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公开(公告)号：US20070236673A1
公开(公告)日：2007-10-11
申请号：US11695831
申请日：2007-04-03
申请人： Hisashi Namba , Tatsuya Hayashi , Takashi Kamono
发明人： Hisashi Namba , Tatsuya Hayashi , Takashi Kamono
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70891
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.
摘要翻译： 曝光装置包括被配置为使用极紫外光照射掩模版的照明光学系统，配置为将掩模版的图案投影到基板上的投影光学系统，限定容纳投影光学系统的第一空间的光阑，第一 气体供给器，被配置为向第一空间供应第一气体;第一冷却单元，被配置为在第一气体供应器将第一气体供应到第一空间之前冷却第一气体。
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公开(公告)号：US07633597B2
公开(公告)日：2009-12-15
申请号：US11695831
申请日：2007-04-03
申请人： Hisashi Namba , Tatsuya Hayashi , Takashi Kamono
发明人： Hisashi Namba , Tatsuya Hayashi , Takashi Kamono
CPC分类号： G03F7/70933 , G03F7/70891
摘要： An exposure apparatus includes an illumination optical system configured to illuminate a reticle using extreme ultraviolet light, a projection optical system configured to project a pattern of the reticle onto a substrate, a diaphragm that defines a first space that accommodates the projection optical system, a first gas supplier configured to supply a first gas to the first space, and a first cooling unit configured to cool the first gas before the first gas supplier supplies the first gas to the first space.
摘要翻译： 曝光装置包括被配置为使用极紫外光照射掩模版的照明光学系统，配置为将掩模版的图案投影到基板上的投影光学系统，限定容纳投影光学系统的第一空间的光阑，第一 气体供给器，被配置为向第一空间供应第一气体;第一冷却单元，被配置为在第一气体供应器将第一气体供应到第一空间之前冷却第一气体。
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公开(公告)号：US20080030705A1
公开(公告)日：2008-02-07
申请号：US11828814
申请日：2007-07-26
申请人： Hisashi Namba , Tatsuya Hayashi
发明人： Hisashi Namba , Tatsuya Hayashi
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/70858
摘要： An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.
摘要翻译： 曝光装置包括投影光学系统，其将掩模版的图案投影到晶片上，设置有投影光学系统的真空室，设置在真空室中的分隔件，并将第一空间（其中的空间 存在投影光学系统的至少一部分）和第二空间（其是第一空间以外的空间），向第一空间供给气体的气体供给单元和减少气体流动的密封剂 通过管道供应到第二个空间。
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公开(公告)号：US07932990B2
公开(公告)日：2011-04-26
申请号：US11828814
申请日：2007-07-26
申请人： Hisashi Namba , Tatsuya Hayashi
发明人： Hisashi Namba , Tatsuya Hayashi
CPC分类号： G03B27/42 , G03F7/70841 , G03F7/70858
摘要： An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.
摘要翻译： 曝光装置包括投影光学系统，其将掩模版的图案投影到晶片上，设置有投影光学系统的真空室，设置在真空室中的分隔件，并将第一空间（其中的空间 存在投影光学系统的至少一部分）和第二空间（其是第一空间以外的空间），向第一空间供给气体的气体供给单元和减少气体流动的密封剂 通过管道供应到第二个空间。
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公开(公告)号：US08259284B2
公开(公告)日：2012-09-04
申请号：US12546930
申请日：2009-08-25
申请人： Hisashi Namba
发明人： Hisashi Namba
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70841 , G03F7/70891
摘要： An exposure apparatus of the present invention includes a vacuum container accommodating a structure, a vacuum pump configured to increase the degree of vacuum achieved inside the vacuum container, a radiation unit configured to perform a heat exchange through radiation for the structure, a temperature detecting unit configured to detect the temperature of the structure, and a control unit configured to control the radiation unit based on the detected temperature, wherein the radiation unit is arranged at a position determined so that the radiation unit does not interfere with a heat exchange achieved through radiation between the vacuum pump and the structure.
摘要翻译： 本发明的曝光装置包括容纳结构的真空容器，配置成增加在真空容器内部获得的真空度的真空泵，被配置为通过用于结构的辐射进行热交换的辐射单元，温度检测单元 被配置为检测所述结构的温度;以及控制单元，被配置为基于所检测的温度来控制所述辐射单元，其中所述辐射单元被布置在确定为使得所述辐射单元不干扰通过辐射实现的热交换的位置 在真空泵和结构之间。
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公开(公告)号：US07319505B2
公开(公告)日：2008-01-15
申请号：US10871210
申请日：2004-06-18
申请人： Hisashi Namba
发明人： Hisashi Namba
CPC分类号： G03F7/70875
摘要： In order to improve a responsiveness of the radiation cooling and to switch a cooling position, an exposure apparatus for exposing an object includes a cooling mechanism for radiation-cooling the object, and a regulator for regulating a radiant heat transfer amount between said cooling mechanism and the object.
