公开(公告)号：US20160067822A1

公开(公告)日：2016-03-10

申请号：US14825632

申请日：2015-08-13

Applicant: IMRA AMERICA, INC.

Inventor： Alan Y. ARAI ,  Gyu C. CHO ,  Jingzhou XU ,  Fumiyo YOSHINO ,  Haibin ZHANG ,  James BOVATSEK ,  Makoto YOSHIDA

IPC: B23K26/0622 ,  B23K26/08 ,  B23K26/21 ,  B23K26/324 ,  B23K26/364 ,  B23K26/402 ,  B23K26/53 ,  B23K26/55 ,  B23K26/00 ,  B23K26/359 ,  C03C23/00 ,  C03B33/10 ,  C03B23/00 ,  H01L21/78 ,  H01L21/268 ,  B23K26/067

CPC classification number: B23K26/0624 ,  B23K26/0676 ,  B23K26/083 ,  B23K26/0869 ,  B23K26/21 ,  B23K26/324 ,  B23K26/359 ,  B23K26/364 ,  B23K26/40 ,  B23K26/402 ,  B23K26/53 ,  B23K26/55 ,  B23K2103/50 ,  B23K2103/54 ,  B28D5/00 ,  B28D5/0011 ,  B29C65/1606 ,  B29C65/1612 ,  B29C65/1619 ,  B29C65/1629 ,  B29C65/1635 ,  B29C65/1638 ,  B29C65/1654 ,  B29C65/1658 ,  B29C65/1687 ,  B29C65/38 ,  B29C66/1122 ,  B29C66/43 ,  B29C66/71 ,  B29C66/73161 ,  B29C66/73366 ,  B29C66/73921 ,  B29C66/836 ,  B29C66/952 ,  B29K2995/0026 ,  B41M5/26 ,  B41M5/262 ,  B41M5/267 ,  C03B23/006 ,  C03B33/102 ,  C03C23/0025 ,  H01L21/268 ,  H01L21/78 ,  B29K2069/00

Abstract: Methods, devices, and systems for ultrashort pulse laser processing of optically transparent materials are disclosed, with example applications in scribing, marking, welding, and joining. For example, ultrashort laser pulses create scribe features with one pass of the laser beam across the material, with at least one of the scribe features being formed below the surface of the material. Slightly modifying the ultrashort pulse laser processing conditions produces sub-surface marks. When properly arranged, these marks are clearly visible with correctly aligned illumination. Reflective marks may also be formed with control of laser parameters. A transparent material other than glass may be utilized. A method for welding transparent materials uses ultrashort laser pulses to create a bond through localized heating. In some embodiments of transparent material processing, a multifocus beam generator simultaneously forms multiple beam waists spaced depthwise relative to the transparent material, thereby increasing processing speed.

Abstract translation: 公开了用于光学透明材料的超短脉冲激光加工的方法，装置和系统，例如在划线，标记，焊接和接合中的应用。 例如，超短激光脉冲通过激光束穿过材料产生一次划线特征，其中至少一个划线特征形成在材料表面下方。 稍微修改超短脉冲激光加工条件会产生次表面痕迹。 正确布置时，这些标记在正确对齐的照明下清晰可见。 还可以通过激光参数的控制来形成反射标记。 可以使用玻璃以外的透明材料。 用于焊接透明材料的方法使用超短激光脉冲通过局部加热产生粘结。 在透明材料处理的一些实施例中，多焦点光束发生器同时形成相对于透明材料沿深度方向间隔开的多个光束束，从而提高处理速度。

公开(公告)号：US20130093581A1

公开(公告)日：2013-04-18

申请号：US13648484

申请日：2012-10-10

Applicant: IMRA AMERICA, Inc.

Inventor： Alan Y. ARAI

IPC: B60Q1/00

CPC classification number: B60R1/1207 ,  B60Q1/00 ,  B60R2001/1215 ,  G09G2380/06 ,  G09G2380/10

Abstract: A display apparatus generates a high visibility optical signal, such as an ICON, the ICON comprising a symbol, shape, or other image-like representation. The ICON becomes visible at an observation point during an illumination ON-state. The ICON may be formed as a portion of display medium, for example as a machined portion of a mirror capable of forming images of a scene by reflection in normal operation. The visibility of the ICON in the illumination OFF-state from an observation point is sufficiently low such that the normal operation of the display medium is maintained. The display apparatus may be used in a blind spot warning system for a vehicle. Visible wavelength LEDs, RGB LEDs and/or diode lasers may be utilized as an illumination source. Ultrashort laser processing or other methods for material modification may be utilized to form microscopic features which distribute incident light, increasing the visibility of the optical signal at an observation point in an ON-state, with very low visibility in the OFF-state and minimal effect on the image in the display medium in the OFF state.

Abstract translation: 显示装置产生诸如ICON的高可见度光信号，ICON包括符号，形状或其他图像样表示。 ICON在照明ON状态的观察点变得可见。 ICON可以形成为显示介质的一部分，例如作为能够在正常操作中通过反射来形成场景的图像的镜子的加工部分。 ICON在观察点的照明截止状态下的可见度足够低，从而维持显示介质的正常操作。 显示装置可以用于车辆的盲点警告系统。 可见波长LED，RGB LED和/或二极管激光器可用作照明源。 可以使用超短激光加工或其他材料修饰方法来形成分布入射光的微观特征，在ON状态的观察点增加光信号的可视性，在OFF状态下具有非常低的可见度和最小的影响 在显示介质中的图像处于OFF状态。

公开(公告)号：US20170190000A1

公开(公告)日：2017-07-06

申请号：US15465694

申请日：2017-03-22

Applicant: IMRA AMERICA, INC.

Inventor： James BOVATSEK ,  Alan Y. ARAI ,  Fumiyo YOSHINO

IPC: B23K26/53 ,  B23K26/0622 ,  B23K26/364 ,  B23K26/40 ,  B81C1/00 ,  C03B33/02 ,  C03B23/203 ,  B29C65/16 ,  B29C65/38 ,  B29C65/00 ,  B23K26/00 ,  B28D5/00

CPC classification number: B23K26/53 ,  B23K26/0617 ,  B23K26/0624 ,  B23K26/244 ,  B23K26/364 ,  B23K26/40 ,  B23K2103/50 ,  B28D5/0011 ,  B29C59/16 ,  B29C65/14 ,  B29C65/1616 ,  B29C65/1635 ,  B29C65/1638 ,  B29C65/1658 ,  B29C65/1664 ,  B29C65/1674 ,  B29C65/1696 ,  B29C65/38 ,  B29C66/1122 ,  B29C66/30223 ,  B29C66/322 ,  B29C66/3282 ,  B29C66/41 ,  B29C66/43 ,  B29C66/71 ,  B29C66/73366 ,  B29C66/7352 ,  B29C66/73921 ,  B29C66/836 ,  B29C66/91641 ,  B29C66/919 ,  B29C66/934 ,  B29C66/939 ,  B29C66/944 ,  B29C66/949 ,  B29K2033/12 ,  B29K2069/00 ,  B29K2995/0026 ,  B81B1/00 ,  B81C1/00119 ,  C03B23/20 ,  C03B23/203 ,  C03B33/0222 ,  C03C23/0025 ,  Y10T428/13 ,  Y10T428/15 ,  Y10T428/24479 ,  Y10T428/24802 ,  B29C65/00

Abstract: A method for scribing transparent materials uses ultrashort laser pulses to create multiple scribe features with a single pass of the laser beam across the material, with at least one of the scribe features being formed below the surface of the material. This enables clean breaking of transparent materials at a higher speed than conventional techniques.