公开(公告)号：US10734191B2

公开(公告)日：2020-08-04

申请号：US15741899

申请日：2015-07-06

Applicant: Hitachi High-Technologies Corporation

Inventor： Takanori Kishimoto ,  Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/22 ,  H01J37/244 ,  H01J37/10 ,  H01J37/21 ,  H01J37/28

Abstract: This charged particle beam device is provided with: a plurality of detectors for detecting secondary particles, the detectors being disposed in a symmetrical manner around the optical axis of a primary charged particle beam closer to the charged particle source side than an objective lens; electrodes for forming an electric field oriented in directions corresponding to each of the plurality of detectors, the electrodes being provided on the travel routes of secondary particles from a sample to the detectors; and a control power supply for applying a voltage to the electrodes. Adjusting the voltage applied to each of the electrodes makes it possible to detect, upon deflecting, the secondary particles, and to control the range of azimuths of the secondary particles to be detected.

公开(公告)号：US09324540B2

公开(公告)日：2016-04-26

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/26 ,  G21K5/04 ,  H01J37/21 ,  H01J37/28 ,  H01J37/10 ,  H01J37/147

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。

公开(公告)号：US20150136979A1

公开(公告)日：2015-05-21

申请号：US14407117

申请日：2013-04-12

Applicant: Hitachi High-Technologies Corporation

Inventor： Ichiro Tachibana ,  Naomasa Suzuki

IPC: H01J37/21 ,  H01J37/26 ,  H01J37/147 ,  H01J37/10

CPC classification number: H01J37/21 ,  H01J37/10 ,  H01J37/147 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3178 ,  H01J2237/04756 ,  H01J2237/0492 ,  H01J2237/063 ,  H01J2237/10 ,  H01J2237/15 ,  H01J2237/21 ,  H01J2237/244 ,  H01J2237/2602 ,  H01J2237/281

Abstract: When a signal electron is detected by energy selection by combining and controlling retarding and boosting for observation of a deep hole, etc., the only way for focus adjustment is to use a change in magnetic field of an objective lens. However, since responsiveness of the change in magnetic field is poor, throughput reduces. A charged particle beam device includes: an electron source configured to generate a primary electron beam; an objective lens configured to focus the primary electron beam; a deflector configured to deflect the primary electron beam; a detector configured to detect a secondary electron or a reflection electron generated from a sample by irradiation of the primary electron beam; an electrode having a hole through which the primary electron beam passes; a voltage control power supply configured to apply a negative voltage to the electrode; and a retarding voltage control power supply configured to generate an electric field, which decelerates the primary electron beam, on the sample by applying the negative voltage to the sample, wherein the charged particle beam device performs focus adjustment while an offset between the voltage applied to the electrode and the voltage applied to the sample is being kept constant.

Abstract translation: 当通过组合并控制用于观察深孔等的延迟和升压来进行能量选择来检测信号电子时，聚焦调整的唯一方式是使用物镜的磁场变化。 然而，由于磁场变化的响应性差，吞吐量降低。 带电粒子束装置包括：电子源，被配置为产生一次电子束; 配置成聚焦一次电子束的物镜; 偏转器，被配置为偏转所述一次电子束; 检测器，被配置为通过一次电子束的照射来检测从样品产生的二次电子或反射电子; 具有一次电子束通过的孔的电极; 电压控制电源，被配置为向所述电极施加负电压; 以及延迟电压控制电源，被配置为通过向样本施加负电压来产生使样品上的一次电子束减速的电场，其中带电粒子束装置执行焦点调整，同时施加到 施加到样品的电极和电压保持恒定。