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1.发明申请CLEANING COMPOSITION AND PROCESS FOR CLEANING SEMICONDUCTOR DEVICES AND/OR TOOLING DURING MANUFACTURING THEREOF 有权清洁组合物和清洁半导体器件和/或其制造过程中的清洁公开(公告)号：US20140128307A1
公开(公告)日：2014-05-08
申请号：US13669627
申请日：2012-11-06
Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventor： Vishal Chhabra , Laertis Economikos , John A. Fitzsimmons , James Hannah , Mahmoud Khojasteh , Jennifer Muncy
CPC classification number: H01L21/02057 , C11D3/042 , C11D3/2079 , C11D3/2086 , C11D7/08 , C11D7/265 , C11D7/267 , C11D11/0047
Abstract: Cleaning solutions and processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an acidic aqueous cleaning solution free of a fluorine containing compound, the acidic aqueous cleaning solution including at least one antioxidant and at least one non-oxidizing acid.
Abstract translation: 用于在制造过程中清洁半导体器件或半导体工具的清洁溶液和工艺通常包括使半导体器件或半导体工具与不含氟化合物的酸性含水清洁溶液接触，所述酸性含水清洁溶液包含至少一种抗氧化剂和至少一种抗氧化剂 非氧化性酸。
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2.发明授权Cleaning composition and process for cleaning semiconductor devices and/or tooling during manufacturing thereof 有权用于清洁半导体器件的清洁组合物和工艺和/或其制造过程中的工具公开(公告)号：US09058976B2
公开(公告)日：2015-06-16
申请号：US13669627
申请日：2012-11-06
Applicant: International Business Machines Corporation
Inventor： Vishal Chhabra , Laertis Economikos , John A. Fitzsimmons , James Hannah , Mahmoud Khojasteh , Jennifer Muncy
CPC classification number: H01L21/02057 , C11D3/042 , C11D3/2079 , C11D3/2086 , C11D7/08 , C11D7/265 , C11D7/267 , C11D11/0047
Abstract: Cleaning solutions and processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an acidic aqueous cleaning solution free of a fluorine containing compound, the acidic aqueous cleaning solution including at least one antioxidant and at least one non-oxidizing acid.
Abstract translation: 用于在制造过程中清洁半导体器件或半导体工具的清洁溶液和工艺通常包括使半导体器件或半导体工具与不含氟化合物的酸性含水清洁溶液接触，所述酸性含水清洁溶液包含至少一种抗氧化剂和至少一种抗氧化剂 非氧化性酸。
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3.发明申请CLEANING COMPOSITION AND PROCESS FOR CLEANING SEMICONDUCTOR DEVICES AND/OR TOOLING DURING MANUFACTURING THEREOF 审中-公开清洁组合物和清洁半导体器件和/或其制造过程中的清洁公开(公告)号：US20150024989A1
公开(公告)日：2015-01-22
申请号：US14510381
申请日：2014-10-09
Applicant: International Business Machines Corporation
Inventor： Vishal Chhabra , Laertis Economikos , John A. Fitzsimmons , James Hannah , Mahmoud Khojasteh , Jennifer Muncy
CPC classification number: H01L21/02057 , C11D3/042 , C11D3/2079 , C11D3/2086 , C11D7/08 , C11D7/265 , C11D7/267 , C11D11/0047
Abstract: Cleaning solutions and processes for cleaning semiconductor devices or semiconductor tooling during manufacture thereof generally include contacting the semiconductor devices or semiconductor tooling with an acidic aqueous cleaning solution free of a fluorine containing compound, the acidic aqueous cleaning solution including at least one antioxidant and at least one non-oxidizing acid.
Abstract translation: 用于在制造过程中清洁半导体器件或半导体工具的清洁溶液和工艺通常包括使半导体器件或半导体工具与不含氟化合物的酸性含水清洁溶液接触，所述酸性含水清洁溶液包含至少一种抗氧化剂和至少一种抗氧化剂 非氧化性酸。
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