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公开(公告)号:US20240162455A1
公开(公告)日:2024-05-16
申请号:US18122643
申请日:2023-03-16
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Chien-Ming LAI , Sung-Chun CHANG , Chiu-Ping HUANG , Li-Duan TSAI
IPC: H01M8/04007 , H01M8/0245 , H01M8/0271 , H01M8/1004
CPC classification number: H01M8/04007 , H01M8/0245 , H01M8/0271 , H01M8/1004
Abstract: A battery cell including a membrane electrode assembly, a cathode bipolar plate and an anode bipolar plate. The anode bipolar plate includes a metal layer and a thermally conductive layer. The metal layer is stacked on a side of the membrane electrode assembly that is located farthest away from the cathode bipolar plate. The metal layer has a bottom surface, a top surface, a first side surface and a second side surface. The bottom surface faces the membrane electrode assembly. The thermally conductive layer includes a first cover layer and two second cover layers. The first cover layer covers the top surface of the metal layer. The two second cover layers protrude from two opposite sides of the first cover layer, respectively. The two second cover layers at least partially cover the first side surface and the second side surface of the metal layer, respectively.
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公开(公告)号:US20210095383A1
公开(公告)日:2021-04-01
申请号:US17107034
申请日:2020-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN , Yu-Ming LIN
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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公开(公告)号:US20200173040A1
公开(公告)日:2020-06-04
申请号:US16205903
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Yu-Ming LIN , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN
Abstract: A membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and an anionic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer has a chemical structure of M′aM″bN2 or M′cM″dCe, wherein M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, M″ is Nb, Ta, or a combination thereof, 0.7≤a≤1.7, 0.3≤b≤1.3, a+b=2, 0.24≤c≤1.7, 0.3≤d≤1.76, and 0.38≤e≤3.61, wherein M′aM″bN2 is a cubic crystal system and M′cM″d Ce is a cubic crystal system or amorphous.
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公开(公告)号:US20200173043A1
公开(公告)日:2020-06-04
申请号:US16205349
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Chiu-Ping HUANG , Pin-Hsin YANG , Hsiao-Chun HUANG , Jiunn-Nan LIN , Yu-Ming LIN
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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公开(公告)号:US20200173042A1
公开(公告)日:2020-06-04
申请号:US16204905
申请日:2018-11-29
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin LIN , Li-Duan TSAI , Wen-Hsuan CHAO , Yu-Ming LIN , Pin-Hsin YANG , Hsiao-Chun HUANG , Chiu-Ping HUANG , Jiunn-Nan LIN
Abstract: A method for manufacturing catalyst material is provided, which includes putting an M′ target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′aM″bN2 on a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′aM″bN2 is a cubic crystal system.
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