利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

28 条记录 (耗时 0.044 秒)

    Method and system for replacing a pattern in a layout
    1.
    发明授权
    Method and system for replacing a pattern in a layout 有权

    公开(公告)号：US08601408B2

    公开(公告)日：2013-12-03

    申请号：US13269757

    申请日：2011-10-10

    申请人： Huang-Yu Chen ,  Yuan-Te Hou ,  Chung-Min Fu ,  Chung-Hsing Wang ,  Wen-Hao Chen ,  Yi-Kan Cheng

    发明人： Huang-Yu Chen ,  Yuan-Te Hou ,  Chung-Min Fu ,  Chung-Hsing Wang ,  Wen-Hao Chen ,  Yi-Kan Cheng

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5077

    摘要： A received layout identifies a plurality of circuit components to be included in an integrated circuit (IC) layer for double patterning the layer using two photomasks, the layout including a plurality of first patterns to be included in the first photomask and at least one second pattern to be included in the second photomask. A selected one of the first patterns has first and second endpoints, to be replaced by a replacement pattern connecting the first endpoint to a third endpoint. At least one respective keep-out region is provided adjacent to each respective remaining first pattern except for the selected first pattern. Data are generated representing the replacement pattern, such that no part of the replacement pattern is formed in any of the keep-out regions. Data representing the remaining first patterns and the replacement pattern are output.

    Tool and method for eliminating multi-patterning conflicts
    2.
    发明授权
    Tool and method for eliminating multi-patterning conflicts 有权
    消除多图案化冲突的工具和方法

    公开(公告)号：US08448100B1

    公开(公告)日：2013-05-21

    申请号：US13444158

    申请日：2012-04-11

    申请人： Hung Lung Lin ,  Chin-Chang Hsu ,  Ying-Yu Shen ,  Wen-Ju Yang ,  Hsiao-Shu Chao ,  Yi-Kan Cheng ,  Chin-Hsiung Hsu ,  Huang-Yu Chen ,  Yi-Chuin Tsai ,  Yuan-Te Hou ,  Chung-Hsing Wang

    发明人： Hung Lung Lin ,  Chin-Chang Hsu ,  Ying-Yu Shen ,  Wen-Ju Yang ,  Hsiao-Shu Chao ,  Yi-Kan Cheng ,  Chin-Hsiung Hsu ,  Huang-Yu Chen ,  Yi-Chuin Tsai ,  Yuan-Te Hou ,  Chung-Hsing Wang

    IPC分类号： G06F17/50

    CPC分类号： G03F1/70

    摘要： A computer implemented system comprises: a tangible, non-transitory computer readable storage medium encoded with data representing an initial layout of an integrated circuit pattern layer having a plurality of polygons. A special-purpose computer is configured to perform the steps of: analyzing in the initial layout of an integrated circuit pattern layer having a plurality of polygons, so as to identify a plurality of multi-patterning conflict cycles in the initial layout; constructing in the computer a respective multi-patterning conflict cycle graph representing each identified multi-patterning conflict cycle; classifying each identified multi-patterning conflict cycle graph in the computer according to a number of other multi-patterning conflict cycle graphs which enclose that multi-patterning conflict cycle graph; and causing a display device to graphically display the plurality of multi-patterning conflict cycle graphs according to their respective classifications.

    摘要翻译： 计算机实现的系统包括：编码有表示具有多个多边形的集成电路图案层的初始布局的数据的有形的，非暂时性的计算机可读存储介质。 专用计算机被配置为执行以下步骤：在具有多个多边形的集成电路图案层的初始布局中进行分析，以便在初始布局中识别多个多图案化冲突循环; 在计算机中构建表示每个识别的多图案化冲突周期的相应的多图案化冲突循环图; 根据围绕该多图案化冲突循环图的其他多图案化冲突循环图的数量，在计算机中分类每个识别的多图案化冲突循环图; 并且使得显示装置根据它们各自的分类图形地显示多个多图案化冲突循环图。

    Integrated circuit layout modification
    3.
    发明授权
    Integrated circuit layout modification 有权
    集成电路布局修改

    公开(公告)号：US08856696B2

    公开(公告)日：2014-10-07

    申请号：US13354707

    申请日：2012-01-20

    申请人： Wen-Hao Chen ,  Yuan-Te Hou ,  Yi-Kan Cheng

    发明人： Wen-Hao Chen ,  Yuan-Te Hou ,  Yi-Kan Cheng

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5068 ,  G06F17/5077

    摘要： Methods are disclosed of modifying an integrated circuit (IC) design that utilizes multiple patterning technology (MPT). The methods include configuring a first layout of an integrated circuit, having at least one layer with features to be formed utilizing fabrication by at least two masks. The at least one layer includes a plurality of active cells and a plurality of spare cells. A second layout is configured to re-route the spare cells and active cells, wherein the re-routing utilizes at least a portion of the plurality of spare cells. Fewer than all of the at least two masks are replaced to configure the second layout.

