公开(公告)号：US20240242921A1

公开(公告)日：2024-07-18

申请号：US18618957

申请日：2024-03-27

Applicant: ASML Netherlands B.V.

Inventor： Mans Johan Bertil OSTERBERG ,  Koen SCHUURBIERS

IPC: H01J37/147

CPC classification number: H01J37/1474 ,  H01J2237/0268 ,  H01J2237/0453 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/04926 ,  H01J2237/1534 ,  H01J2237/2801

Abstract: A charged particle apparatus configured to project a multi-beam of charged particles along a multi-beam path toward a sample, the charged particle apparatus comprising: a charged particle source configured to emit a charged particle beam toward a sample; a charged particle-optical device configured to project sub-beams of a multi-beam of charged particles along the multi-beam path toward the sample, the sub-beams of the multi-beam of charged particles derived from the charged particle beam; a tube surrounding the multi-beam path configured to operate at a first potential difference from a ground potential; and a support configured to support the sample at a second potential difference from the ground potential, the first potential difference and the second potential difference having a difference so as to accelerate the multi-beam of charged particles towards the sample; wherein the first potential difference is greater than the second potential difference.

公开(公告)号：US20240234086A1

公开(公告)日：2024-07-11

申请号：US18433141

申请日：2024-02-05

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Fabian Perez Willard ,  Tobias Volkenandt

IPC: H01J37/31 ,  H01J37/08

CPC classification number: H01J37/31 ,  H01J37/08 ,  H01J2237/2801 ,  H01J2237/31749

Abstract: A method prepares a microsample from a volume sample using multiple particle beams. The method includes providing a volume sample in the microscope system, wherein the interior of the volume sample has a sample region of interest, and producing a macrolamella comprising the sample region of interest by removing sample material of the volume sample using one of the particle beams. The method also includes orienting the macrolamella relative to one of the particle beams, and removing sample material of the macrolamella via a beam so that the region of interest is exposed.

公开(公告)号：US20230215688A1

公开(公告)日：2023-07-06

申请号：US18079065

申请日：2022-12-12

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Andreas Schmaunz ,  Gero Walter ,  Bernd Stenke ,  Gerald Schmid

IPC: H01J37/28

CPC classification number: H01J37/28 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/2801

Abstract: The system described herein relates to a gas feed device having a first precursor reservoir that receives a first precursor and having a second precursor reservoir that receives a second precursor, a feed unit that feeds a gaseous state of the first precursor and/or a gaseous state of the second precursor onto a surface of an object. A first line device is arranged between the first precursor reservoir and the feed unit. A second line device is arranged between the second precursor reservoir and the feed unit. A first valve is arranged between the first line device and the feed unit. A second valve is arranged between the second line device and the feed unit. A control valve for the feed of the gaseous state of the first precursor and/or the gaseous state of the second precursor is connected to the first valve, the second valve and the feed unit.

公开(公告)号：US11676795B2

公开(公告)日：2023-06-13

申请号：US17191022

申请日：2021-03-03

Applicant: FEI Company

Inventor： Pavel Stejskal ,  Bohuslav Sed'a ,  Petr Hlavenka ,  Libor Novák ,  Jan Stopka

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/20 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/049 ,  H01J2237/2445 ,  H01J2237/24475 ,  H01J2237/2801

Abstract: The invention relates to system and method of inspecting a specimen with a plurality of charged particle beamlets. The method comprises the steps of providing a specimen, providing a plurality of charged particle beamlets and focusing said plurality of charged particle beamlets onto said specimen, and detecting a flux of radiation emanating from the specimen in response to said irradiation by said plurality of charged particle beamlets.

公开(公告)号：US10020164B2

公开(公告)日：2018-07-10

申请号：US14560784

申请日：2014-12-04

Applicant: Hermes Microvision Inc.

Inventor： Zhongwei Chen ,  Jack Jau ,  Weiming Ren

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/02 ,  H01J37/285 ,  H01J37/29

CPC classification number: H01J37/28 ,  H01J37/026 ,  H01J37/10 ,  H01J37/14 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/261 ,  H01J37/285 ,  H01J37/292 ,  H01J2237/04926 ,  H01J2237/1405 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24528 ,  H01J2237/2801 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2814

Abstract: The present invention provides apparatuses to inspect small particles on the surface of a sample such as wafer and mask. The apparatuses provide both high detection efficiency and high throughput by forming Dark-field BSE images. The apparatuses can additionally inspect physical and electrical defects on the sample surface by form SE images and Bright-field BSE images simultaneously. The apparatuses can be designed to do single-beam or even multiple single-beam inspection for achieving a high throughput.

公开(公告)号：US09734985B2

公开(公告)日：2017-08-15

申请号：US15045624

申请日：2016-02-17

Applicant: Kabushiki Kaisha Toshiba

Inventor： Haruko Akutsu ,  Makiko Katano ,  Akira Kuramoto

IPC: G21K5/08 ,  H01J37/28 ,  H01J37/248 ,  H01J37/22 ,  H01J37/244

CPC classification number: H01J37/248 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285 ,  H01J2237/2007 ,  H01J2237/2801

Abstract: In accordance with an embodiment, an analytical apparatus includes a member, a voltage source connected to the member and a detecting section. The member has an inserting portion into which a sample holder supporting a sample is insertable and whose shape corresponds to a shape of the sample holder. The detecting section is configured to detect a substance to be emitted from the sample by field evaporation. The shape of the inserting portion in a cross section of a direction perpendicular to an inserting direction of the sample holder is a shape excluding a perfect circle.

