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Patent Agency Ranking
公开(公告)号：US09601307B2
公开(公告)日：2017-03-21
申请号：US14764641
申请日：2014-02-05
Applicant: Hitachi High-Technologies Corporation
Inventor： Seiichiro Kanno , Masashi Fujita , Naoya Ishigaki , Makoto Nishihara , Kumiko Shimizu
IPC: H01J37/20 , H01J37/28 , H01L21/67 , H01L21/683
CPC classification number: H01J37/20 , H01J37/28 , H01J2237/2001 , H01J2237/24585 , H01J2237/24592 , H01J2237/2817 , H01L21/67248 , H01L21/6831
Abstract: The present invention provides a high-throughput scanning electron microscope in which a wafer (9) is held by an electrostatic chuck (10), an image is obtained using an electron beam, and the wafer surface is measured, wherein even in a case where the temperature of the wafer (9) is changed due to the environmental temperature the electron scanning microscope is capable of preventing any loss in resolution or the deterioration of the measurement reproducibility caused by thermal shrinkage accompanied by temperature change of the wafer (9). A drill hole is provided on the rear surface of the electrostatic chuck (10), and a thermometer (34) is secured in place so that the front end is brought into elastic contact with the bottom surface of the drill hole. The output of the thermometer (34) is sent to a computing unit, the computing unit computes a measurement limit time for beginning measurement, based on a predetermined algorithm, from an output value of the thermometer (34), and measuring begins at individual measurement sites after the measurement limit time has elapsed.
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公开(公告)号：US09105446B2
公开(公告)日：2015-08-11
申请号：US14376901
申请日：2013-01-28
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
CPC classification number: H01J37/226 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/0047 , H01J2237/06 , H01J2237/2007 , H01J2237/2801 , H02N13/00
Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。
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3.发明授权Charged-particle beam device for irradiating a charged particle beam on a sample 有权用于将带电粒子束照射在样品上的带电粒子束装置公开(公告)号：US09543113B2
公开(公告)日：2017-01-10
申请号：US14759241
申请日：2014-01-10
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Naoya Ishigaki , Masashi Fujita
CPC classification number: H01J37/20 , H01J37/026 , H01J37/09 , H01J37/28 , H01J2237/2007
Abstract: The present invention explains a charged-particle beam device for the purpose of highly accurately measuring electrostatic charge of a sample in a held state by an electrostatic chuck (105). In order to attain the object, according to the present invention, there is proposed a charged-particle beam device including an electrostatic chuck (105) for holding a sample on which a charged particle beam is irradiated and a sample chamber (102) in which the electrostatic chuck (105) is set. The charged-particle beam device includes a potential measuring device that measures potential on a side of an attraction surface for the sample of the electrostatic chuck (105) and a control device that performs potential measurement by the potential measuring device in a state in which the sample is attracted by the electrostatic chuck (105).
Abstract translation: 本发明解释了一种带电粒子束装置，用于通过静电卡盘（105）高度准确地测量处于保持状态的样品的静电荷。 为了达到上述目的，本发明提出一种带电粒子束装置，其特征在于，包括：静电卡盘（105），用于保持照射有带电粒子束的样品和样品室（102），所述样品室 静电吸盘（105）被设定。 带电粒子束装置包括：电位测量装置，其测量用于静电卡盘（105）的样本的吸引表面的电位;以及控制装置，其通过电位测量装置进行电位测量，其中， 样品被静电吸盘（105）吸引。
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公开(公告)号：US10290522B2
公开(公告)日：2019-05-14
申请号：US14893669
申请日：2014-03-19
Applicant: Hitachi High-Technologies Corporation
Inventor： Masashi Fujita , Masahiro Tsunoda , Katsunori Onuki , Katsuya Aibara , Seiichi Shindo , Takaaki Nishimori
Abstract: An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber (111) having an opening (104) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material (118) surrounding the opening (104) for conduction between the vacuum chamber (111) and a conductive member (106) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave (117) from reaching the sample chamber via the delivery path.
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公开(公告)号：US20150097123A1
公开(公告)日：2015-04-09
申请号：US14376901
申请日：2013-01-28
Applicant: Hitachi High-Technologies Corporation
Inventor： Yasushi Ebizuka , Seiichiro Kanno , Makoto Nishihara , Masashi Fujita
CPC classification number: H01J37/226 , H01J37/026 , H01J37/20 , H01J37/28 , H01J2237/0047 , H01J2237/06 , H01J2237/2007 , H01J2237/2801 , H02N13/00
Abstract: An object of the present invention is to provide a charged particle beam apparatus that effectively removes electrical charges from an electrostatic chuck.In order to achieve the above object, the charged particle beam apparatus of the present invention includes a sample chamber that maintains a space containing an electrostatic chuck mechanism (5) in a vacuum state; and in which the charged particle beam apparatus includes an ultraviolet light source (6) to irradiate ultraviolet light within the sample chamber, and a irradiation target member irradiated by the ultraviolet light; and the irradiation target member is placed perpendicular to the adsorption surface of the electrostatic chuck.
Abstract translation: 本发明的目的是提供一种有效地从静电卡盘去除电荷的带电粒子束装置。 为了实现上述目的，本发明的带电粒子束装置包括在真空状态下保持包含静电卡盘机构（5）的空间的样本室; 并且其中带电粒子束装置包括用于照射样品室内的紫外光的紫外光源和照射由紫外光照射的照射目标构件; 并且照射目标构件垂直于静电吸盘的吸附表面放置。
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