公开(公告)号：US20220413380A1

公开(公告)日：2022-12-29

申请号：US17846366

申请日：2022-06-22

Applicant: IMEC VZW

Inventor： Sandeep Seema Saseendran ,  Deniz Sabuncuoglu Tezcan ,  Abhilash Paneri ,  Cian Cummins

IPC: G03F1/70 ,  H01L21/311 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/033

Abstract: A method is provided for producing different patterns on a single substrate. The method includes executing at least twice a sequence of the following steps: depositing a hardmask on the layer of interest and patterning the hardmask with a predefined pattern to create an accessible portion on the layer of interest; spinning a glass/carbon layer on the hardmask and on the accessible portion of the layer of interest; spin coating a block copolymer on the glass/carbon layer; transferring a predefined block copolymer pattern onto the layer of interest thereby obtaining a transferred pattern, removing the hard mask; filling the transferred pattern followed by chemical mechanical polishing or etching back, wherein different block copolymer patterns are used.