摘要翻译： 为了提高辐射冷却的响应性和切换冷却位置，用于使物体曝光的曝光装置包括用于对物体进行辐射冷却的冷却机构，以及用于调节所述冷却机构与所述散热装置之间的辐射传热量的调节器， 物体。
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公开(公告)号：US09008268B2
公开(公告)日：2015-04-14
申请号：US13164440
申请日：2011-06-20
申请人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
发明人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
CPC分类号： H01J35/065 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/4441 , A61B6/5241 , A61B6/547 , H01J35/06 , H01J35/08 , H01J35/18 , H01J2235/062 , H01J2235/064 , H01J2235/068 , H01J2235/087 , H05G1/70
摘要： An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.
摘要翻译： 一种X射线摄像装置，具备：包含多个X射线焦点以通过用电子束照射X射线靶产生X射线的多X射线源，检测从X射线 多个X射线源并且已经到达检测表面;以及移动机构，用于在面向检测表面的平面内移动多个X射线源。 X射线成像装置从检测器取得多个X射线检测信号，使多个X射线源进行X射线照射，同时移动检测器的多个X射线焦点的位置相对于 通过使用移动机构移动多个X射线源的检测表面。 然后，该装置基于由检测器获取的多个X射线检测信号生成X射线投影图像。
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公开(公告)号：US20110249796A1
公开(公告)日：2011-10-13
申请号：US13164440
申请日：2011-06-20
申请人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
发明人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
IPC分类号： G01N23/04
CPC分类号： H01J35/065 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/4441 , A61B6/5241 , A61B6/547 , H01J35/06 , H01J35/08 , H01J35/18 , H01J2235/062 , H01J2235/064 , H01J2235/068 , H01J2235/087 , H05G1/70
摘要： An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.
摘要翻译： 一种X射线摄像装置，具备：包含多个X射线焦点以通过用电子束照射X射线靶产生X射线的多X射线源，检测从X射线 多个X射线源并且已经到达检测表面;以及移动机构，用于在面向检测表面的平面内移动多个X射线源。 X射线成像装置从检测器取得多个X射线检测信号，使多个X射线源进行X射线照射，同时移动检测器的多个X射线焦点的位置相对于 通过使用移动机构移动多个X射线源的检测表面。 然后，该装置基于由检测器获取的多个X射线检测信号生成X射线投影图像。
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公开(公告)号：US20100266097A1
公开(公告)日：2010-10-21
申请号：US12763486
申请日：2010-04-20
申请人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
发明人： Masahiko Okunuki , Makoto Sato , Osamu Tsujii , Takashi Ogura , Hisashi Namba
IPC分类号： A61B6/03
CPC分类号： H01J35/065 , A61B6/032 , A61B6/4007 , A61B6/4028 , A61B6/4441 , A61B6/5241 , A61B6/547 , H01J35/06 , H01J35/08 , H01J35/18 , H01J2235/062 , H01J2235/064 , H01J2235/068 , H01J2235/087 , H05G1/70
摘要： An X-ray imaging apparatus includes a multi X-ray source which includes a plurality of X-ray focuses to generate X-rays by irradiating X-ray targets with electron beams, a detector which detects X-rays which have been emitted from the multi X-ray source and have reached a detection surface, and a moving mechanism for moving the multi X-ray source within a plane facing the detection surface. The X-ray imaging apparatus acquires a plurality of X-ray detection signals from the detector by causing the multi X-ray source to perform X-ray irradiation while shifting the positions of a plurality of X-ray focuses which the detector has relative to the detection surface by moving the multi X-ray source using the moving mechanism. The apparatus then generates an X-ray projection image based on the plurality of X-ray detection signals acquired by the detector.
摘要翻译： 一种X射线摄像装置，具备：包含多个X射线焦点以通过用电子束照射X射线靶产生X射线的多X射线源，检测从X射线 多个X射线源并且已经到达检测表面;以及移动机构，用于在面向检测表面的平面内移动多个X射线源。 X射线成像装置从检测器取得多个X射线检测信号，使多个X射线源进行X射线照射，同时移动检测器的多个X射线焦点的位置相对于 通过使用移动机构移动多个X射线源的检测表面。 然后，该装置基于由检测器获取的多个X射线检测信号生成X射线投影图像。
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公开(公告)号：US20130033822A1
公开(公告)日：2013-02-07
申请号：US13563538
申请日：2012-07-31
CPC分类号： F25B21/02 , G02B21/28 , G02B21/365
摘要： An image acquisition apparatus includes an imaging optical system configured to form an image of a subject, an imaging unit including an image sensor configured to capture the image of the subject formed by the imaging optical system, a cooler thermally connected to the image sensor, and a heat-transfer reduction unit with an opaque portion located between the imaging optical system and the imaging unit, wherein the opaque portion includes an aperture through which incident light to the image sensor passes.
摘要翻译： 一种图像获取装置包括被配置为形成被摄体的图像的成像光学系统，包括图像传感器的成像单元，该图像传感器被配置为捕获由成像光学系统形成的被摄体的图像，与图像传感器热连接的冷却器，以及 具有位于成像光学系统和成像单元之间的不透明部分的热传递减少单元，其中所述不透明部分包括通过所述孔的入射光通过所述孔。
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