利索-全球专利检索

  1. Login
  2. Sign Up

Search Results

11 records (took 0.016 seconds)

    Electron microscope
    1.
    发明授权
    Electron microscope 有权

    公开(公告)号：US11087947B2

    公开(公告)日：2021-08-10

    申请号：US16089281

    申请日：2016-03-29

    Applicant: HITACHI HIGH-TECH CORPORATION

    Inventor： Takashi Ohshima ,  Hiroyuki Minemura ,  Yumiko Anzai ,  Momoyo Enyama ,  Yoichi Ose ,  Toshihide Agemura

    IPC: H01J37/073 ,  H01J37/22

    Abstract: To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

    Electron source and electron beam device using the same
    2.
    发明授权
    Electron source and electron beam device using the same 有权

    公开(公告)号：US10707046B2

    公开(公告)日：2020-07-07

    申请号：US16480405

    申请日：2017-12-08

    Applicant: Hitachi High-Tech Corporation

    Inventor： Toshiaki Kusunoki ,  Keigo Kasuya ,  Takashi Ohshima ,  Tomihiro Hashizume ,  Noriaki Arai ,  Yoichi Ose

    IPC: H01J37/073 ,  H01J37/20

    Abstract: An electron source that can be used stably for a long time even when hexaboride is used, and an electron beam device using the electron source are provided. The invention is directed to an electron source which includes a filament made of a metal, a metal tube that is fixed to the filament and has a plurality of recesses disposed at least in two axial directions so as to surround a central axis at an outer periphery, and a columnar hexaboride tip that emits an electron, is disposed so as to protrude from the inside of the metal tube to a side opposite to the filament, and is in contact with a bottom of each of the plurality of recesses of the metal tube.

    Electron microscope
    4.
    发明授权
    Electron microscope 有权

    公开(公告)号：US11251011B2

    公开(公告)日：2022-02-15

    申请号：US16089281

    申请日：2016-03-29

    Applicant: HITACHI HIGH-TECH CORPORATION

    Inventor： Takashi Ohshima ,  Hiroyuki Minemura ,  Yumiko Anzai ,  Momoyo Enyama ,  Yoichi Ose ,  Toshihide Agemura

    IPC: H01J37/073 ,  H01J37/22

    Abstract: To provide an electron microscope capable of performing the switching-over between normal illumination and annular illumination, wide-area irradiation, an interference pattern as desired or normal illumination in an expeditious and readily manner or achieving a better S/N ratio, the electron microscope comprises a photocathode 101 with negative electron affinity in use; an excitation optical system to excite the photocathode; and an electron optics system to irradiate an electron beam 13 generated from the photocathode by excitation light 12 irradiated through the excitation optical system onto a sample, the excitation optical system including a light source device 107 for the excitation light; and an optical modulation means 108 which is disposed in an optical path of the excitation light to perform spatial phase modulation to the excitation light.

    Electron gun and electron microscope
    7.
    发明授权
    Electron gun and electron microscope 有权

    公开(公告)号：US12217928B2

    公开(公告)日：2025-02-04

    申请号：US17798092

    申请日：2020-03-25

    Applicant: Hitachi High-Tech Corporation

    Inventor： Hideo Morishita ,  Takashi Ohshima ,  Tatsuro Ide ,  Naohiro Kohmu ,  Toshihide Agemura ,  Yoichi Ose ,  Junichi Katane

    IPC: H01J37/073 ,  H01J1/34

    Abstract: The electron gun is provided with a first anode electrode and a second anode electrode to generate an acceleration and deceleration electric field. A lens electric field makes it possible to irradiate a sample with an electron beam emitted from a part outside an optical axis of the photoelectric film without being blocked by a differential exhaust diaphragm. A wide range of electron beams off-optical axis can be used even in a high-brightness photocathode that requires high vacuum. As a result, the photoelectric film and the electron gun can be extended in life, can be stabilized, and can be increased in brightness. Further, it is possible to facilitate a control of emitting electron beams from a plurality of positions on the photoelectric film, a timing control of emitting electron beams from a plurality of positions, a condition control of an electron beam in an electron microscope using electron beams.

    Electron beam apparatus
    8.
    发明授权
    Electron beam apparatus 有权

    公开(公告)号：US11784022B2

    公开(公告)日：2023-10-10

    申请号：US17425872

    申请日：2019-01-28

    Applicant: Hitachi High-Tech Corporation

    Inventor： Takashi Ohshima ,  Tatsuro Ide ,  Hideo Morishita ,  Yoichi Ose ,  Tsunenori Nomaguchi ,  Toshihide Agemura

    IPC: H01J37/073 ,  G02B3/04 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

    CPC classification number: H01J37/073 ,  G02B3/04 ,  H01J37/1474 ,  H01J37/22 ,  H01J37/28 ,  H01J2237/0473

    Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

    ELECTRON BEAM APPARATUS
    9.
    发明申请
    ELECTRON BEAM APPARATUS 有权

    公开(公告)号：US20220165536A1

    公开(公告)日：2022-05-26

    申请号：US17425872

    申请日：2019-01-28

    Applicant: Hitachi High-Tech Corporation

    Inventor： Takashi Ohshima ,  Tatsuro Ide ,  Hideo Morishita ,  Yoichi Ose ,  Tsunenori Nomaguchi ,  Toshihide Agemura

    IPC: H01J37/073 ,  H01J37/147 ,  H01J37/22 ,  G02B3/04

    Abstract: A scanning electron beam apparatus which two-dimensionally scans a sample by an electron beam, to achieve high resolution even with a photoexcited electron source. The electron beam apparatus includes a photocathode including a substrate having a refractive index of more than 1.7 and a photoemissive film, a focusing lens configured to focus an excitation light toward the photocathode, an extractor electrode disposed facing the photocathode and configured to accelerate an electron beam generated from the photoemissive film by focusing the excitation light by the focusing lens and emitting the excitation light through the substrate, and an electron optics including a deflector configured to two-dimensionally scan a sample by the electron beam accelerated by the extractor electrode. For a spherical aberration of the focusing lens, a root mean square of the spherical aberration on the photoemissive film is equal to or less than 1/14 of a wavelength of the excitation light.

Patent Agency Ranking