    摘要翻译： 公开了改进利用多重图案化技术（MPT）的集成电路（IC）设计的方法。 所述方法包括配置集成电路的第一布局，其具有至少一层具有通过至少两个掩模的制造而形成的特征的层。 该至少一层包括多个活动单元和多个备用单元。 第二布局被配置为重新路由备用单元和活动单元，其中重新路由使用多个备用单元的至少一部分。 比所有至少两个掩模更少，以配置第二个布局。

    COLORING/GROUPING PATTERNS FOR MULTI-PATTERNING
    4.
    发明申请
    COLORING/GROUPING PATTERNS FOR MULTI-PATTERNING 审中-公开
    多种颜色/分组图案

    公开(公告)号：US20130205266A1

    公开(公告)日：2013-08-08

    申请号：US13365546

    申请日：2012-02-03

    申请人： Wen-Hao Chen ,  Yuan-Te Hou ,  Yi-Kan Cheng

    发明人： Wen-Hao Chen ,  Yuan-Te Hou ,  Yi-Kan Cheng

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5077 ,  G06F2217/62

    摘要： A method comprises: accessing a persistent, machine readable storage medium containing data representing an integrated circuit (IC) design to be fabricated using multi-patterning; identifying at least one network of conductive patterns configured to transmit signals that substantially impact timing of at least one circuit in the IC; pre-grouping the at least one network of conductive patterns in a first group; and electronically providing data to an electronic design automation (EDA) tool to cause inclusion in a first single photomask of all portions of the patterns within the first group that are to be formed in a single layer of the IC, wherein the single layer is to be multi-patterned using at least two photomasks.

    摘要翻译： 一种方法包括：访问包含表示将使用多图案化制造的集成电路（IC）设计的数据的持久的机器可读存储介质; 识别被配置为传输基本上影响所述IC中的至少一个电路的定时的信号的导电图案的至少一个网络; 将第一组中的至少一个导电图案网络预分组; 以及将电子数据提供给电子设计自动化（EDA）工具，以使所述第一组中将被形成在所述IC的单个层中的所述图案的所有部分的第一单个光掩模包括在其中，所述单层为 使用至少两个光掩模进行多图案化。

    ROUTING SYSTEM AND METHOD FOR DOUBLE PATTERNING TECHNOLOGY
    6.
    发明申请
    ROUTING SYSTEM AND METHOD FOR DOUBLE PATTERNING TECHNOLOGY 有权
    双文件技术的路由系统和方法

    公开(公告)号：US20110119648A1

    公开(公告)日：2011-05-19

    申请号：US12649979

    申请日：2009-12-30

    申请人： Huang-Yu Chen ,  Yuan-Te Hou ,  Gwan Sin Chang ,  Wen-Ju Yang ,  Zhe-Wei Jiang ,  Yi-Kan Cheng ,  Lee-Chung Lu

    发明人： Huang-Yu Chen ,  Yuan-Te Hou ,  Gwan Sin Chang ,  Wen-Ju Yang ,  Zhe-Wei Jiang ,  Yi-Kan Cheng ,  Lee-Chung Lu

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5077

    摘要： A method includes receiving an identification of a plurality of circuit components to be included in an IC layout. Data are generated representing a first pattern to connect two of the circuit components. The first pattern has a plurality of segments. At least two of the segments have lengthwise directions perpendicular to each other. At least one pattern-free region is reserved adjacent to at least one of the at least two segments. Data are generated representing one or more additional patterns near the first pattern. None of the additional patterns is formed in the pattern-free region. The first pattern and the additional patterns form a double-patterning compliant set of patterns. The double-patterning compliant set of patterns are output to a machine readable storage medium to be read by a system for controlling a process to fabricate a pair of masks for patterning a semiconductor substrate using double patterning technology.

    摘要翻译： 一种方法包括接收要包括在IC布局中的多个电路部件的标识。 生成表示连接两个电路部件的第一图案的数据。 第一图案具有多个片段。 至少两个片段具有彼此垂直的纵向方向。 保留与至少两个段中的至少一个相邻的至少一个无图案区域。 生成表示在第一图案附近的一个或多个附加图案的数据。 在无模式区域中没有形成附加图案。 第一种图案和附加图案形成双重图案化顺应的图案集合。 将双图案化顺应的图案集合输出到机器可读存储介质，以由用于控制制造用于使用双重图案化技术图案化半导体衬底的一对掩模的工艺的系统读取。

    Routing system and method for double patterning technology
    8.
    发明授权
    Routing system and method for double patterning technology 有权
    双重图案化技术的路由系统和方法

    公开(公告)号：US08239806B2

    公开(公告)日：2012-08-07

    申请号：US12649979

    申请日：2009-12-30

    申请人： Huang-Yu Chen ,  Yuan-Te Hou ,  Gwan Sin Chang ,  Wen-Ju Yang ,  Zhe-Wei Jiang ,  Yi-Kan Cheng ,  Lee-Chung Lu

    发明人： Huang-Yu Chen ,  Yuan-Te Hou ,  Gwan Sin Chang ,  Wen-Ju Yang ,  Zhe-Wei Jiang ,  Yi-Kan Cheng ,  Lee-Chung Lu

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5077

    摘要： A method includes receiving an identification of a plurality of circuit components to be included in an IC layout. Data are generated representing a first pattern to connect two of the circuit components. The first pattern has a plurality of segments. At least two of the segments have lengthwise directions perpendicular to each other. At least one pattern-free region is reserved adjacent to at least one of the at least two segments. Data are generated representing one or more additional patterns near the first pattern. None of the additional patterns is formed in the pattern-free region. The first pattern and the additional patterns form a double-patterning compliant set of patterns. The double-patterning compliant set of patterns are output to a machine readable storage medium to be read by a system for controlling a process to fabricate a pair of masks for patterning a semiconductor substrate using double patterning technology.

