公开(公告)号：US06653632B2

公开(公告)日：2003-11-25

申请号：US10295000

申请日：2002-11-14

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： H01J336

CPC分类号： H01J37/28 ,  H01J2237/04756 ,  H01J2237/216

摘要： A scanning-type instrument is realized which utilizes a charged-particle beam and automates adjustments, if a voltage is applied to the specimen, to thereby provide excellent operational controllability. When a voltage is applied to the specimen, the electron beam would normally defocus. A signal corresponding to the voltage applied to the specimen is supplied to a CPU. An objective lens current is supplied to the coil on the objective lens from a power supply under control of the CPU to refocus the beam. As a result, the beam hitting the specimen is prevented from defocusing if a voltage is applied to the specimen. When the strength of the objective lens is varied, scanning signals to the deflection coils are adjusted in response to the variation. Variation in the magnification of the image and rotation of the image are corrected.

摘要翻译： 实现了扫描型仪器，其利用带电粒子束并且如果对样本施加电压则自动进行调整，从而提供优异的操作可控性。 当对样品施加电压时，电子束通常会散焦。 将与施加到样本的电压相对应的信号提供给CPU。 在CPU的控制下，物镜上的线圈被提供给来自电源的物镜，以重新聚焦光束。 结果，如果对样品施加电压，则防止撞击样品的光束散焦。 当物镜的强度变化时，响应于变化来调整到偏转线圈的扫描信号。 校正图像的放大率和图像旋转的变化。

公开(公告)号：US20100140471A1

公开(公告)日：2010-06-10

申请号：US12623510

申请日：2009-11-23

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： G01N23/00 ,  G21K5/04

CPC分类号： H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/15 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2448

摘要： An electron beam apparatus is offered which can well detect backscattered electrons or both backscattered electrons and secondary electrons if an electron detector is disposed above an objective lens in the apparatus. The electron beam apparatus has an electron beam source for emitting an electron beam accelerated by a given accelerating voltage, the objective lens for focusing the electron beam emitted from the beam source onto a specimen, scan coils for scanning the focused beam over the specimen, and the electron detector located above the objective lens and provided with a hole permitting passage of the beam. The detector has an electrode for producing an electric field that attracts the electrons produced from the specimen in response to the electron beam irradiation. Correction coils for correcting deflection of the beam caused by the electric field are located below the detector.

摘要翻译： 如果电子检测器设置在装置中的物镜上方，则提供一种电子束装置，其可以良好地检测反向散射电子或两个后向散射电子和二次电子。 电子束装置具有用于发射由给定的加速电压加速的电子束的电子束源，用于将从光束源发射的电子束聚焦到样本上的物镜，用于扫描聚焦光束在样本上的扫描线圈，以及 该电子探测器位于物镜上方并设置有允许光束通过的孔。 检测器具有用于产生电场的电极，其响应于电子束照射而吸引从样品产生的电子。 用于校正由电场引起的光束偏转的校正线圈位于检测器下方。

公开(公告)号：US06600156B2

公开(公告)日：2003-07-29

申请号：US09917285

申请日：2001-07-27

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： H01J3714

CPC分类号： G01N23/04 ,  H01J37/141 ,  H01J37/28 ,  H01J2237/244

摘要： A scanning electron microscope comprises: an electron gun for emitting an electron beam; a system of condenser lenses; scanning coils; and an objective lens having inner and outer magnetic polepieces to form a magnetic field lens below the lower ends of the polepieces. The inner and outer polepieces are provided with mutually communicating bores via which the backscattered electron detector can be withdrawably inserted into the electron beam path within the objective lens.

公开(公告)号：US08076642B2

公开(公告)日：2011-12-13

申请号：US12623510

申请日：2009-11-23

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： H01J37/28 ,  H01J37/244

CPC分类号： H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/15 ,  H01J2237/2443 ,  H01J2237/24475 ,  H01J2237/2448

摘要： An electron beam apparatus is offered which can well detect backscattered electrons or both backscattered electrons and secondary electrons if an electron detector is disposed above an objective lens in the apparatus. The electron beam apparatus has an electron beam source for emitting an electron beam accelerated by a given accelerating voltage, the objective lens for focusing the electron beam emitted from the beam source onto a specimen, scan coils for scanning the focused beam over the specimen, and the electron detector located above the objective lens and provided with a hole permitting passage of the beam. The detector has an electrode for producing an electric field that attracts the electrons produced from the specimen in response to the electron beam irradiation. Correction coils for correcting deflection of the beam caused by the electric field are located below the detector.

