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    Process monitoring and control system and method of process monitoring and control
    1.
    发明授权
    Process monitoring and control system and method of process monitoring and control 失效
    过程监控与控制系统及过程监控方法

    公开(公告)号：US4942514A

    公开(公告)日：1990-07-17

    申请号：US268714

    申请日：1988-11-09

    申请人： Hisanori Miyagaki ,  Katsuhito Shimizu ,  Haruya Tobita ,  Atsushi Takita ,  Tooru Kimura ,  Akira Sugano ,  Masayuki Kikuchi ,  Masayuki Fukai

    发明人： Hisanori Miyagaki ,  Katsuhito Shimizu ,  Haruya Tobita ,  Atsushi Takita ,  Tooru Kimura ,  Akira Sugano ,  Masayuki Kikuchi ,  Masayuki Fukai

    IPC分类号： G05B23/02 ,  G06F3/033

    CPC分类号： G06F3/033 ,  G05B23/0216

    摘要： A system and a method of monitoring and displaying in which control screen indicating a control data of a control device for process control displayed on the display screen of a display unit by a touch operation on a diagram of the control device, the control data being further selected by another touch operation. The display condition of the control data display area thus changes, the operator being permitted to visually check whether the operation has been selected correctly. After visual confirmation, a switch disposed outside of the display screen and corresponding to the called control screen is operated to start the operation of the control device determined for control for the first time at this time point. In case of a combined display of a control device and a control screen, on the other hand, a first display unit is utilized such that the called control screen is displayed at a position far from the control device to be controlled, thereby not hiding the control device display. The control screen may be moved to a given position on the system diagram. A second display unit is utilized such that the original system diagram is displayed in a reduced form in combination with and not superimposed on the called control screen. The control screen and the control-related screen are called repeatedly so that when the reduction rate of the original system diagram exceeds a critical value, the reduction rate is fixed to a predetermined value and the control screens are displayed in scroll.

    摘要翻译： 一种监视和显示控制屏幕的系统和方法，其中控制屏幕通过在控制装置的图表上的触摸操作显示在显示单元的显示屏上，显示用于过程控制的控制装置的控制数据，控制数据进一步 通过另一个触摸操作选择。 因此，控制数据显示区域的显示条件改变，允许操作者目视检查操作是否被正确选择。 在视觉确认之后，操作设置在显示屏外部并对应于被叫控制屏幕的开关，以开始在该时间点首次确定的用于控制的控制装置的操作。 另一方面，在控制装置和控制画面的组合显示的情况下，使用第一显示单元，使得被叫控制画面显示在远离被控制的控制装置的位置，从而不会隐藏 控制装置显示。 控制屏幕可以移动到系统图上的给定位置。 使用第二显示单元，使得原始系统图与减少的形式一起显示，并且不叠加在被叫控制屏幕上。 重复调用控制画面和控制相关画面，使得当原始系统图的缩小率超过临界值时，缩小率固定为预定值，控制画面以滚动显示。

    Process controller for controlling a process to a target state
    2.
    发明授权
    Process controller for controlling a process to a target state 失效
    用于将过程控制到目标状态的过程控制器

    公开(公告)号：US5268835A

    公开(公告)日：1993-12-07

    申请号：US762332

    申请日：1991-09-19

    申请人： Hisanori Miyagaki ,  Akira Sugano ,  Atsushi Takita ,  Eiji Toyama ,  Katsuhito Shimizu ,  Haruya Tobita ,  Hiroshi Matsumoto ,  Masahide Nomura ,  Tooru Kimura

    发明人： Hisanori Miyagaki ,  Akira Sugano ,  Atsushi Takita ,  Eiji Toyama ,  Katsuhito Shimizu ,  Haruya Tobita ,  Hiroshi Matsumoto ,  Masahide Nomura ,  Tooru Kimura

    IPC分类号： G05B23/00 ,  G05B13/02 ,  G05B23/02 ,  G06F15/46 ,  G05B13/04

    CPC分类号： G05B13/0285 ,  Y10S706/90 ,  Y10S706/904

    摘要： A process controller having a setting section for giving a target value for a fixed period of time, a control section including a predicting section for predicting a process response for the fixed time period in accordance with a current value of a process control amount and a virtual value of an operation amount; a quantitating section for quantitating a difference between the target value and the result by the predicting section; a calculating section for calculating a basic signal of the operation amount in accordance with the quantitated result, and an optimizing section including a predicting section for predicting a process response for the fixed time period with a control amount and an initial operation amount of the process; another quantitating section for quantitating a difference between the prediction and the target value, a calculating section for calculating the operation amount in accordance with the second quantitated result; and a section for performing control in such a way that the quantitating result and a predetermined evaluation criterion are compared with each other to perform an evaluation. The calculated result of the operation amount is repeatedly applied to the predicting section until the evaluation criterion is satisfied, a correcting signal used for optimizing the operation amount is obtained from a value of the operation amount when the quantitated result satisfies the criterion, and the correcting signal is added to a basic signal of the control section, and the adding result is output to the process.

