赋予构件之间在光轴方向上的相对运动来旋转所述可变孔径限制机构的打开/关闭环，以便保持 当光圈控制透镜组在变焦范围内移动时，具有小孔径尺寸的可变光阑停止机构; 以及第二旋转赋予构件，其通过所述可变孔径限制机构和所述第二旋转赋予构件之间的相对运动使所述开闭环旋转，以在所述孔径控制透镜组 移动到容纳位置，在该位置处，光圈控制透镜组部分地位于以大孔径尺寸保持的可调节光圈中。

公开(公告)号：US08041204B2

公开(公告)日：2011-10-18

申请号：US12263710

申请日：2008-11-03

申请人： Hiroshi Nomura

发明人： Hiroshi Nomura

IPC分类号： G03B17/00

CPC分类号： G02B7/021 ,  G02B7/026

摘要： An optical element position control mechanism includes an optical element holding member which holds an optical element of a photographing system; an advancing/retracting movement guide member which guides the optical element holding member in an optical axis direction of the photographing system to be movable in the optical axis direction; and a biasing device including an arm, the arm being swingable about a swing axis which is substantially orthogonal to the optical axis and being engaged with the optical element holding member. The biasing device simultaneously exerts via the arm both a biasing force in a direction of movement of the optical element holding member that is guided by the advancing/retracting movement guide member and a biasing force in a direction orthogonal to the direction of movement of the optical element holding member on the optical element holding member.

摘要翻译： 光学元件位置控制机构包括：保持拍摄系统的光学元件的光学元件保持部件; 前进/后退移动引导构件，其将所述光学元件保持构件沿所述拍摄系统的光轴方向引导为能够在所述光轴方向上移动; 以及包括臂的偏置装置，所述臂能够围绕基本上垂直于所述光轴并且与所述光学元件保持构件接合的摆动轴线摆动。 偏置装置同时通过臂施加由前进/后退运动引导构件引导的光学元件保持构件的移动方向上的偏置力和与光学元件的移动方向正交的方向的偏置力 元件保持构件。

公开(公告)号：US07965933B2

公开(公告)日：2011-06-21

申请号：US12263694

申请日：2008-11-03

申请人： Hiroshi Nomura

发明人： Hiroshi Nomura

IPC分类号： G03B17/00

CPC分类号： G02B7/102

摘要： An optical element position control mechanism includes an optical element holding member which holds an optical element of a photographing system and is guided in an optical axis direction; a drive mechanism for moving the optical element holding member in the optical axis direction; and a biasing device including an arm which is swingable about a swing axis, the swing axis being substantially orthogonal to the optical axis, and the arm extending substantially orthogonal to the swing axis and having a free end portion which engages with the optical element holding member to bias the optical element holding member in the optical axis direction.

摘要翻译： 光学元件位置控制机构包括保持拍摄系统的光学元件并沿光轴方向被引导的光学元件保持部件; 用于沿光轴方向移动光学元件保持构件的驱动机构; 以及偏置装置，其包括能够围绕摆动轴摆动的摆动臂，所述摆动轴基本上与所述光轴正交，所述臂基本上垂直于所述摆动轴线延伸并且具有与所述光学元件保持构件接合的自由端部 以沿光轴方向偏置光学元件保持构件。

公开(公告)号：US07944634B2

公开(公告)日：2011-05-17

申请号：US12265132

申请日：2008-11-05

申请人： Hiroshi Nomura

发明人： Hiroshi Nomura

IPC分类号： G02B7/02

CPC分类号： G02B7/023 ,  G02B7/102 ,  G03B9/08

摘要： A support structure for a light quantity control unit of a lens barrel includes a holding frame which holds a light quantity control member; front and rear support members positioned in front and behind the holding frame, respectively; a front guide pin and a front pin support hole formed on one and the other of the holding frame and the front support member, the front guide pin being slidably inserted into the front pin support hole; and a rear guide pin and a rear pin support hole formed on one and the other of the holding frame and the rear support member, the rear guide pin being slidably inserted into the rear pin support hole. The holding frame is supported by the front and rear guide pins and the front and rear pin support holes to be movable between the front and rear support members.

摘要翻译： 用于镜筒的光量控制单元的支撑结构包括保持光量控制构件的保持框架; 分别位于保持框架前后的前后支撑构件; 形成在保持框架和前支撑构件的一个和另一个上的前引导销和前销支撑孔，前引导销可滑动地插入前销支撑孔中; 以及形成在保持框架和后支撑构件的一个和另一个上的后引导销和后销支撑孔，后引导销可滑动地插入后销支撑孔中。 保持框架由前后引导销和前后销支撑孔支撑，以在前支撑构件和后支撑构件之间移动。