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1.发明授权Method and apparatus for creating and displaying navigators for guiding to related image information 失效用于创建和显示用于引导相关图像信息的导航器的方法和装置
公开(公告)号：US5123088A
公开(公告)日：1992-06-16
申请号：US370968
申请日：1989-06-26
IPC分类号： G06F17/30
CPC分类号： G06F17/30277 , Y10S707/99945 , Y10S707/99948
摘要： Image information units, related with one another in the order of their magnitudes defined for each of a plurality of properties of each image, are prestored in an image information storage and management device. All image information units adjoiningly related by their properties with a main image being displayed on a display are read out of the image information storage and management device, and contracted images of the read-out image information units are displayed as navigators on the display screen, together with the main image.
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2.发明授权Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US07851108B2
公开(公告)日：2010-12-14
申请号：US11391332
申请日：2006-03-29
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.
摘要翻译： 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息，关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板可以用于制造新的掩模坯料。
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3.发明申请Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US20060246361A1
公开(公告)日：2006-11-02
申请号：US11391332
申请日：2006-03-29
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate includes a marking step of irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate to thereby form a pit that is used as a marker for identifying or managing the mask blank glass substrate.
摘要翻译： 掩模坯料玻璃基板的制造方法具备：在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域的镜面上的激光标记工序，形成使用的凹坑 作为用于识别或管理掩模坯料玻璃基板的标记。
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4.发明授权Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask 有权掩模坯料玻璃基板的制造方法，掩模坯料的制造方法，掩模制造方法，掩模坯料玻璃基板，掩模坯料和掩模公开(公告)号：US07955763B2
公开(公告)日：2011-06-07
申请号：US12946360
申请日：2010-11-15
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.
摘要翻译： 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息，关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 可以使用具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板来制造新的掩模坯料。
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5.发明申请MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, MASK MANUFACTURING METHOD, MASK BLANK GLASS SUBSTRATE, MASK BLANK, AND MASK 有权掩模玻璃基板制造方法，掩模制造方法，掩模制造方法，掩模玻璃基板，掩模布和掩模公开(公告)号：US20110059390A1
公开(公告)日：2011-03-10
申请号：US12946360
申请日：2010-11-15
IPC分类号： G03F1/00
CPC分类号： G03F1/38 , Y10T428/31616
摘要： A method of manufacturing a mask blank glass substrate or mask blank that includes a mark forming step, and a mask blank glass substrate or mask blank that includes a mark. The mark is a pit formed by irradiating laser light onto a mirror-like surface in an area, having no influence on transfer, on a surface of the mask blank glass substrate. The pit is used as a marker for individually identifying or managing the mask blank glass substrate. The marker may be correlated with information including at least one of substrate information about the mask blank glass substrate, thin film information about the mask pattern thin film, and resist film information about the resist film. A mask blank glass substrate with marker correlated to at least one of the resist film information and thin film information may be used to manufacture a new mask blank.
摘要翻译： 包括标记形成步骤的掩模坯料玻璃基板或掩模坯料的制造方法以及包括标记的掩模坯料玻璃基板或掩模坯料。 标记是通过在掩模坯料玻璃基板的表面上将激光照射到不影响转印的区域中的镜状表面上形成的凹坑。 凹坑用作单独识别或管理掩模坯料玻璃基板的标记。 标记可以与包括关于掩模坯料玻璃基板的基板信息，关于掩模图案薄膜的薄膜信息和关于抗蚀剂膜的抗蚀剂膜信息中的至少一个的信息相关联。 具有与抗蚀剂膜信息和薄膜信息中的至少一个相关的标记的掩模坯料玻璃基板可以用于制造新的掩模坯料。
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6.发明授权Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method 有权掩模坯料玻璃基板，掩模坯料玻璃基板制造方法，掩模坯料制造方法和掩模制造方法公开(公告)号：US08048591B2
公开(公告)日：2011-11-01
申请号：US12486106
申请日：2009-06-17
申请人： Hisashi Kasahara , Yasushi Okubo
发明人： Hisashi Kasahara , Yasushi Okubo
IPC分类号： G03F1/00
摘要： A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.