    摘要翻译： 一种处理控制器，具有用于给定固定时间段的目标值的设定部分，控制部分，包括预测部分，用于根据过程控制量的当前值预测固定时间段内的处理响应，虚拟 操作量值; 定量部分，用于对预测部分的目标值和结果之间的差进行定量; 计算部分，用于根据定量结果计算操作量的基本信号;以及优化部分，其包括预测部分，用于利用处理的控制量和初始操作量来预测固定时间段的处理响应; 用于定量预测和目标值之间的差的另一定量部分，用于根据第二定量结果计算操作量的计算部分; 以及用于执行控制的部分，使得将定量结果和预定评估标准彼此进行比较以进行评估。 将运算量的计算结果重复施加到预测部，直到满足评价标准为止，从定量结果满足标准的操作量的值获得用于优化操作量的校正信号， 信号被添加到控制部的基本信号，并将相加结果输出到处理。

    Photosensitive resin film and cured film made therefrom
    6.
    发明授权
    Photosensitive resin film and cured film made therefrom 有权
    感光树脂膜和由其制成的固化膜

    公开(公告)号：US07214471B2

    公开(公告)日：2007-05-08

    申请号：US10551447

    申请日：2004-03-25

    申请人： Shin-ichiro Iwanaga ,  Tooru Kimura ,  Kouji Nishikawa

    发明人： Shin-ichiro Iwanaga ,  Tooru Kimura ,  Kouji Nishikawa

    IPC分类号： G03F7/033

    CPC分类号： G03F7/031 ,  C08L33/04 ,  G03F7/029 ,  G03F7/033 ,  Y10S430/111 ,  Y10S430/121 ,  Y10S430/124 ,  C08L2666/02

    摘要： The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use of which a coating film having a dry film thickness of 70 μm in an uncured state has a 365 nm radiation transmittance of not less than 10% and a 405 nm radiation transmittance of not less than 60%, contains the radiation-sensitive radical polymerization initiator (C) in an amount of 20 to 40 parts by weight based on 100 parts by weight of the component (A), and has a dry film thickness of not less than 50 μm. According to the photosensitive resin film, a high bump having a height of not less than 50 μm can be readily formed on a chip substrate with high precision though formation of such a high bump is difficult by the conventional technique. Moreover, connection failure of an element can be inhibited, and reliability of an element can be enhanced.

    摘要翻译： 本发明的未固化状态的感光性树脂膜包含（A）特定的碱溶性共聚物，（B）具有至少一个烯键式不饱和双键的化合物和（C）使用辐射敏感性自由基聚合引发剂的 在未固化状态下具有70μm的干膜厚度的涂膜具有不小于10％的365nm辐射透射率和不小于60％的405nm辐射透射率，其含有辐射敏感性自由基聚合引发剂（ C）相对于100重量份组分（A）为20至40重量份，干膜厚度不小于50微米。 根据感光性树脂膜，通过以往的技术难以形成这样高的凸起，难以高精度地在芯片基板上形成高度不小于50μm的高凸点。 此外，可以抑制元件的连接故障，并且可以提高元件的可靠性。

    Method for providing power plant maintenance services
    7.
    发明授权
    Method for providing power plant maintenance services 有权
    提供电厂维修服务的方法

    公开(公告)号：US06768970B2

    公开(公告)日：2004-07-27

    申请号：US10458379

    申请日：2003-06-11

    申请人： Satoru Shimizu ,  Tooru Kimura ,  Yoshio Maruyama

    发明人： Satoru Shimizu ,  Tooru Kimura ,  Yoshio Maruyama

    IPC分类号： G06F1100

    CPC分类号： G05B23/0256 ,  G05B23/0264 ,  G05B23/027 ,  G05B2223/06 ,  Y04S10/522

    摘要： An objective is to quickly provide appropriate maintenance services at low costs during routine inspection procedures and/or upon occurrence of abnormal events at thermal power plants or stations. In a thermal power plant maintenance system comprising a control device 1 for control of operation conditions and process amounts of plant equipment and a maintenance tool 2 operatively linked to the control device 1 via a network 7 for performing maintenance of a controlling controller 11 as built in the control device 1, the system further comprises a remote maintenance device 3 that executes similar functions to those offered by the maintenance tool 2 for bidirectionally transferring plant data along with data concerning the controlling controller 11's status via a communications line 8 between the maintenance tool 2 and the remote maintenance device 3 to thereby provide maintenance services of the thermal power plant of interest.

