Abstract:
A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
Abstract:
A method for manufacturing catalyst material is provided, which includes putting an M′ target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′aM″bN2 on a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′aM″bN2 is a cubic crystal system.
Abstract:
An embodiment provides a manufacturing method for a porous carbon material including: preparing a first solution including a surfactant, a carbon source material and a solvent; pouring the first solution into a silica sol aqueous solution to form a second solution; preparing a silicate aqueous solution; pouring the silicate aqueous solution into the second solution to form a third solution and to precipitate out an intermediate, wherein the intermediate includes the surfactant, the carbon source material and a silica template; performing a heating process on the intermediate to carbonize the intermediate; and removing the silica template of the carbonized intermediate to form a porous carbon material. Another embodiment of the disclosure provides a porous carbon material. The other embodiment provides a supercapacitor.
Abstract:
A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
Abstract:
A membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and an anionic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer has a chemical structure of M′aM″bN2 or M′cM″dCe, wherein M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, M″ is Nb, Ta, or a combination thereof, 0.7≤a≤1.7, 0.3≤b≤1.3, a+b=2, 0.24≤c≤1.7, 0.3≤d≤1.76, and 0.38≤e≤3.61, wherein M′aM″bN2 is a cubic crystal system and M′cM″d Ce is a cubic crystal system or amorphous.