摘要翻译： 掩模坯料玻璃基板用于制造掩模坯料。 在掩模坯料玻璃基板中，通过多个凹坑表示用于识别或管理掩模坯料玻璃基板的信息的标记在掩模坯料的形成不影响转印图案的区域的表面上形成 玻璃基板。 形成标记物的每个凹坑都是一个圆形孔，其边缘部分大致为圆形，相邻凹坑的边缘部分之间的距离L1为50μm以上。 标记物例如形成在掩模坯料玻璃基板的端面上。
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7.发明申请MASK BLANK GLASS SUBSTRATE, MASK BLANK GLASS SUBSTRATE MANUFACTURING METHOD, MASK BLANK MANUFACTURING METHOD, AND MASK MANUFACTURING METHOD 有权掩模玻璃基板，掩模玻璃基板制造方法，掩模制造方法和掩模制造方法公开(公告)号：US20090317729A1
公开(公告)日：2009-12-24
申请号：US12486106
申请日：2009-06-17
申请人： Hisashi Kasahara , Yasushi Okubo
发明人： Hisashi Kasahara , Yasushi Okubo
IPC分类号： G03F1/00
摘要： A mask blank glass substrate is for use in manufacturing a mask blank. In the mask blank glass substrate, a marker expressing, by a plurality of pits, information for identifying or managing the mask blank glass substrate is formed on a surface of a region, having no influence on formation of a transfer pattern, of the mask blank glass substrate. Each of the pits forming the marker is a round hole with its edge portion being generally circular and a distance L1 between the edge portions of the adjacent pits is 50 μm or more. The marker is formed, for example, on an end face of the mask blank glass substrate.
摘要翻译： 掩模坯料玻璃基板用于制造掩模坯料。 在掩模坯料玻璃基板中，通过多个凹坑表示用于识别或管理掩模坯料玻璃基板的信息的标记在掩模坯料的形成不影响转印图案的区域的表面上形成 玻璃基板。 形成标记的每个凹坑都是圆孔，其边缘部分大致为圆形，并且相邻凹坑的边缘部分之间的距离L1为50μm或更大。 标记物例如形成在掩模坯料玻璃基板的端面上。
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公开(公告)号：US08021804B2
公开(公告)日：2011-09-20
申请号：US12491578
申请日：2009-06-25
申请人： Yasushi Okubo , Hisashi Kasahara
发明人： Yasushi Okubo , Hisashi Kasahara
CPC分类号： G03F1/42
摘要： A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.
摘要翻译： 光掩模制造方法包括：缺陷信息存储步骤，将与其相应的信息存储装置，将其端面上设置有识别标记的掩模毛坯的缺陷信息存储在存储装置中;放置取向确定步骤， 相对于曝光/书写装置放置掩模坯料的取向;以及方向校正步骤，对旋转装置进行旋转控制，使得掩模毛坯的取向与所确定的放置取向一致。
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公开(公告)号：US20090325083A1
公开(公告)日：2009-12-31
申请号：US12491578
申请日：2009-06-25
申请人： Yasushi OKUBO , Hisashi Kasahara
发明人： Yasushi OKUBO , Hisashi Kasahara
IPC分类号： G03F1/00
CPC分类号： G03F1/42
摘要： A photomask manufacturing method includes a defect information storage step of storing defect information of a mask blank, provided with an identification marker on an end face thereof, into an information storage device in correspondence to the identification marker, a placing orientation determination step of determining a placing orientation of the mask blank with respect to an exposure/writing apparatus, and an orientation correction step of performing rotation control of a rotating apparatus so that an orientation of the mask blank coincides with the determined placing orientation.
摘要翻译： 光掩模制造方法包括：缺陷信息存储步骤，将与其相应的信息存储装置，将其端面上设置有识别标记的掩模毛坯的缺陷信息存储在存储装置中;放置取向确定步骤， 相对于曝光/书写装置放置掩模坯料的取向;以及方向校正步骤，对旋转装置进行旋转控制，使得掩模毛坯的取向与所确定的放置取向一致。
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