公开(公告)号：US20170092542A1

公开(公告)日：2017-03-30

申请号：US15377994

申请日：2016-12-13

申请人： INTEL CORPORATION

发明人： Joseph M. Steigerwald ,  Tahir Ghani ,  Jenny Hu ,  Ian R. C. Post

IPC分类号： H01L21/8234 ,  H01L27/088

摘要： Embodiments of the present disclosure describe multi-threshold voltage devices and associated techniques and configurations. In one embodiment, an apparatus includes a semiconductor substrate, a channel body disposed on the semiconductor substrate, a first gate electrode having a first thickness coupled with the channel body and a second gate electrode having a second thickness coupled with the channel body, wherein the first thickness is greater than the second thickness. Other embodiments may be described and/or claimed.

公开(公告)号：US09219155B2

公开(公告)日：2015-12-22

申请号：US14108265

申请日：2013-12-16

申请人： Intel Corporation

发明人： Joseph M. Steigerwald ,  Tahir Ghani ,  Jenny Hu ,  Ian R. C. Post

IPC分类号： H01L21/8238 ,  H01L29/78 ,  H01L29/66 ,  H01L29/423 ,  H01L21/28

CPC分类号： H01L29/7831 ,  H01L21/28114 ,  H01L21/823431 ,  H01L21/82345 ,  H01L21/823456 ,  H01L27/0886 ,  H01L29/42372 ,  H01L29/42376 ,  H01L29/4908 ,  H01L29/4958 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/66484 ,  H01L29/66772 ,  H01L29/66795 ,  H01L29/7855 ,  H01L29/7856 ,  H01L29/78645

摘要： Embodiments of the present disclosure describe multi-threshold voltage devices and associated techniques and configurations. In one embodiment, an apparatus includes a semiconductor substrate, a channel body disposed on the semiconductor substrate, a first gate electrode having a first thickness coupled with the channel body and a second gate electrode having a second thickness coupled with the channel body, wherein the first thickness is greater than the second thickness. Other embodiments may be described and/or claimed.

摘要翻译： 本公开的实施例描述了多阈值电压装置及相关联的技术和配置。 在一个实施例中，一种装置包括半导体衬底，设置在半导体衬底上的沟道体，具有与沟道本体耦合的第一厚度的第一栅电极和具有与沟道本体耦合的第二厚度的第二栅电极，其中， 第一厚度大于第二厚度。 可以描述和/或要求保护其他实施例。

公开(公告)号：US09761713B2

公开(公告)日：2017-09-12

申请号：US14941291

申请日：2015-11-13

申请人： INTEL CORPORATION

发明人： Joseph M. Steigerwald ,  Tahir Ghani ,  Jenny Hu ,  Ian R. C. Post

IPC分类号： H01L21/8238 ,  H01L29/78 ,  H01L29/66 ,  H01L29/423 ,  H01L21/28 ,  H01L29/49 ,  H01L29/786 ,  H01L29/51

CPC分类号： H01L29/7831 ,  H01L21/28114 ,  H01L21/823431 ,  H01L21/82345 ,  H01L21/823456 ,  H01L27/0886 ,  H01L29/42372 ,  H01L29/42376 ,  H01L29/4908 ,  H01L29/4958 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/66484 ,  H01L29/66772 ,  H01L29/66795 ,  H01L29/7855 ,  H01L29/7856 ,  H01L29/78645

摘要： Embodiments of the present disclosure describe multi-threshold voltage devices and associated techniques and configurations. In one embodiment, an apparatus includes a semiconductor substrate, a channel body disposed on the semiconductor substrate, a first gate electrode having a first thickness coupled with the channel body and a second gate electrode having a second thickness coupled with the channel body, wherein the first thickness is greater than the second thickness. Other embodiments may be described and/or claimed.

公开(公告)号：US10573747B2

公开(公告)日：2020-02-25

申请号：US15377994

申请日：2016-12-13

申请人： INTEL CORPORATION

发明人： Joseph M. Steigerwald ,  Tahir Ghani ,  Jenny Hu ,  Ian R. C. Post

IPC分类号： H01L29/78 ,  H01L29/66 ,  H01L27/088 ,  H01L29/423 ,  H01L21/28 ,  H01L29/49 ,  H01L29/786 ,  H01L29/51 ,  H01L21/8234

摘要： Embodiments of the present disclosure describe multi-threshold voltage devices and associated techniques and configurations. In one embodiment, an apparatus includes a semiconductor substrate, a channel body disposed on the semiconductor substrate, a first gate electrode having a first thickness coupled with the channel body and a second gate electrode having a second thickness coupled with the channel body, wherein the first thickness is greater than the second thickness. Other embodiments may be described and/or claimed.

公开(公告)号：US20160155843A1

公开(公告)日：2016-06-02

申请号：US14941291

申请日：2015-11-13

申请人： INTEL CORPORATION

发明人： Joseph M. Steigerwald ,  Tahir Ghani ,  Jenny Hu ,  Ian R. C. Post

IPC分类号： H01L29/78 ,  H01L29/49 ,  H01L29/51 ,  H01L29/66

CPC分类号： H01L29/7831 ,  H01L21/28114 ,  H01L21/823431 ,  H01L21/82345 ,  H01L21/823456 ,  H01L27/0886 ,  H01L29/42372 ,  H01L29/42376 ,  H01L29/4908 ,  H01L29/4958 ,  H01L29/4966 ,  H01L29/517 ,  H01L29/66484 ,  H01L29/66772 ,  H01L29/66795 ,  H01L29/7855 ,  H01L29/7856 ,  H01L29/78645

摘要： Embodiments of the present disclosure describe multi-threshold voltage devices and associated techniques and configurations. In one embodiment, an apparatus includes a semiconductor substrate, a channel body disposed on the semiconductor substrate, a first gate electrode having a first thickness coupled with the channel body and a second gate electrode having a second thickness coupled with the channel body, wherein the first thickness is greater than the second thickness. Other embodiments may be described and/or claimed.