摘要翻译： 如果电子检测器设置在装置中的物镜上方，则提供一种电子束装置，其可以良好地检测反向散射电子或两个后向散射电子和二次电子。 电子束装置具有用于发射由给定的加速电压加速的电子束的电子束源，用于将从光束源发射的电子束聚焦到样本上的物镜，用于扫描聚焦光束在样本上的扫描线圈，以及 该电子探测器位于物镜上方并设置有允许光束通过的孔。 检测器具有用于产生电场的电极，其响应于电子束照射而吸引从样品产生的电子。 用于校正由电场引起的光束偏转的校正线圈位于检测器下方。

公开(公告)号：US06710340B2

公开(公告)日：2004-03-23

申请号：US10072805

申请日：2002-02-08

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： H01J37244

CPC分类号： H01J37/244 ,  H01J2237/1405

摘要： There is disclosed a scanning electron microscope capable of detecting secondary electrons emitted from a specimen, using a semi-in-lens type objective lens. A voltage is applied to the specimen from a power supply to decelerate the electron beam immediately ahead of the specimen. Secondary electrons produced from the specimen are confined by a magnetic lens field and move spirally upward. The secondary electrons moving upward travel linearly from a location where the magnetic field of the objective lens is weak. Then, the electrons strike first and second conversion electrodes, producing a large amount of secondary electrons. A voltage is applied to the front face of a detector to produce an electric field near the first opening in the inner polepiece. This field directs the secondary electrons toward the detector, where they are detected.

摘要翻译： 公开了能够使用半透镜型物镜来检测从试样发出的二次电子的扫描型电子显微镜。 从电源向试样施加电压，使电子束在试样前方减速。 从样品产生的二次电子被磁性透镜场限制，并向上螺旋移动。 向上移动的二次电子从物镜的磁场弱的位置线性移动。 然后，电子撞击第一和第二转换电极，产生大量二次电子。 电压被施加到检测器的正面以在内部极靴中的第一开口附近产生电场。 该场将二次电子引导到检测器，在那里检测它们。

公开(公告)号：US07161149B2

公开(公告)日：2007-01-09

申请号：US10603433

申请日：2003-06-25

申请人： Hiroyoshi Kazumori

发明人： Hiroyoshi Kazumori

IPC分类号： G01N23/00

CPC分类号： H01J37/28 ,  G01N23/2251 ,  H01J37/145 ,  H01J2237/024 ,  H01J2237/026 ,  H01J2237/20207 ,  H01J2237/2809

摘要： A scanning electron microscope has an electron gun producing the electron beam, an objective lens for sharply focusing the beam onto the specimen, a tilting mechanism for tilting the specimen relative to the beam, and a power supply for applying the negative voltage to the specimen. This microscope further includes a cylindrical shield electrode mounted to surround the electron beam path between the objective lens and specimen. A front-end electrode is insulatively mounted to the front-end portion of the shield electrode that is on the specimen side. An electric potential substantially identical to the electric potential at the polepieces of the objective lens is applied to the shield electrode. An electric potential substantially identical to the potential at the specimen is applied to the front-end electrode.

摘要翻译： 扫描电子显微镜具有产生电子束的电子枪，用于将光束聚焦到样本上的物镜，用于使样本相对于光束倾斜的倾斜机构，以及向样本施加负电压的电源。 该显微镜还包括安装成围绕物镜和样品之间的电子束路径的圆柱形屏蔽电极。 前端电极被绝缘地安装在屏蔽电极的在试样侧的前端部分。 将与物镜的极点处的电位基本相同的电位施加到屏蔽电极。 将与试样电位基本相同的电位施加到前端电极。

公开(公告)号：US06852983B2

公开(公告)日：2005-02-08

申请号：US10300670

申请日：2002-11-20

申请人： Miyuki Matsuya ,  Hiroyoshi Kazumori

发明人： Miyuki Matsuya ,  Hiroyoshi Kazumori

IPC分类号： H01J37/10 ,  H01J37/153 ,  H01J37/28 ,  G21K1/08

CPC分类号： H01J37/153 ,  H01J2237/1516 ,  H01J2237/153 ,  H01J2237/1534

摘要： Particle-beam apparatus is realized which is equipped with an aberration corrector capable of controlling the angular aperture of a particle beam after performing aberration correction. The corrector comprises four stages of electrostatic quadrupole elements, two stages of magnetic quadrupole elements for superimposing a magnetic potential distribution analogous to the electric potential distribution created by the two central stages of the electrostatic quadrupole elements, and four stages of electrostatic octupole elements for superimposing an octupole electric potential on the electric potential distribution created by the four stages of electrostatic quadrupole elements. An objective lens is located downstream of the corrector. An objective aperture is located upstream of the corrector. An angular aperture control lens is located downstream of the objective aperture to control the angular aperture of the probe hitting a specimen surface.

摘要翻译： 实现了粒子束装置，其配备有能够在执行像差校正之后控制粒子束的角度孔径的像差校正器。 校正器包括四级静电四极元件，两级磁四极元件，用于叠加类似于由静电四极元件的两个中心级产生的电势分布的磁势分布，以及用于叠加静电四极元件的四级静电八极元件 由四级静电四极元件产生的电位分布上的八极电位。 物镜位于校正器的下游。 物镜孔位于校正器的上游。 角度孔径控制透镜位于物镜孔的下游，以控制探头撞击样品表面的角度孔径。