公开(公告)号：US20240222064A1

公开(公告)日：2024-07-04

申请号：US18390046

申请日：2023-12-20

Applicant: Hitachi High-Tech Corporation

Inventor： Mayuka OSAKI ,  Shgunki Tsuboya ,  Hajime Kawano

IPC: H01J37/153 ,  H01J37/22 ,  H01J37/244 ,  H01J37/285 ,  H01J37/30 ,  H01J37/304

CPC classification number: H01J37/153 ,  H01J37/222 ,  H01J37/226 ,  H01J37/244 ,  H01J37/3005 ,  H01J37/3045 ,  H01J37/285 ,  H01J2229/507 ,  H01J2231/50047

Abstract: A multi-beam charged-particle microscope apparatus 100 includes an irradiation system 104 that irradiates a plurality of regions on a surface of a sample 9 with a plurality of beams, a detection system 125 (correction detector 132 and imaging detector 131) that detects emitted electrons from the surface of the sample 9, and a controller 102 that generates a first brightness of a first pixel in a first region based on a first signal of a first detector of a multi-detector 123 and generates a second brightness of a second pixel in a second region based on a second signal of a second detector. A processor of a processor system 103 that can communicate with the charged-particle microscope apparatus 100 specifies a first crosstalk amount from a second emitted electron to the first signal based on the first brightness obtained from the charged-particle microscope apparatus 100 and an output of the correction detector 132 and corrects the first brightness based on the first crosstalk amount.

公开(公告)号：US11798781B2

公开(公告)日：2023-10-24

申请号：US17420707

申请日：2020-09-15

Applicant: FOCUS-EBEAM TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Shuai Li ,  Wei He

IPC: H01J37/285 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/285 ,  H01J37/20 ,  H01J37/28

Abstract: A microscope includes: an electronic optical column configured to emit scanning electron beams; a specimen stage configured to place a specimen; a target movably disposed between the electronic optical column and the specimen stage; and a driving mechanism for driving the target to move between a first position and a second position, wherein the first position is a position at which the electron beams act on the specimen, and the second position is a position at which the electron beams act on the target to generate X-rays irradiating the specimen. In the present disclosure, through one time mounting of the specimen, the microscope enables the dual-function detection of the specimen, i.e., detection of the specimen by an SEM and detection of the specimen by a Nano-CT.

公开(公告)号：US11791129B2

公开(公告)日：2023-10-17

申请号：US17435247

申请日：2020-02-20

Applicant: Centre National De La Recherche Scientifique ,  Institut National Des Sciences Appliquees De Rouen (INSA) ,  Universite De Rouen Normandie

Inventor： François Vurpillot ,  Rodrigue Larde ,  Benjamin Klaes ,  Gérald Da Costa

IPC: H01J37/26 ,  H01J37/285

CPC classification number: H01J37/265 ,  H01J37/285 ,  H01J2237/2626 ,  H01J2237/2852

Abstract: A method for imaging a material to atomic scale by means of a field-ion microscope having a vacuum chamber configured to accommodate the material prepared in the form of a tip and an imaging gas, and an ion detector is provided. The method includes application of a DC electrical potential (VDC) and of a pulsed electrical potential, of which the maximum pulse value is denoted Vimp, so that the tip erodes for a potential value equal to VDC+Vimp; acquisition, by the detector between at least two pulses of the pulsed potential, of series of at least two ion images of the impacts of the ions repelled by the tip onto the detector; and calculation of a quantity characteristic of a trend of the erosion of the tip based on the series of ion images acquired and the adjustment, between each series of images, of the values of VDC and of Vimp such that the quantity characteristic of the trend and the ratio VDC/Vimp remain constant.

