Charged particle beam device
    1.
    发明授权

    公开(公告)号:US10720306B2

    公开(公告)日:2020-07-21

    申请号:US16275775

    申请日:2019-02-14

    摘要: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

    Charged particle beam apparatus and method for adjusting imaging conditions for the same

    公开(公告)号:US10566172B2

    公开(公告)日:2020-02-18

    申请号:US16184107

    申请日:2018-11-08

    摘要: A charged particle beam apparatus with reduced frequency of lens resetting operations and thus with improved throughput. The apparatus includes an electron source configured to generate an electron beam, an objective lens to which coil current is adapted to be applied to converge the electron beam on a sample, a focal position adjustment device configured to adjust the focal position of the electron beam, a detector configured to detect electrons from the sample, a display unit configured to display an image of the sample in accordance with a signal from the detector, a storage unit configured to store information on the hysteresis characteristics of the objective lens, and an estimation unit configured to estimate a magnetic field generated by the objective lens on the basis of the coil current, the amount of adjustment of the focal position by the focal position adjustment device, and the information on the hysteresis characteristics.

    Charged particle beam device and pattern measurement device

    公开(公告)号:US10290464B2

    公开(公告)日:2019-05-14

    申请号:US15759408

    申请日:2016-08-15

    摘要: The present invention provides a charged particle beam device capable of predicting the three-dimensional structure of a sample, without affecting the charge of the sample. The present invention provides a charged particle beam device characterized in that a first distance between the peak and the bottom of a first signal waveform obtained on the basis of irradiation with a charged particle beam having a first landing energy, and a second distance between the peak and the bottom of a second signal waveform obtained on the basis of irradiation with a charged particle beam having a second landing energy different from the first landing energy are obtained, and the distance between the peak and the bottom at a landing energy (zero, for instance) different from the first and second landing energies is obtained on the basis of the extrapolation of the first distance and the second distance.

    Charged particle beam device
    4.
    发明授权

    公开(公告)号:US10249474B2

    公开(公告)日:2019-04-02

    申请号:US15618203

    申请日:2017-06-09

    摘要: The scanning charged particle beam microscope according to the present application is characterized in that, in acquiring an image of the FOV (field of view), interspaced beam irradiation points are set, and then, a deflector is controlled so that a charged particle beam scan is performed faster when the charged particle beam irradiates a position on the sample between each of the irradiation points than when the charged particle beam irradiates a position on the sample corresponding to each of the irradiation points (a position on the sample corresponding to each pixel detecting a signal). This allows the effects from a micro-domain electrification occurring within the FOV to be mitigated or controlled.

    SCANNING ELECTRON MICROSCOPE
    5.
    发明申请
    SCANNING ELECTRON MICROSCOPE 有权
    扫描电子显微镜

    公开(公告)号:US20150008322A1

    公开(公告)日:2015-01-08

    申请号:US14379715

    申请日:2013-02-18

    IPC分类号: H01J37/28 G01B15/04

    摘要: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

    摘要翻译: 本发明的目的是提供一种形成电场的扫描电子显微镜,即使样品表面是导电材料,也能高效地提高从孔底等排出的电子。 为了实现上述目的,根据本发明,提出了一种扫描电子显微镜,其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置,其以这样的方式控制偏转器或样品台,即在测量目标图案上扫描光束之前,位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

    Charged particle beam device
    7.
    发明授权

    公开(公告)号:US10446359B2

    公开(公告)日:2019-10-15

    申请号:US15545550

    申请日:2015-01-28

    摘要: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.

    Scanning electron microscope
    9.
    发明授权
    Scanning electron microscope 有权
    扫描电子显微镜

    公开(公告)号:US09472376B2

    公开(公告)日:2016-10-18

    申请号:US14379715

    申请日:2013-02-18

    IPC分类号: H01J37/28 G01B15/00 G01B15/04

    摘要: An object of the invention is to provide a scanning electron microscope which forms an electric field to lift up, highly efficiently, electrons discharged from a hole bottom or the like even if a sample surface is an electrically conductive material. To achieve the above object, according to the invention, a scanning electron microscope including a deflector which deflects a scanning position of an electron beam, and a sample stage for loading a sample thereon, is proposed. The scanning electron microscope includes a control device which controls the deflector or the sample stage in such a way that before scanning a beam on a measurement target pattern, a lower layer pattern situated in a lower layer of the measurement target pattern undergoes beam irradiation on another pattern situated in the lower layer.

    摘要翻译: 本发明的目的是提供一种形成电场的扫描电子显微镜,即使样品表面是导电材料,也能高效地提高从孔底等排出的电子。 为了实现上述目的,根据本发明,提出了一种扫描电子显微镜,其包括使电子束的扫描位置偏转的偏转器和用于在其上装载样品的样品台。 扫描电子显微镜包括控制装置,其以这样的方式控制偏转器或样品台,即在测量目标图案上扫描光束之前,位于测量对象图案的下层中的下层图案在另一个上进行光束照射 图案位于下层。

    Charged particle beam device
    10.
    发明授权

    公开(公告)号:US10541103B2

    公开(公告)日:2020-01-21

    申请号:US15533517

    申请日:2014-12-10

    摘要: The purpose of the present invention is to reduce the amount of charged particles that are lost by colliding with the interior of a column of a charged particle beam device, and detect charged particles with high efficiency. To achieve this purpose, proposed is a charged particle beam device provided with: an objective lens that focuses a charged particle beam; a detector that is disposed between the objective lens and a charged particle source; a deflector that deflects charged particles emitted from a sample such that the charged particles separate from the axis of the charged particle beam; and a plurality of electrodes that are disposed between the deflector and the objective lens and that form a plurality of electrostatic lenses for focusing the charged particles emitted from the sample on a deflection point of the deflector.