公开(公告)号：US20220351934A1

公开(公告)日：2022-11-03

申请号：US17621503

申请日：2019-07-02

Applicant: Hitachi High-Tech Corporation

Inventor： Erina KAWAMOTO ,  Soichiro MATSUNAGA ,  Souichi KATAGIRI ,  Keigo KASUYA ,  Takashi DOI ,  Tetsuya SAWAHATA ,  Minoru YAMAZAKI

IPC: H01J37/077 ,  H01J37/18 ,  H01J37/075

Abstract: The invention provides an electron beam apparatus that reduces a time required for an electron gun chamber to which a sputter ion pump and a non-evaporable getter pump are connected to reach an extreme high vacuum state. The electron beam apparatus includes an electron gun configured to emit an electron beam and the electron gun chamber to which the sputter ion pump and the non-evaporable getter pump are connected. The electron beam apparatus further includes a gas supply unit configured to supply at least one of hydrogen, oxygen, carbon monoxide, and carbon dioxide to the electron gun chamber.