    摘要翻译： 一种方法包括接收要包括在IC布局中的多个电路部件的标识。 生成表示连接两个电路部件的第一图案的数据。 第一图案具有多个片段。 至少两个片段具有彼此垂直的纵向方向。 保留与至少两个段中的至少一个相邻的至少一个无图案区域。 生成表示在第一图案附近的一个或多个附加图案的数据。 在无模式区域中没有形成附加图案。 第一种图案和附加图案形成双重图案化顺应的图案集合。 将双图案化顺应的图案集合输出到机器可读存储介质，以由用于控制制造用于使用双重图案化技术图案化半导体衬底的一对掩模的工艺的系统读取。

    Integrated Circuit Design using DFM-Enhanced Architecture
    9.
    发明申请
    Integrated Circuit Design using DFM-Enhanced Architecture 有权
    使用DFM增强架构的集成电路设计

    公开(公告)号：US20100281446A1

    公开(公告)日：2010-11-04

    申请号：US12708242

    申请日：2010-02-18

    申请人： Yung-Chin Hou ,  Lee-Chung Lu ,  Li-Chun Tien ,  Yi-Kan Cheng ,  Chun-Hui Tai ,  Ta-Pen Guo ,  Yuan-Te Hou

    发明人： Yung-Chin Hou ,  Lee-Chung Lu ,  Li-Chun Tien ,  Yi-Kan Cheng ,  Chun-Hui Tai ,  Ta-Pen Guo ,  Yuan-Te Hou

    IPC分类号： G06F17/50

    CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

    摘要： Integrated circuit libraries include a first standard cell having a first left boundary and a first right boundary, and a second standard cell having a second left boundary and a second right boundary. The first standard cell and the second standard cell are of a same cell variant. A first active region in the first standard cell has a different length of diffusion than a second active region in the second standard cell. The first active region and the second active region are corresponding active regions represented by a same component of a same circuit diagram representing both the first standard cell and the second standard cell.

    摘要翻译： 集成电路库包括具有第一左边界和第一右边界的第一标准单元，以及具有第二左边界和第二右边界的第二标准单元。 第一标准细胞和第二标准细胞具有相同的细胞变体。 第一标准单元中的第一有源区具有与第二标准单元中的第二有源区不同的扩散长度。 第一有源区和第二有源区是由表示第一标准单元和第二标准单元的相同电路图的相同分量表示的相应有源区。

    Methods for Cell Boundary Isolation in Double Patterning Design
    10.
    发明申请
    Methods for Cell Boundary Isolation in Double Patterning Design 有权
    双重图案设计中细胞边界隔离的方法

    公开(公告)号：US20100196803A1

    公开(公告)日：2010-08-05

    申请号：US12616970

    申请日：2009-11-12

    申请人： Lee-Chung Lu ,  Yi-Kan Cheng ,  Yuan-Te Hou ,  Yung-Chin Hou ,  Li-Chun Tien

    发明人： Lee-Chung Lu ,  Yi-Kan Cheng ,  Yuan-Te Hou ,  Yung-Chin Hou ,  Li-Chun Tien

    IPC分类号： G03F1/00 ,  G06F17/50

    CPC分类号： G03F1/70 ,  G03F1/00

    摘要： A method of designing a double patterning mask set for a layout of a chip includes designing standard cells. In each of the standard cells, all left-boundary patterns are assigned with one of a first indicator and a second indicator, and all right-boundary patterns are assigned with an additional one of the first indicator and the second indicator. The method further includes placing the standard cells in a row of the layout of the chip. Starting from one of the standard cells in the row, indicator changes to the standard cells are propagated throughout the row. All patterns in the standard cells having the first indicator are transferred to a first mask of the double patterning mask set. All patterns in the standard cells having the second indicator are transferred to a second mask of the double patterning mask set.

    摘要翻译： 设计用于芯片布局的双重图案掩模组的方法包括设计标准单元。 在每个标准单元中，所有左边界图案被分配有第一指示符和第二指示符中的一个，并且所有右边图案都被分配有第一指示符和第二指示符中的另外一个。 该方法还包括将标准单元放置在芯片布局的一行中。 从行中的一个标准单元开始，标记单元的指示符更改在整行中传播。 具有第一指示符的标准单元中的所有图案被转移到双图案掩模组的第一掩模。 具有第二指示器的标准单元中的所有图案被转移到双重图案掩模组的第二掩模。