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公开(公告)号：US4210942A
公开(公告)日：1980-07-01
申请号：US883155
申请日：1978-03-03
摘要： In a video signal play-back circuit connected so that a play-back signal from a magnetic head may be applied to an amplifier circuit through a resonance circuit which consists of an inductance element and a capacitance element, a resistor for adjusting the quality factor Q of the resonance circuit is connected between one terminal of the resonance circuit and one output terminal of the amplifier circuit, thereby to reduce thermal noises which develop from the Q adjusting resistor.
摘要翻译： 在连接使得来自磁头的回放信号可以通过由电感元件和电容元件构成的谐振电路施加到放大器电路的视频信号回放电路中，用于调节质量因子Q 谐振电路的一端与放大电路的一个输出端连接，从而减少由Q调整电阻产生的热噪声。
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公开(公告)号：USRE32132E
公开(公告)日：1986-04-29
申请号：US394640
申请日：1982-07-01
摘要： In a video signal play-back circuit connected so that a play-back signal from a magnetic head may be applied to an amplifier circuit through a resonance circuit which consists of an inductance element and a capacitance element, a resistor for adjusting the quality factor Q of the resonance circuit is connected between one terminal of the resonance circuit and one output terminal of the amplifier circuit, thereby to reduce thermal noises which develop from the Q adjusting resistor.
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公开(公告)号：US4268873A
公开(公告)日：1981-05-19
申请号：US63711
申请日：1979-08-06
申请人： Yasunori Kobori , Toshi Itoh , Yoichi Tokunaga , Tunehiko Teshima
发明人： Yasunori Kobori , Toshi Itoh , Yoichi Tokunaga , Tunehiko Teshima
IPC分类号： H04N5/7826 , G11B5/588 , G11B15/18 , G11B15/467 , G11B15/473 , G11B15/60 , H04N5/785
CPC分类号： G11B15/602 , G11B15/1808 , G11B15/1875 , G11B15/4675 , G11B15/4733
摘要： A servo circuit is disclosed for a video tape recorder of helical scan type having two rotary heads, in which recording/reproduction is capable of being performed at different tape feed rates, and a recording track for the video signal is formed partially superimposed on the previously-formed recording track, thus forming a recording track narrower than the heads when the tape feed rate is low. A control pulse which is in phase with the vertical synchronizing signal extracted from the video signal to be recorded is recorded in the control track, and the rotational phase of the rotary heads is controlled by use of the control pulse read at the time of reproduction. The servo circuit causes a shift in the phase of the control pulses and a change in the phase of the control pulses before recording when the tape feed rate is low.
摘要翻译： 公开了一种用于具有两个旋转磁头的螺旋扫描型录像机的伺服电路，其中可以以不同的磁带进给速率执行记录/再现，并且用于视频信号的记录磁道部分地叠加在先前 形成记录轨道，从而形成当磁带进给速率低时比磁头窄的记录磁道。 与要记录的视频信号提取的垂直同步信号同相的控制脉冲被记录在控制轨道中，并且通过使用在再现时读取的控制脉冲来控制旋转磁头的旋转相位。 当磁带进给速率低时，伺服电路导致控制脉冲的相位偏移和记录前的控制脉冲的相位变化。
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4.发明授权Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium 有权基板清洁装置，基板清洗方法和计算机可读存储介质公开(公告)号：US08578953B2
公开(公告)日：2013-11-12
申请号：US12000670
申请日：2007-12-14
申请人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
发明人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
