Plasma device and operation method of plasma device
    1.
    发明授权
    Plasma device and operation method of plasma device 有权
    等离子体装置和等离子体装置的操作方法

    公开(公告)号:US09363881B2

    公开(公告)日:2016-06-07

    申请号:US14547149

    申请日:2014-11-19

    Abstract: A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with multiple widths is formed between the first electrode structure and the dielectric barrier. The dielectric barrier is located between the first electrode structure and the second electrode structure. The second electrode structure includes electrode blocks sequentially arranged from the upstream terminal to the downstream terminal. The dielectric barrier, the first electrode structure, and the second electrode structure are located on the same side of the third electrode structure located at the downstream terminal. A minimum distance between the electrode blocks and the third electrode structure is not less than a distance between the first electrode structure and the third electrode structure.

    Abstract translation: 等离子体装置包括介电阻挡层,第一电极结构,第二电极结构和第三电极结构。 电介质阻挡层具有上游端子和下游端子,并且限定了设置有第一电极结构的空间。 在第一电极结构和电介质屏障之间形成具有多个宽度的间隙。 电介质阻挡层位于第一电极结构和第二电极结构之间。 第二电极结构包括从上游端子到下游端子顺序排列的电极块。 电介质势垒,第一电极结构和第二电极结构位于位于下游端子处的第三电极结构的同一侧。 电极块和第三电极结构之间的最小距离不小于第一电极结构和第三电极结构之间的距离。

    PLASMA DEVICE AND OPERATION METHOD OF PLASMA DEVICE
    2.
    发明申请
    PLASMA DEVICE AND OPERATION METHOD OF PLASMA DEVICE 有权
    等离子体装置的等离子体装置和操作方法

    公开(公告)号:US20150156857A1

    公开(公告)日:2015-06-04

    申请号:US14547149

    申请日:2014-11-19

    Abstract: A plasma device includes a dielectric barrier, a first electrode structure, a second electrode structure, and a third electrode structure. The dielectric barrier has an upstream terminal and a downstream terminal and defines a space, in which the first electrode structure is disposed. A gap with multiple widths is formed between the first electrode structure and the dielectric barrier. The dielectric barrier is located between the first electrode structure and the second electrode structure. The second electrode structure includes electrode blocks sequentially arranged from the upstream terminal to the downstream terminal. The dielectric barrier, the first electrode structure, and the second electrode structure are located on the same side of the third electrode structure located at the downstream terminal. A minimum distance between the electrode blocks and the third electrode structure is not less than a distance between the first electrode structure and the third electrode structure.

    Abstract translation: 等离子体装置包括介电阻挡层,第一电极结构,第二电极结构和第三电极结构。 电介质阻挡层具有上游端子和下游端子,并且限定了设置有第一电极结构的空间。 在第一电极结构和电介质屏障之间形成具有多个宽度的间隙。 电介质阻挡层位于第一电极结构和第二电极结构之间。 第二电极结构包括从上游端子到下游端子顺序排列的电极块。 电介质势垒,第一电极结构和第二电极结构位于位于下游端子处的第三电极结构的同一侧。 电极块和第三电极结构之间的最小距离不小于第一电极结构和第三电极结构之间的距离。

    SUBSTRATE AND MASK ATTACHMENT CLAMP DEVICE
    3.
    发明申请
    SUBSTRATE AND MASK ATTACHMENT CLAMP DEVICE 审中-公开
    基板和外壳连接夹具装置

    公开(公告)号:US20140144377A1

    公开(公告)日:2014-05-29

    申请号:US13872721

    申请日:2013-04-29

    Abstract: A substrate and mask attachment clamp device comprising a push assembly, an upper clamp mechanism and a lower clamp mechanism is disclosed. The upper clamp mechanism comprises a first inclined surface, a swing element, a second inclined surface and a sliding surface. The lower clamp mechanism comprises a lower clamp retainer and a clamp movably. During the push assembly moving along a first direction, the push assembly moves with respect to the first inclined surface to drive the upper clamp mechanism to move along a second direction. The push assembly further drives the second inclined surface to move with respect to the swing element, so that the swing element drives the clamp to move along a third direction opposite to the first direction, and drives the sliding surface to move with respect to the lower clamp mechanism to drive the clamp to move along a fourth direction.

    Abstract translation: 公开了一种包括推动组件,上部夹紧机构和下部夹紧机构的基板和面罩附接夹紧装置。 上夹紧机构包括第一倾斜表面,摆动元件,第二倾斜表面和滑动表面。 下夹持机构包括可动的下夹具保持器和夹具。 在推动组件沿着第一方向移动时,推动组件相对于第一倾斜表面移动以驱动上部夹紧机构沿第二方向移动。 推动组件进一步驱动第二倾斜表面相对于摆动元件移动,使得摆动元件驱动夹具沿着与第一方向相反的第三方向移动,并且驱动滑动表面相对于下部的移动 夹紧机构以驱动夹具沿着第四方向移动。

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