公开(公告)号：US09873949B2

公开(公告)日：2018-01-23

申请号：US14897769

申请日：2014-06-13

申请人： IHP GmbH-Innovations for High Performance Microelectronics/Leibniz-Institut Fur Innovative Mikroelektronik

发明人： Wolfgang Mehr ,  Andre Wolff

IPC分类号： B44C1/22 ,  C23F4/00 ,  H01J37/073 ,  H01J1/304 ,  H01J9/02 ,  H01J37/32 ,  B81C1/00 ,  C23C16/50 ,  H01L21/3065 ,  H01L21/308

CPC分类号： C23F4/00 ,  B81C1/00111 ,  C23C16/50 ,  H01J1/3044 ,  H01J9/025 ,  H01J37/073 ,  H01J37/32963 ,  H01J37/32981 ,  H01J2201/30411 ,  H01J2209/0226 ,  H01J2237/334 ,  H01L21/3065 ,  H01L21/3081

摘要： A method for producing a nanotip from a tip material provides a substrate which consists of the tip material or has the material in the form of a coating, produces a mask from a mask material selected so that, in a predefined reactive ion etching process, the mask material is removed at a lower etching rate than the tip material, and carries out the reactive ion etching process in an etching chamber. The mask material is additionally selected so that a gaseous component is released therefrom during the reactive ion etching process, the gaseous component not being released from the tip material. The method further comprises detecting the gaseous component while the ion etching process is being carried out, repeatedly determining whether an amount of the gaseous component in the etching chamber reaches a predefined lower threshold, and stopping the reactive ion etching process when the lower threshold is reached.