公开(公告)号：US20170229279A1

公开(公告)日：2017-08-10

申请号：US15173144

申请日：2016-06-03

Applicant: KLA-Tencor Corporation

Inventor： Alan Brodie ,  Rainer Knippelmeyer ,  Christopher Sears ,  John Rouse ,  Grace Hsiu-Ling Chen

IPC: H01J37/12 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/12 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/1207 ,  H01J2237/21 ,  H01J2237/2801 ,  H01J2237/2817

Abstract: Multi-beam e-beam columns and inspection systems that use such multi-beam e-beam columns are disclosed. A multi-beam e-beam column configured in accordance with the present disclosure may include an electron source and a multi-lens array configured to produce a plurality of beamlets utilizing electrons provided by the electron source. The multi-lens array may be further configured to shift a focus of at least one particular beamlet of the plurality of beamlets such that the focus of the at least one particular beamlet is different from a focus of at least one other beamlet of the plurality of beamlets.

公开(公告)号：US20170117114A1

公开(公告)日：2017-04-27

申请号：US15298536

申请日：2016-10-20

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Dirk Zeidler

IPC: H01J37/04 ,  H01J37/21 ,  H01J37/28

CPC classification number: H01J37/04 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/2801 ,  H01J2237/2803 ,  H01J2237/2814 ,  H01J2237/2817

Abstract: A method includes: generating a multiplicity of particle beams such that the particle beams penetrate a predetermined plane side-by-side and have within a volume region around the predetermined plane in each case one beam focus; scanning a first region of the surface of an object with the particle beams and detecting first intensities of particles produced by the particle beams while setting an operating parameter of the multi-beam particle microscope; and determining first values of an object property based on the first intensities. The first values represent the object property within the first region, and the object property represents a physical property of the object. The method also includes determining a second value of the operating parameter for use for a second region of the surface based on the first values of the object property.

公开(公告)号：US20170025251A1

公开(公告)日：2017-01-26

申请号：US15217460

申请日：2016-07-22

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Momoyo ENYAMA ,  Muneyuki FUKUDA ,  Hideyuki KAZUMI ,  Koichi HAMADA ,  Sayaka TANIMOTO

IPC: H01J37/26 ,  H01J37/22

CPC classification number: H01J37/265 ,  H01J37/153 ,  H01J37/21 ,  H01J37/222 ,  H01J37/226 ,  H01J2237/049 ,  H01J2237/103 ,  H01J2237/1534 ,  H01J2237/223 ,  H01J2237/24542 ,  H01J2237/24592 ,  H01J2237/2801

Abstract: A charged particle beam apparatus with improved depth of focus and maintained/improved resolution has a charged particle source, an off-axis illumination aperture, a lens, a computer, and a memory unit. The apparatus acquires an image by detecting a signal generated by irradiating a sample with a charged particle beam caused from the charged particle source via the off-axis illumination aperture. The computer has a beam-computing-process unit to estimate a beam profile of the charged particle beam and an image-sharpening-process unit to sharpen the image using the estimated beam profile.

Abstract translation: 具有改善的聚焦深度和分辨率的改进的带电粒子束装置具有带电粒子源，离轴照明孔径，透镜，计算机和存储单元。 该装置通过检测通过从带电粒子源经由离轴照射孔引起的带电粒子束照射样品而产生的信号来获取图像。 计算机具有用于估计带电粒子束的束轮廓的波束计算处理单元和使用估计波束轮廓来锐化图像的图像锐化处理单元。

公开(公告)号：US20160343537A1

公开(公告)日：2016-11-24

申请号：US14715432

申请日：2015-05-18

Applicant: FEI Company

Inventor： Toby Shanley ,  John Scott ,  Milos Toth

IPC: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/18 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/182 ,  H01J2237/2448 ,  H01J2237/2605 ,  H01J2237/2608 ,  H01J2237/2801 ,  H01J2237/2806

Abstract: Charged particle beam imaging and measurement systems are provided using gas amplification with an improved imaging gas. The system includes a charged particle beam source for directing a charged particle beam to work piece, a focusing lens for focusing the charged particles onto the work piece, and an electrode for accelerating secondary electrons generated from the work piece irradiation by the charged practice beam, or another gas cascade detection scheme. The gas imaging is performed in a high pressure scanning electron microscope (HPSEM) chamber for enclosing the improved imaging gas including CH3CH2OH (ethanol) vapor. The electrode accelerates the secondary electrons though the CH3CH2OH to ionize the CH3CH2OH through ionization cascade to amplify the number of secondary electrons for detection. An optimal configuration is provided for use of the improved imaging gas, and techniques are provided to conduct imaging studies of organic liquids and solvents, and other CH3CH2OH-based processes.

Abstract translation: 使用具有改进的成像气体的气体放大来提供带电粒子束成像和测量系统。 该系统包括用于将带电粒子束引导到工件的带电粒子束源，用于将带电粒子聚焦到工件上的聚焦透镜，以及用于加速通过带电实践光束从工件照射产生的二次电子的电极， 或另一种气体级联检测方案。 气体成像在高压扫描电子显微镜（HPSEM）室中进行，用于包围改进的成像气体，包括CH 3 CH 2 OH（乙醇）蒸气。 电极通过CH3CH2OH加速二次电子，通过离子化级联离子化CH 3 CH 2 OH，以放大用于检测的二次电子数。 提供了使用改进的成像气体的最佳配置，并且提供了用于进行有机液体和溶剂的成像研究的技术以及其它基于CH 3 CH 2 OH的方法。