公开(公告)号：US20180358200A1

公开(公告)日：2018-12-13

申请号：US15616749

申请日：2017-06-07

Applicant: KLA-Tencor Corporation

Inventor： Robert Haynes ,  John Gerling ,  Aron Welk ,  Christopher Sears ,  Felipe Fuks ,  Mehran Nasser-Ghodsi ,  Tomas Plettner

IPC: H01J37/147 ,  H01J37/14 ,  H01J37/285 ,  H01J37/18

CPC classification number: H01J37/1474 ,  H01J37/14 ,  H01J37/1471 ,  H01J37/18 ,  H01J37/285

Abstract: A multi-column scanning electron microscopy (SEM) system is disclosed. The SEM system includes a source assembly. The source assembly includes two or more electron beam sources configured to generate a plurality of electron beams. The source assembly also includes two or more sets of positioners configured to actuate the two or more electron beam sources. The SEM system also includes a column assembly. The column assembly includes a plurality of substrate arrays. The column assembly also includes two or more electron-optical columns formed by a set of column electron-optical elements bonded to the plurality of substrate arrays. The SEM system also includes a stage configured to secure a sample that at least one of emits or scatters electrons in response to the plurality of electron beams directed by the two or more electron-optical columns to the sample.

公开(公告)号：US20180350556A1

公开(公告)日：2018-12-06

申请号：US15779235

申请日：2016-11-25

Applicant: EMPA Eidgenössische Materialprüfungs- und Forschunsanstalt

Inventor： Davide BLEINER ,  Yunieski ARBELO-PENA

IPC: H01J37/285 ,  G01N23/227 ,  H01J37/244 ,  G01R15/18

CPC classification number: H01J37/285 ,  G01N23/227 ,  G01R15/181 ,  H01J37/244 ,  H01J2237/2855

Abstract: A detector supplement device for integration in a spectroscopy setup with the spectroscopy setup including a vacuum chamber, a light source, a sample irradiating a reflected photon beam and a charged particle beam in the same direction of propagation into a radiation detector which is able to detect ultrafast electric currents originating from charged particles. The detector supplement device includes a Rogowski coil placeable inside the vacuum chamber between the sample and radiation detector. The charged particle beam is guided through the hollow core of the Rogowski coil allowing synchronized measurements of electrical currents due to the charged particle beam correlated to the reflected photon beam, while irradiation of the reflected photon beam and the charged particle beam takes place in the same direction of propagation.

公开(公告)号：US10074511B2

公开(公告)日：2018-09-11

申请号：US15163725

申请日：2016-05-25

Applicant: Hitachi High-Technologies Corporation

Inventor： Takehiro Hirai ,  Yohei Minekawa ,  Yutaka Tandai

IPC: H01J37/00 ,  H01J37/22 ,  H01J37/285 ,  H01J37/28

CPC classification number: H01J37/222 ,  G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2817 ,  H01L22/12 ,  H01L22/20

Abstract: A defect image classification apparatus includes a control unit that selects images obtained from at least some detectors among a plurality of detectors, associated with kinds of defects to be a classification result of an automatic defect classification processing unit, as images displayed initially on a display unit. The control unit associates the kinds of the defects and the images displayed initially on the display unit, on the basis of a switching operation log when a user classifies images of defects determined previously as the same kinds as the kinds of the defects determined by the automatic defect classification processing unit.

公开(公告)号：US09824938B2

公开(公告)日：2017-11-21

申请号：US15303813

申请日：2015-03-31

Applicant: Hitachi High-Technologies Corporation

Inventor： Atsuko Yamaguchi ,  Osamu Inoue ,  Hiroki Kawada

IPC: H01J37/28 ,  H01L21/66 ,  H01J37/244 ,  H01J37/285 ,  H01L21/033

CPC classification number: H01L22/12 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/2809 ,  H01J2237/2814 ,  H01J2237/2817 ,  H01L21/0332 ,  H01L21/0335 ,  H01L21/0337 ,  H01L21/0338 ,  H01L22/00

Abstract: Provided is a charged particle beam device which can specify a position of an initial core with high accuracy even when fine line and space patterns are formed by an SADP in plural times. The charged particle beam device includes a detector (810) which detects secondary charged particles discharged from a sample (807) when a charged particle beam is emitted to the sample having a plurality of patterns of line shape, a display unit (817) which displays image data of a surface of the sample on the basis of a signal of the secondary charged particles, a calculation unit (812) which calculates an LER value with respect to the plurality of the patterns of line shape from the image data, and a determination unit (816) which compares the values to determine a position of the initial core.

