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    Camera having scale imprintable capabilities and method for imprinting the scale
    2.
    发明授权
    Camera having scale imprintable capabilities and method for imprinting the scale 失效
    相机具有刻度的刻印能力和刻印尺度的方法

    公开(公告)号：US5937213A

    公开(公告)日：1999-08-10

    申请号：US826041

    申请日：1997-03-28

    申请人： Hiroshi Wakabayashi ,  Hiroshi Terunuma ,  Hidenori Miyamoto ,  Hideya Inoue ,  Toshiyuki Nakamura ,  Tatsuo Amanuma ,  Yoshikazu Iida ,  Yoshihiro Takeuchi

    发明人： Hiroshi Wakabayashi ,  Hiroshi Terunuma ,  Hidenori Miyamoto ,  Hideya Inoue ,  Toshiyuki Nakamura ,  Tatsuo Amanuma ,  Yoshikazu Iida ,  Yoshihiro Takeuchi

    IPC分类号： G03B17/24

    CPC分类号： G03B17/24 ,  G03B2206/004 ,  G03B2217/243 ,  G03B2217/244

    摘要： A camera, such as a video camera or other electrically recordable camera, has scale imprintable capabilities and a method for imprinting a scale onto memory storage media. The camera and method imprints, optically or electrically, a standard scale on memory storage media for the purpose of estimating the size of a subject image. A photographic magnification calculation circuit calculates the photographic magnification based on a subject distance, and a reference scale setting circuit sets a reference scale for the purpose of estimating the size of the subject image on the memory storage media regardless of the magnification during picture taking or print size. An imprinting circuit imprints, optically or electrically, the reference scale onto the memory storage media in accordance with the reference scale setting circuit, and only when needed or wanted. The reference scale can be imprinted in a vertical or horizontal direction in accordance with a mode selection switch. In addition, date, time and other information can also be imprinted onto the memory storage media. Picture taking will not be performed when it is not possible to accurately superimpose the reference scale and warning displays are generated.

    摘要翻译： 诸如摄像机或其他电子可记录照相机的相机具有可缩放的刻印能力和用于将刻度压印到存储器存储介质上的方法。 为了估计被摄体图像的尺寸，照相机和方法在存储器存储介质上以光学或电气方式印刷标准尺度。 摄影倍率计算电路基于被摄体距离来计算摄影倍率，并且参考比例设置电路设置用于在存储器存储介质上估计被摄体图像的尺寸的参考刻度，而不考虑在拍摄或打印期间的放​​大倍率 尺寸。 刻印电路根据参考比例设置电路将参考刻度光学或电气印记到存储器存储介质上，并且仅在需要或想要时才印刷。 根据模式选择开关，可以在垂直或水平方向上印刷参考刻度。 此外，日期，时间和其他信息也可以打印到存储器存储介质上。 如果无法准确地叠加参考刻度并且生成警告显示，则不执行拍摄。

    Camera-shake display device
    4.
    发明授权
    Camera-shake display device 失效
    相机震动显示设备

    公开(公告)号：US5537185A

    公开(公告)日：1996-07-16

    申请号：US432255

    申请日：1995-05-01

    申请人： Sueyuki Ohishi ,  Susumu Sato ,  Hideya Inoue ,  Akira Katayama

    发明人： Sueyuki Ohishi ,  Susumu Sato ,  Hideya Inoue ,  Akira Katayama

    IPC分类号： G03B17/00 ,  G03B5/00 ,  G03B17/18

    CPC分类号： G03B5/00 ,  G03B17/18 ,  G03B2205/0007 ,  G03B2217/005 ,  G03B2217/185

    摘要： A camera-shake display device comprises a detection unit for determining whether a photographing lens detachably mounted on a camera body is provided with a compensation optical system for compensating camera-shake upon reception of a signal representing the camera-shake amount corresponding to a displacement of the camera body, and a display unit for displaying whether the camera-shake compensation is attainable or not in accordance with the output of the detection unit.

    摘要翻译： 相机抖动显示装置包括：检测单元，用于确定可拆卸地安装在相机主体上的拍摄镜头是否设置有补偿光学系统，用于在接收到表示相应于相机抖动量的相机震动量的信号时补偿相机震动 相机主体和用于根据检测单元的输出来显示是否可以获得相机抖动补偿的显示单元。

    Method, medium, and system for recommending associated products
    6.
    发明授权
    Method, medium, and system for recommending associated products 有权

    公开(公告)号：US09665894B2

    公开(公告)日：2017-05-30

    申请号：US13529429

    申请日：2012-06-21

    申请人： Masami Kumazawa ,  Hideya Inoue ,  Koji Yamagaki

    发明人： Masami Kumazawa ,  Hideya Inoue ,  Koji Yamagaki

    IPC分类号： G06Q30/00 ,  G06Q30/06

    CPC分类号： G06F17/30277 ,  G06F17/30864 ,  G06Q30/0601

    摘要： A retrieval support system includes a database which stores commodity image data; a retrieval unit which acquires commodity image data having image characteristic information which is the same as or similar to image characteristic information indicating a characteristic in an image of input image data, from the database, with respect to the input image data; and a condition setting unit which sets a retrieval condition including at least one of time information relating to time, place information relating to places and occasion information relating to occasions. The retrieval unit performs retrieval of the commodity image data based on the retrieval condition set by the condition setting unit. The commodity image data acquired by the retrieval unit and information relating to a commodity different from a commodity corresponding to the commodity image data are output together.

