公开(公告)号：US08089608B2

公开(公告)日：2012-01-03

申请号：US11887584

申请日：2006-04-17

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US20090115977A1

公开(公告)日：2009-05-07

申请号：US11887584

申请日：2006-04-17

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US08724077B2

公开(公告)日：2014-05-13

申请号：US13299891

申请日：2011-11-18

申请人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

发明人： Hiroyuki Nagasaka ,  Kenichi Shiraishi ,  Tomoharu Fujiwara ,  Soichi Owa ,  Akihiro Miwa

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70858 ,  G03F7/70891

摘要： An exposure apparatus includes an immersion space forming member (70) which fills an optical path space (K1) for exposure light (EL) with a first liquid (LQ) to form an immersion space, and a temperature regulating mechanism (60) which suppresses a change in the temperature of the immersion space forming member (70) accompanying deactivation of formation of the immersion space.

摘要翻译： 曝光装置包括：浸没空间形成部件，其用第一液体（LQ）填充曝光用光（EL）的光路空间（K1），形成浸渍空间;以及温度调节机构（60），其抑制 伴随着形成浸入空间的失活，浸渍空间形成部件（70）的温度变化。

公开(公告)号：US08795953B2

公开(公告)日：2014-08-05

申请号：US13227178

申请日：2011-09-07

申请人： Toshikazu Umatate ,  Soichi Owa ,  Tomoharu Fujiwara

发明人： Toshikazu Umatate ,  Soichi Owa ,  Tomoharu Fujiwara

IPC分类号： G03F7/26

CPC分类号： G03F7/70466 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L21/76816

摘要： In a pattern forming method, a first L & S pattern is formed on a wafer; a first protective layer, a second L & S pattern having a perpendicular periodic direction to that of the first L & S pattern, and a photoresist layer are formed to cover the first L & S pattern; a third pattern having first apertures is formed in the photoresist layer to be overlapped with a part of the second L & S pattern; second apertures are formed in the first protective layer via the first apertures; and a part of the first L & S pattern is removed via the second apertures. Accordingly, a pattern including a non-periodic portion finer than a resolution limit of an exposure apparatus is formed.

摘要翻译： 在图案形成方法中，在晶片上形成第一L＆S图案; 第一保护层，具有与第一L＆S图案的垂直周期方向的第二L＆S图案和光致抗蚀剂层形成以覆盖第一L＆S图案; 在光致抗蚀剂层中形成具有第一孔的第三图案，以与第二L＆S图案的一部分重叠; 经由第一孔形成在第一保护层中的第二孔; 并且通过第二孔除去第一L＆S图案的一部分。 因此，形成包括比曝光装置的分辨率极限更细的非周期性部分的图案。

公开(公告)号：US09291814B2

公开(公告)日：2016-03-22

申请号：US13825634

申请日：2011-09-16

申请人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

发明人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

IPC分类号： G03B27/72 ,  G03B27/54 ,  G02B26/00 ,  G02B26/06 ,  G02B5/09 ,  G02B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B5/09 ,  G02B7/1821 ,  G02B26/06 ,  G02B26/0833 ,  G02B27/425 ,  G03F7/70291

摘要： A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.

摘要翻译： 空间光调制器具有多个反射镜元件，每个反射镜元件可控制到第一状态，其中反射镜元件将入射光的相位改变为第一相位和第二状态，反射镜元件反射入射光 光的相位相差不同于第一相的第二相180°; 以及布置在镜元件之间的边界部分，其使入射光的相位基本上与第一相位不同的第三相位（90°+ k·180°）（其中k是整数）改变。 在使用空间光调制器投射图案时，即使通过空间光调制器中的光学元件之间的间隙区域的光的光量大，也可以减小图案中引起的误差。

公开(公告)号：US20130314683A1

公开(公告)日：2013-11-28

申请号：US13993145

申请日：2011-09-22

申请人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

发明人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

IPC分类号： G02B26/06

CPC分类号： G03F7/70425 ,  G02B26/06 ,  G02B26/0841 ,  G03F7/70291 ,  G03F7/70508

摘要： A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

摘要翻译： 一种驱动空间光调制器的方法包括：以镜像元件的阵列设置在第一状态下的镜元件，用于将入射光转换成具有与入射光相同相位的反射光或具有与第一 与来自第一状态的入射光和反射镜元件的入射光和反射镜元件的相位相反，用于将入射光以与第一相位不同大约180°的相位转换成具有第一相位分布的布置的反射光; 并且将所述第一反射镜元件和所述第二反射镜元件的阵列中的所述第一反射镜元件和所述第二反射镜元件设置为具有所述第一相位分布的反转的第二相位分布的布置。

公开(公告)号：US10054858B2

公开(公告)日：2018-08-21

申请号：US13993145

申请日：2011-09-22

申请人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

发明人： Yoji Watanabe ,  Soichi Owa ,  Tomoharu Fujiwara

IPC分类号： G03F7/20 ,  G02B26/06 ,  G02B26/08

CPC分类号： G03F7/70425 ,  G02B26/06 ,  G02B26/0841 ,  G03F7/70291 ,  G03F7/70508

摘要： A method of driving a spatial light modulator includes: setting, in an array of mirror elements, mirror elements in a first state for turning incident light into reflected light with the same phase as that of the incident light or with a phase different by a first phase from that of the incident light and mirror elements in a second state for turning incident light into reflected light with a phase different approximately 180° from the first phase to an arrangement with a first phase distribution; and setting, in the array of mirror elements, the first mirror elements and the second mirror elements to an arrangement with a second phase distribution which is an inversion of the first phase distribution.