公开(公告)号：US09797923B2

公开(公告)日：2017-10-24

申请号：US14627770

申请日：2015-02-20

Applicant: FEI Company

Inventor： Roger Alvis

IPC: G01Q30/02 ,  G01N1/00 ,  G01Q30/20 ,  H01J37/285 ,  G01N1/32 ,  G01N1/28

CPC classification number: G01Q30/02 ,  G01N1/00 ,  G01N1/32 ,  G01N2001/282 ,  G01Q30/20 ,  H01J37/285 ,  H01J2237/2802 ,  H01J2237/2852 ,  H01J2237/31745 ,  H01J2237/31749 ,  Y10T428/2933 ,  Y10T428/2958

Abstract: A method of forming a sample and performing correlative S/TEM and APM analysis is provided wherein a sample containing a region of interest is cut from a bulk of sample material and formed into an ultra-thin lamella. The lamella is then analyzed with an S/TEM to form an image. The lamella sample and mount may then go through a cleaning process to remove any contamination. The lamella containing the ROI is then embedded within a selected material and is formed into a needle-shaped sample. The needle-shaped sample is then analyzed with the APM and the resulting data is merged and correlated with the S/TEM data.

公开(公告)号：US09793090B2

公开(公告)日：2017-10-17

申请号：US14989729

申请日：2016-01-06

Applicant: PDF Solutions, Inc.

Inventor： Indranil De ,  Christopher Hess ,  Dennis J. Ciplickas

IPC: H01L23/58 ,  H01J37/22 ,  G01R31/26 ,  H01L21/66 ,  H01J37/147 ,  H01J37/20 ,  H01J37/285 ,  G01N23/225

CPC classification number: H01J37/222 ,  G01N23/2251 ,  G01R31/26 ,  G01R31/2644 ,  H01J37/147 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/24592 ,  H01L22/12 ,  H01L22/20 ,  H01L22/30

Abstract: The present invention discloses an e-beam inspection tool, and an apparatus for detecting defects. In one aspect is described an apparatus for detecting defects that includes a focusing column that accelerates the e-beam and separately, for each of the plurality of predetermined locations, focuses the e-beam to a predetermined non-circular spot that is within the predetermined surface area of each of the plurality of predetermined locations based upon the major axis.

公开(公告)号：US09793089B2

公开(公告)日：2017-10-17

申请号：US14485588

申请日：2014-09-12

Applicant: KLA-Tencor Corporation

Inventor： Thomas Plettner ,  Mehran Nasser-Ghodsi

IPC: H01J1/304 ,  H01J37/153 ,  H01J37/073 ,  H01J37/28 ,  H01J37/285 ,  H01J37/147 ,  B82Y15/00 ,  B82Y40/00 ,  H01J9/02

CPC classification number: H01J37/153 ,  B82Y15/00 ,  B82Y40/00 ,  H01J9/025 ,  H01J37/073 ,  H01J37/1471 ,  H01J37/28 ,  H01J37/285 ,  H01J2203/0216 ,  H01J2237/06375 ,  H01J2237/28 ,  H01J2237/31774 ,  Y10S977/842 ,  Y10S977/939

Abstract: A field emission device comprises one or more emitter elements, each having a high aspect ratio structure with a nanometer scaled cross section; and one or more segmented electrodes, each surrounding one of the one or more emitters. Each of the one or more segmented electrodes has multiple electrode plates. This abstract is provided to comply with rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.