    摘要翻译： 目的是在日常检查程序和/或在火力发电厂或车站发生异常事件时以低成本快速提供适当的维护服务。在火力发电厂维护系统中，包括用于控制运行条件和过程的控制装置1 数量的工厂设备和维护工具2经由网络7可操作地连接到控制装置1，用于执行内置在控制装置1中的控制控制器11的维护，该系统还包括远程维护装置3，其执行与 由维护工具2提供的用于通过维护工具2和远程维护装置3之间的通信线8双向传送工厂数据以及与控制控制器11的状态有关的数据，从而提供感兴趣的热电厂的维护服务。

    Negative radiation-sensitive resin composition
    8.
    发明申请
    Negative radiation-sensitive resin composition 有权
    负辐射敏感树脂组合物

    公开(公告)号：US20070190450A1

    公开(公告)日：2007-08-16

    申请号：US10593972

    申请日：2005-03-24

    申请人： Kouji Nishikawa ,  Tooru Kimura ,  Shin-ichiro Iwanaga

    发明人： Kouji Nishikawa ,  Tooru Kimura ,  Shin-ichiro Iwanaga

    IPC分类号： G03C1/00

    CPC分类号： G03F7/40 ,  G03F7/033 ,  Y10S430/107 ,  Y10S430/111 ,  Y10S430/117 ,  Y10S430/119 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/126

    摘要： It is an object of the present invention to provide a process capable of precisely producing a plated shaped article of a large thickness such as a bump or a wiring, a negative radiation-sensitive resin composition which is preferably used for the process and has excellent sensitivity and resolution, and a transfer film using the composition. The above object is achieved by a negative radiation-sensitive resin composition comprising (A) a polymer containing structural units represented by the following formula (1) and/or the following formula (2), (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator, and by forming a negative radiation-sensitive resin film using the composition.

    摘要翻译： 本发明的目的是提供一种能够精确地制造诸如凸块或布线的大厚度镀覆成形制品的方法，优选用于该方法并具有优异灵敏度的负型辐射敏感性树脂组合物 和分辨率，以及使用该组合物的转印膜。 上述目的是通过负辐射敏感性树脂组合物实现的，其包含（A）含有由下式（1）和/或下式（2）表示的结构单元的聚合物，（B）具有至少一个烯键式 不饱和双键和（C）辐射敏感自由基聚合引发剂，并使用该组合物形成负辐射敏感树脂膜。

    Radiation-sensitive resin composition
    9.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US07141355B2

    公开(公告)日：2006-11-28

    申请号：US10477207

    申请日：2002-12-13

    申请人： Shin-ichiro Iwanaga ,  Satoshi Iwamoto ,  Tooru Kimura ,  Hiroko Nishimura ,  Koji Nishikawa

    发明人： Shin-ichiro Iwanaga ,  Satoshi Iwamoto ,  Tooru Kimura ,  Hiroko Nishimura ,  Koji Nishikawa

    IPC分类号： G03F7/038 ,  G03F7/30

    CPC分类号： G03F7/033 ,  G03F7/405

    摘要： A radiation-sensitive resin composition comprising (A) an alkali-soluble resin having an unsaturated group, (B) a compound having at least one ethylenically unsaturated double bond, and (C) a radiation-induced radical polymerization initiator, wherein: the alkali-soluble resin having an unsaturated group (A) is obtained by reacting: 100 parts by weight of a copolymer comprising 1 to 40 wt % structural units derived from (a) a radically polymerizable compound having a carboxyl group; 1 to 50 wt % structural units having a phenolic hydroxyl group which are derived from (b-1) a radically polymerizable compound having a phenolic hydroxyl group or (b-2) a radically polymerizable compound having a functional group convertible into a phenolic hydroxyl group after the copolymerization, other structural units of said copolymer being derived from (c) another radically polymerizable compound; with 0.1 to 20 parts by weight of (d) a radically polymerizable compound having an epoxy group. The resin composition can form a radiation-sensitive film in a thickness greater than a deposit thickness and has a high resolution.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）具有不饱和基团的碱溶性树脂，（B）具有至少一个烯键式不饱和双键的化合物和（C）辐射诱导的自由基聚合引发剂，其中：所述碱 通过使100重量份的由（a）具有羧基的自由基聚合性化合物衍生的1〜40重量％结构单元的共聚物反应得到具有不饱和基团（A）的可溶性树脂; （b-1）具有酚羟基的自由基聚合性化合物或（b-2）具有可转化为酚羟基的官能团的自由基聚合性化合物的酚羟基的1〜50重量％结构单元 共聚后，所述共聚物的其它结构单元衍生自（c）另一种可自由基聚合的化合物; （d）具有环氧基的自由基聚合性化合物为0.1〜20重量份。 树脂组合物可以形成厚度大于沉积物厚度的辐射敏感膜并具有高分辨率。