Method of manufacturing a vertical type light-emitting diode
    4.
    发明授权
    Method of manufacturing a vertical type light-emitting diode 有权
    垂直型发光二极管的制造方法

    公开(公告)号:US07981705B2

    公开(公告)日:2011-07-19

    申请号:US12846999

    申请日:2010-07-30

    IPC分类号: H01L21/00 H01L27/148

    摘要: In a method of manufacturing a vertical type light-emitting diode, a multilayered structure of group III nitride semiconductor compounds is epitaxy deposited on an irregular surface of a substrate. The substrate is then removed to expose an irregular surface of the multilayered structure corresponding to the irregular surface of the substrate. A portion of the exposed irregular surface of the multilayered structure is then etched for forming an electrode contact surface on which an electrode layer is subsequently formed. With this method, no specific planarized region is required on the irregular surface of the substrate. As a result, planarization treatment of the substrate is not necessary. The same substrate with the irregular surface can be reused for fabricating vertical and horizontal light-emitting diodes.

    摘要翻译: 在制造垂直型发光二极管的方法中,III族氮化物半导体化合物的多层结构外延沉积在基板的不规则表面上。 然后去除衬底以暴露对应于衬底的不规则表面的多层结构的不规则表面。 然后蚀刻多层结构的暴露的不规则表面的一部分,以形成随后形成电极层的电极接触表面。 利用该方法,在基板的不规则表面上不需要特定的平坦化区域。 结果,不需要基板的平坦化处理。 具有不规则表面的相同基板可以重新用于制造垂直和水平发光二极管。

    Method of Manufacturing a Vertical Type Light-Emitting Diode
    5.
    发明申请
    Method of Manufacturing a Vertical Type Light-Emitting Diode 有权
    垂直型发光二极管的制造方法

    公开(公告)号:US20110097831A1

    公开(公告)日:2011-04-28

    申请号:US12846999

    申请日:2010-07-30

    IPC分类号: H01L33/04

    摘要: In a method of manufacturing a vertical type light-emitting diode, a multilayered structure of group III nitride semiconductor compounds is epitaxy deposited on an irregular surface of a substrate. The substrate is then removed to expose an irregular surface of the multilayered structure corresponding to the irregular surface of the substrate. A portion of the exposed irregular surface of the multilayered structure is then etched for forming an electrode contact surface on which an electrode layer is subsequently formed. With this method, no specific planarized region is required on the irregular surface of the substrate. As a result, planarization treatment of the substrate is not necessary. The same substrate with the irregular surface can be reused for fabricating vertical and horizontal light-emitting diodes.

    摘要翻译: 在制造垂直型发光二极管的方法中,III族氮化物半导体化合物的多层结构外延沉积在基板的不规则表面上。 然后去除衬底以暴露对应于衬底的不规则表面的多层结构的不规则表面。 然后蚀刻多层结构的暴露的不规则表面的一部分,以形成随后形成电极层的电极接触表面。 利用该方法,在基板的不规则表面上不需要特定的平坦化区域。 结果,不需要基板的平坦化处理。 具有不规则表面的相同基板可以重新用于制造垂直和水平发光二极管。

    Surface roughening method for light emitting diode substrate
    6.
    发明授权
    Surface roughening method for light emitting diode substrate 有权
    发光二极管基板的表面粗糙化方法

    公开(公告)号:US07901963B2

    公开(公告)日:2011-03-08

    申请号:US12018086

    申请日:2008-01-22

    IPC分类号: H01L21/00

    CPC分类号: H01L33/22

    摘要: The present invention discloses a surface roughening method for an LED substrate, which uses a grinding technology and an abrasive paper of from No. 300 to No. 6000 to grind the surface of a substrate to form a plurality of irregular concave zones and convex zones on the surface of the substrate. Next, a semiconductor light emitting structure is formed on the surface of the substrate. The concave zones and convex zones can scatter and diffract the light inside LED, reduce the horizontally-propagating light between the substrate and the semiconductor layer, decrease the probability of total reflection and promote LED light extraction efficiency.