公开(公告)号：US20130278912A1

公开(公告)日：2013-10-24

申请号：US13825634

申请日：2011-09-16

申请人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

发明人： Soichi Owa ,  Yoji Watanabe ,  Tomoharu Fujiwara

IPC分类号： G02B26/06

CPC分类号： G03F7/70191 ,  G02B5/09 ,  G02B7/1821 ,  G02B26/06 ,  G02B26/0833 ,  G02B27/425 ,  G03F7/70291

摘要： A spatial light modulator has a plurality of mirror elements each of which is controllable into a first state in which the mirror element reflects incident light with a change in a phase thereof by a first phase and a second state in which the mirror element reflects the incident light with a change in the phase thereof by a second phase 180° different from the first phase; and a boundary portion arranged between the mirror elements, which changes the phase of the incident light by a third phase substantially (90°+k·180°) (where k is an integer) different from the first phase. In projecting a pattern with the use of the spatial light modulator, an error caused in the pattern can be reduced even if the light quantity of light passing a gap region between the optical elements in the spatial light modulator is large.

摘要翻译： 空间光调制器具有多个反射镜元件，每个反射镜元件可控制到第一状态，其中反射镜元件将入射光的相位改变为第一相位和第二状态，反射镜元件反射入射光 光的相位相差不同于第一相的第二相180°; 以及布置在镜元件之间的边界部分，其使入射光的相位基本上与第一相位不同的第三相位（90°+ k·180°）（其中k是整数）改变。 在使用空间光调制器投射图案时，即使通过空间光调制器中的光学元件之间的间隙区域的光的光量大，也可以减小图案中引起的误差。

公开(公告)号：US20090218743A1

公开(公告)日：2009-09-03

申请号：US12379229

申请日：2009-02-17

申请人： Tomoharu Fujiwara ,  Hiroyuki Nagasaka

发明人： Tomoharu Fujiwara ,  Hiroyuki Nagasaka

IPC分类号： H01L21/687 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/707

摘要： A substrate holding apparatus holds a substrate that is exposed by exposure light that passes through a liquid. The substrate holding apparatus comprises: an opening; and a first holding part, which has a holding surface for holding the substrate inside the opening. At least part of an edge part that defines the opening has a first surface and a second surface, which is provided above and is nonparallel to the first surface. The second surface extends from a boundary part between the first surface and the second surface both upward and toward the outer side with respect to a center of the opening. The boundary part between the first surface and the second surface is substantially the same height as or higher than a front surface of the substrate, which is held by the first holding part.

摘要翻译： 基板保持装置保持通过通过液体的曝光光曝光的基板。 基板保持装置包括：开口; 以及具有用于将基板保持在开口内的保持面的第一保持部。 限定开口的边缘部分的至少一部分具有第一表面和第二表面，其设置在上方并且不平行于第一表面。 第二表面从第一表面和第二表面之间的边界部分相对于开口的中心向上和朝向外侧延伸。 第一表面和第二表面之间的边界部分基本上与由第一保持部分保持的基板的前表面相同或更高。

公开(公告)号：US20080049209A1

公开(公告)日：2008-02-28

申请号：US10594963

申请日：2006-03-20

申请人： Hiroyuki Nagasaka ,  Tomoharu Fujiwara

发明人： Hiroyuki Nagasaka ,  Tomoharu Fujiwara

IPC分类号： G03B27/58 ,  G03B15/00

CPC分类号： H01L21/68735 ,  G03F7/11 ,  G03F7/70341 ,  G03F7/707 ,  H01L21/68714 ,  H01L21/6875 ,  H01L21/68757

摘要： A substrate holder PH includes a first holder PH1 which holds a substrate P, a liquid-repellent inner surface Tc of a plate member T which faces a side surface Pc of the substrate P held on the first holder PH1 via a predetermined gap A, and a chamfered portion C provided on an upper portion of the inner surface Tc. On the side surface Pc of the substrate P, a liquid-repellent area is provided, and the chamfered portion C is provided so as to face the liquid-repellent area of the substrate P held on the first holder PH1. Thereby, a substrate holding device which can restrain inflow of the liquid into the back surface side of the substrate is provided.

摘要翻译： 衬底保持器PH包括保持衬底P的第一保持器PH1，经由预定间隙A保持在第一保持器PH 1上的与衬底P的侧表面Pc相对的板构件T的拒水性内表面Tc 以及设置在内表面Tc的上部的倒角部C. 在基板P的侧面Pc上设置防液区域，并且设置倒角部分C，以面对保持在第一保持器PH 1上的基板P的拒水区域。 由此，设置能够抑制液体流入基板的背面侧的基板保持装置。