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公开(公告)号:US20230203680A1
公开(公告)日:2023-06-29
申请号:US17840200
申请日:2022-06-14
Applicant: Industrial Technology Research Institute
Inventor: Wen-Hsuan CHAO , Kuo-Hsin LIN , Hsiao-Chun HUANG , Shih-Chang CHEN , Han-Jung LI , Li-Duan TSAI
IPC: C25B11/077 , C25B1/04
CPC classification number: C25B11/077 , C25B1/04
Abstract: An anode catalyst material has a chemical formula of FeaNibMcNdOe, wherein M is Mo, W, Sn, Si, Nb, V, Cr, Ta or a combination thereof. a+b+c+d+e=1, a>0, b>0, c>0, d≥0, and e≥0. The anode catalyst material can be used in a water electrolysis device for hydrogen evolution, which includes an anode and a cathode disposed in an alkaline aqueous solution, and the anode includes the described anode catalyst material.
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公开(公告)号:US20180034065A1
公开(公告)日:2018-02-01
申请号:US15387961
申请日:2016-12-22
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Wen-Hsuan CHAO , Chiung-Hui HUANG , Ping-Hsing YANG , Shan-Haw CHIOU , Keng-Yang CHEN , Chien-Ming LAI , Li-Duan TSAI
Abstract: An electrocatalyst is provided. The electrocatalyst includes Pd-containing metal nitride, wherein the metal is Co, Fe, Y, Lu, Sc, Ti, V, Cu, Ni, or a combination thereof. The molar ratio between the metal and Pd is greater than 0 and less than or equal to 0.8. A fuel cell utilizing the above electrocatalyst is further provided.
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公开(公告)号:US20210095383A1
公开(公告)日:2021-04-01
申请号:US17107034
申请日:2020-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN , Yu-Ming LIN
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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公开(公告)号:US20200173040A1
公开(公告)日:2020-06-04
申请号:US16205903
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Yu-Ming LIN , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN
Abstract: A membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and an anionic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer has a chemical structure of M′aM″bN2 or M′cM″dCe, wherein M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, M″ is Nb, Ta, or a combination thereof, 0.7≤a≤1.7, 0.3≤b≤1.3, a+b=2, 0.24≤c≤1.7, 0.3≤d≤1.76, and 0.38≤e≤3.61, wherein M′aM″bN2 is a cubic crystal system and M′cM″d Ce is a cubic crystal system or amorphous.
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公开(公告)号:US20200173043A1
公开(公告)日:2020-06-04
申请号:US16205349
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN , Yu-Ming LIN
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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公开(公告)号:US20200173042A1
公开(公告)日:2020-06-04
申请号:US16204905
申请日:2018-11-29
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Yu-Ming LIN , Pin-Hsin YANG , Hsiao-Chun HUANG , Chiu-Ping HUANG , Jiunn-Nan LIN
Abstract: A method for manufacturing catalyst material is provided, which includes putting an M′ target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′aM″bN2 on a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′aM″bN2 is a cubic crystal system.
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