    摘要翻译: 本发明公开了一种用于LED基板的表面粗糙化方法,其使用研磨技术和300〜6000号的研磨纸来研磨基板的表面,以形成多个不规则凹区域和凸区域 衬底的表面。 接下来,在基板的表面上形成半导体发光结构。 凹区和凸区可以散射和衍射LED内部的光,减少基板与半导体层之间的水平传播光,降低全反射的可能性,提高LED光提取效率。

    Vertical light-emitting diode
    7.
    发明授权
    Vertical light-emitting diode 有权
    垂直发光二极管

    公开(公告)号:US08378376B2

    公开(公告)日:2013-02-19

    申请号:US12846937

    申请日:2010-07-30

    IPC分类号: H01L33/00

    摘要: The present application describes a vertical light-emitting diode (VLED) and its manufacture method that use the combination of a reflective layer, a transparent conducting layer and transparent dielectric layer as structural layers for promoting uniform current distribution and increasing light extraction. In the VLED, a transparent conducting layer is formed on a first outer surface of a stack of multiple group III nitride semiconductor layers. A transparent dielectric layer is then formed on a side of the transparent conducting layer opposite the side of the multi-layer structure. A first electrode structure is then formed on the transparent dielectric layer in electrical contact with the transparent conducting layer via a plurality of contact windows patterned through the transparent dielectric layer. The transparent conducting layer and the transparent dielectric layer are used as structural layers for improving light extraction.

    摘要翻译: 本申请描述了使用反射层,透明导电层和透明介电层的组合的垂直发光二极管(VLED)及其制造方法作为用于促进均匀电流分布和增加光提取的结构层。 在VLED中,在多个III族氮化物半导体层的堆叠的第一外表面上形成透明导电层。 然后在与多层结构侧相反的透明导电层的一侧上形成透明介电层。 然后通过经由透明介电层图案化的多个接触窗口,在透明电介质层上形成与透明导电层电接触的第一电极结构。 透明导电层和透明介电层用作改进光提取的结构层。

    Vertical Light-Emitting Diode and Manufacture Method Thereof
    8.
    发明申请
    Vertical Light-Emitting Diode and Manufacture Method Thereof 有权
    垂直发光二极管及其制造方法

    公开(公告)号:US20110163293A1

    公开(公告)日:2011-07-07

    申请号:US12846937

    申请日:2010-07-30

    IPC分类号: H01L33/06 H01L33/30

    摘要: The present application describes a vertical light-emitting diode (VLED) and its manufacture method that use the combination of a reflective layer, a transparent conducting layer and transparent dielectric layer as structural layers for promoting uniform current distribution and increasing light extraction. In the VLED, a transparent conducting layer is formed on a first outer surface of a stack of multiple group III nitride semiconductor layers. A transparent dielectric layer is then formed on a side of the transparent conducting layer opposite the side of the multi-layer structure. A first electrode structure is then formed on the transparent dielectric layer in electrical contact with the transparent conducting layer via a plurality of contact windows patterned through the transparent dielectric layer. The transparent conducting layer and the transparent dielectric layer are used as structural layers for improving light extraction.

    摘要翻译: 本申请描述了使用反射层,透明导电层和透明介电层的组合的垂直发光二极管(VLED)及其制造方法作为用于促进均匀电流分布和增加光提取的结构层。 在VLED中,在多个III族氮化物半导体层的堆叠的第一外表面上形成透明导电层。 然后在与多层结构侧相反的透明导电层的一侧上形成透明介电层。 然后通过经由透明介电层图案化的多个接触窗口,在透明电介质层上形成与透明导电层电接触的第一电极结构。 透明导电层和透明介电层用作改进光提取的结构层。

    SURFACE ROUGHENING METHOD FOR LIGHT EMITTING DIODE SUBSTRATE
    10.
    发明申请
    SURFACE ROUGHENING METHOD FOR LIGHT EMITTING DIODE SUBSTRATE 有权
    用于发光二极管基板的表面粗糙化方法

    公开(公告)号:US20090186435A1

    公开(公告)日:2009-07-23

    申请号:US12018086

    申请日:2008-01-22

    IPC分类号: H01L33/00

    CPC分类号: H01L33/22

    摘要: The present invention discloses a surface roughening method for an LED substrate, which uses a grinding technology and an abrasive paper of from No. 300 to No. 6000 to grind the surface of a substrate to form a plurality of irregular concave zones and convex zones on the surface of the substrate. Next, a semiconductor light emitting structure is formed on the surface of the substrate. The concave zones and convex zones can scatter and diffract the light inside LED, reduce the horizontally-propagating light between the substrate and the semiconductor layer, decrease the probability of total reflection and promote LED light extraction efficiency.

    摘要翻译: 本发明公开了一种用于LED基板的表面粗糙化方法,其使用研磨技术和300〜6000号的研磨纸来研磨基板的表面,以形成多个不规则凹区域和凸区域 衬底的表面。 接下来,在基板的表面上形成半导体发光结构。 凹区和凸区可以散射和衍射LED内部的光,减少基板与半导体层之间的水平传播光,降低全反射的可能性,提高LED光提取效率。