公开(公告)号：US10799587B2

公开(公告)日：2020-10-13

申请号：US15151510

申请日：2016-05-11

申请人： Huan Niu ,  Chien Hsu Chen ,  Causon Ko-Chuan Jen

发明人： Huan Niu ,  Chien Hsu Chen ,  Causon Ko-Chuan Jen

IPC分类号： A61K41/00 ,  A61K47/69 ,  A61K31/704

摘要： A composition for neutron capture therapy and a method of preparing the same are provided. The composition includes at least one nanodiamond particle and at least one neutron capture element, in which the at least one neutron capture element is embedded into the at least one nanodiamond particle by using an ion implantation system.

公开(公告)号：US20170326236A1

公开(公告)日：2017-11-16

申请号：US15151510

申请日：2016-05-11

申请人： Huan NIU ,  Chien Hsu Chen ,  Causon Ko-Chuan Jen

发明人： Huan NIU ,  Chien Hsu Chen ,  Causon Ko-Chuan Jen

IPC分类号： A61K41/00 ,  A61K31/704

摘要： A composition for neutron capture therapy and a method of preparing the same are provided. The composition includes at least one nanodiamond particle and at least one neutron capture element, in which the at least one neutron capture element is embedded into the at least one nanodiamond particle by using an ion implantation system.

公开(公告)号：US20110233431A1

公开(公告)日：2011-09-29

申请号：US12748877

申请日：2010-03-29

申请人： Zhimin WAN ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

发明人： Zhimin WAN ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

IPC分类号： H01J37/317 ,  H01J37/02

CPC分类号： C23C14/48 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/24542 ,  H01J2237/31711

摘要： A variable aperture within an aperture device is used to shape the ion beam before the substrate is implanted by shaped ion beam, especially to finally shape the ion beam in a position right in front of the substrate. Hence, different portions of a substrate, or different substrates, can be implanted respectively by different shaped ion beams without going through using multiple fixed apertures or retuning the ion beam each time. In other words, different implantations may be achieved respectively by customized ion beams without high cost (use multiple fixed aperture devices) and complex operation (retuning the ion beam each time). Moreover, the beam tune process for acquiring a specific ion beam to be implanted may be accelerated, to be faster than using multiple fixed aperture(s) and/or retuning the ion beam each time, because the adjustment of the variable aperture may be achieved simply by mechanical operation.

摘要翻译： 在通过成形离子束注入衬底之前，使用孔装置内的可变孔径来形成离子束，特别是最终在离开衬底前方的位置形成离子束。 因此，可以通过不同的成形离子束分别注入衬底或不同衬底的不同部分，而不需要通过使用多个固定孔或每次重新调整离子束。 换句话说，可以通过定制的离子束分别实现不同的注入，而不需要高成本（使用多个固定孔径器件）和复杂的操作（每次重新调整离子束）。 此外，可以加速用于获取要注入的特定离子束的光束调整过程，以便每次都比使用多个固定孔径和/或重新调整离子束更快，因为可以实现可变孔径的调节 简单地通过机械操作。

公开(公告)号：US06639227B1

公开(公告)日：2003-10-28

申请号：US09691842

申请日：2000-10-18

申请人： Hilton Glavish ,  Causon Ko-Chuan Jen

发明人： Hilton Glavish ,  Causon Ko-Chuan Jen

IPC分类号： H01J37317

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J2237/03 ,  H01J2237/055

摘要： A charged particle filter provides a curved through path and has both magnetic poles for applying a magnetic field normal to the plane of curvature of the path and electrodes for applying a radial electric field. The filter is used as an energy filter downstream of an accelerator in an ion implanter. The filter can be set to provide a range of energy dispersions, to operate as an achromatic bend, or to reject lower charge state ions.

摘要翻译： 带电粒子滤波器提供弯曲通路，并且具有用于施加垂直于路径曲面的磁场的磁极和用于施加径向电场的电极的两个磁极。 过滤器用作离子注入机中加速器下游的能量过滤器。 过滤器可以设置为提供一系列能量分散体，作为消色差弯曲进行操作，或者抑制较低电荷状态的离子。

公开(公告)号：US08669539B2

公开(公告)日：2014-03-11

申请号：US12748877

申请日：2010-03-29

申请人： Zhimin Wan ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

发明人： Zhimin Wan ,  John D. Pollock ,  Don Berrian ,  Causon Ko-Chuan Jen

IPC分类号： H01J37/317 ,  H01J37/02

CPC分类号： C23C14/48 ,  H01J37/09 ,  H01J37/3171 ,  H01J2237/0455 ,  H01J2237/24542 ,  H01J2237/31711

摘要： A variable aperture within an aperture device is used to shape the ion beam before the substrate is implanted by shaped ion beam, especially to finally shape the ion beam in a position right in front of the substrate. Hence, different portions of a substrate, or different substrates, can be implanted respectively by different shaped ion beams without going through using multiple fixed apertures or retuning the ion beam each time. In other words, different implantations may be achieved respectively by customized ion beams without high cost (use multiple fixed aperture devices) and complex operation (retuning the ion beam each time). Moreover, the beam tune process for acquiring a specific ion beam to be implanted may be accelerated, to be faster than using multiple fixed aperture(s) and/or retuning the ion beam each time, because the adjustment of the variable aperture may be achieved simply by mechanical operation.

摘要翻译： 在通过成形离子束注入衬底之前，使用孔装置内的可变孔径来形成离子束，特别是最终在离开衬底前方的位置形成离子束。 因此，可以通过不同的成形离子束分别注入衬底或不同衬底的不同部分，而不需要通过使用多个固定孔或每次重新调整离子束。 换句话说，可以通过定制的离子束分别实现不同的注入，而不需要高成本（使用多个固定孔径器件）和复杂的操作（每次重新调整离子束）。 此外，可以加速用于获取要注入的特定离子束的光束调整过程，以便每次都比使用多个固定孔径和/或重新调整离子束更快，因为可以实现可变孔径的调节 简单地通过机械操作。