    Exposure method and electronic device manufacturing method
    7.
    发明申请
    Exposure method and electronic device manufacturing method 审中-公开
    曝光方法和电子元件制造方法

    公开(公告)号：US20090042139A1

    公开(公告)日：2009-02-12

    申请号：US12071911

    申请日：2008-02-27

    申请人： Naomasa Shiraishi ,  Hideya Inoue

    发明人： Naomasa Shiraishi ,  Hideya Inoue

    IPC分类号： G03F7/20

    CPC分类号： G03F7/70783 ,  G03F7/70266 ,  G03F7/703 ,  G03F7/70425 ,  G03F7/70633 ,  G03F9/7003 ,  G03F9/7084 ,  G03F9/7088 ,  H01L23/544 ,  H01L2223/54453 ,  H01L2223/5446 ,  H01L2223/5448 ,  H01L2924/0002 ,  H01L2924/00

    摘要： An exposure method enabling deformation occurring in a unit exposure field to be measured rapidly and accurately and enabling a plurality of patterns to be superimposed on a substrate with high accuracy. The exposure method of the present embodiment for exposing a bright-dark pattern on the substrate using a projection optical system includes a position detection process for detecting the positions of a plurality of position detection marks, relative to a substrate-in-plane-direction of the substrate, arranged in at least one functional element in a unit exposure field of the substrate, a deformation calculation process for calculating the state of deformation occurring in the unit exposure field based on information related to the positions of the position detection marks obtained in the position detection process, and a shape modification process for modifying the shape of the bright-dark pattern to be exposed on the substrate based on the deformation state obtained in the deformation calculation process.

    摘要翻译： 能够快速，准确地测量在单位曝光场中发生变形的曝光方法，能够将多个图案高精度地叠加在基板上。 使用投影光学系统在基板上曝光明暗图案的本实施例的曝光方法包括：位置检测处理，用于检测多个位置检测标记相对于基板的平面方向的位置 基板，布置在基板的单位曝光区域中的至少一个功能元件中，基于与在所述基板中获得的位置检测标记的位置相关的信息来计算在单位曝光区域中发生的变形状态的变形计算处理 位置检测处理，以及用于基于在变形计算处理中获得的变形状态来修改要暴露在基板上的亮暗图案的形状的形状修改处理。

    Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device
    8.
    发明授权
    Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device 有权
    激光等离子体EUV光源，靶材料，胶带材料，制造靶材的方法，提供靶材的方法以及EUV曝光装置

    公开(公告)号：US07456417B2

    公开(公告)日：2008-11-25

    申请号：US11329116

    申请日：2006-01-11

    申请人： Katsuhiko Murakami ,  Hideya Inoue

    发明人： Katsuhiko Murakami ,  Hideya Inoue

    IPC分类号： G21G4/00 ,  G01N21/64 ,  G01J3/10

    CPC分类号： G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  H05G2/001

    摘要： Target 1 that is arranged in the disc direction is sprayed from nozzle 2 that has a slit-shaped aperture. Target 1 is conveyed on a gas stream. He gas is used in this example. Nozzle 2 may be vibrated by a piezo apparatus to spray disc-shaped target 1. Target 1 that is sprayed from nozzle 2 reaches the irradiation position of laser light with its direction unchanged since the exterior of nozzle 2 is maintained in a high vacuum. Synchronized with delivery of target 1, pulse laser light 5 from Nd:YAG light source 4 is focused by lens 3 and irradiated onto target 1. The spot diameter of the laser is the same 1 mm diameter as that of target 1. The thickness is not more than 1000 nm. Therefore, virtually the entire target is converted into plasma, debris generation is inhibited and the conversion efficiency is elevated.

    摘要翻译： 从盘状方向配置的靶1从具有狭缝状孔的喷嘴2喷出。 靶1在气流上传送。 在这个例子中使用了他的气体。 喷嘴2可以通过压电装置振动以喷射盘形靶1。 从喷嘴2喷射的目标1到达激光的照射位置，其方向不变，因为喷嘴2的外部保持在高真空中。 与目标1的传送同步，来自Nd：YAG光源4的脉冲激光5被透镜3聚焦并照射到目标1上。 激光的光斑直径与目标1的直径相同。 厚度不超过1000nm。 因此，实际上整个目标被转换为等离子体，碎片产生被抑制并且转换效率提高。