CPC分类号： H01L21/0209 , B08B1/002 , B08B1/04 , B08B3/02 , B08B5/02 , B08B7/0057 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/68742 , H01L21/68764
摘要： A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
摘要翻译： 公开的用于清洁基板的背面的基板清洁装置包括：第一基板支撑部，其构造成在基板的背面的第一区域处支撑基板，所述背面朝下; 第二基板支撑部，其构造成在所述基板的背面的第二区域处支撑所述基板，所述第二区域与所述第一区域分离; 清洗液供给部，构成为向所述基板的背面供给清洗液; 干燥部，其构造成干燥所述基板的背面的第二区域; 以及清洁部，其构造成当所述基板被所述第一基板支撑部支撑所述基板时，清洁所述基板的背面的第三区域，所述第三区域包括所述第二区域以及所述基板的背面的第四区域， 基板由第二基板支撑部分支撑，除了后表面的第二区域之外的第四区域。
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5.发明授权Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium 有权清洁装置和清洁方法，涂布机/显影剂和涂布和显影方法以及计算机可读存储介质公开(公告)号：US08851092B2
公开(公告)日：2014-10-07
申请号：US12366198
申请日：2009-02-05
CPC分类号： B05D3/105 , B05D3/065 , B05D5/06 , G03F7/168 , H01L21/67046 , H01L21/67051
摘要： A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
摘要翻译： 清洁装置包括：第一基板保持部，其构造成保持基板的背面的第一区域，使得顶面保持面朝上; 第二基板保持部构造成保持基板的背面的第二区域，第二区域与第一区域不重叠，并旋转基板; 顶表面清洁喷嘴，其构造成将顶表面清洁流体供应到所述基板的顶表面; 斜面清洁喷嘴，其构造成将倾斜清洁流体供应到所述基板的斜面部分; 清洗液供给部，其构造成将后表面清洗液供给到由所述第一或第二基板保持部保持的基板的背面; 以及清洁部件，其构造成清洁由所述第一或第二基板保持部保持的所述基板的背面。
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6.发明申请CLEANING APPARATUS AND CLEANING METHOD, COATER/DEVELOPER AND COATING AND DEVELOPING METHOD, AND COMPUTER READABLE STORING MEDIUM 有权清洁装置和清洁方法，涂料/开发商和涂料和开发方法以及计算机可读存储介质公开(公告)号：US20090202951A1
公开(公告)日：2009-08-13
申请号：US12366198
申请日：2009-02-05
CPC分类号： B05D3/105 , B05D3/065 , B05D5/06 , G03F7/168 , H01L21/67046 , H01L21/67051
摘要： A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area being not overlapped with the first area, and rotate the substrate; a top-surface cleaning nozzle configured to supply a top surface cleaning fluid to a top surface of the substrate; a bevel cleaning nozzle configured to supply a bevel cleaning fluid to a bevel portion of the substrate; a cleaning fluid supplying portion configured to supply a back surface cleaning fluid to the back surface of the substrate held by the first or the second substrate-holding portion; and a cleaning member configured to clean the back surface of the substrate held by the first or the second-substrate holding portion.
摘要翻译： 清洁装置包括：第一基板保持部，其构造成保持基板的背面的第一区域，使得顶面保持面朝上; 第二基板保持部构造成保持基板的背面的第二区域，第二区域与第一区域不重叠，并旋转基板; 顶表面清洁喷嘴，其构造成将顶表面清洁流体供应到所述基板的顶表面; 斜面清洁喷嘴，其构造成将倾斜清洁流体供应到所述基板的斜面部分; 清洗液供给部，其构造成将后表面清洗液供给到由所述第一或第二基板保持部保持的基板的背面; 以及清洁部件，其构造成清洁由所述第一或第二基板保持部保持的所述基板的背面。
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7.发明申请Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium 有权基板清洁装置，基板清洗方法和计算机可读存储介质公开(公告)号：US20080163899A1
公开(公告)日：2008-07-10
申请号：US12000670
申请日：2007-12-14
申请人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
发明人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
IPC分类号： B08B3/00
CPC分类号： H01L21/0209 , B08B1/002 , B08B1/04 , B08B3/02 , B08B5/02 , B08B7/0057 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/68742 , H01L21/68764
摘要： A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
摘要翻译： 公开的用于清洁基板的背面的基板清洁装置包括：第一基板支撑部，其构造成在基板的背面的第一区域处支撑基板，所述背面朝下; 第二基板支撑部，其构造成在所述基板的背面的第二区域处支撑所述基板，所述第二区域与所述第一区域分离; 清洗液供给部，构成为向所述基板的背面供给清洗液; 干燥部，其构造成干燥所述基板的背面的第二区域; 以及清洁部，其构造成当所述基板被所述第一基板支撑部支撑所述基板时，清洁所述基板的背面的第三区域，所述第三区域包括所述第二区域以及所述基板的背面的第四区域， 基板由第二基板支撑部分支撑，除了后表面的第二区域之外的第四区域。
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