公开(公告)号：US11316193B2

公开(公告)日：2022-04-26

申请号：US16309978

申请日：2017-06-12

Applicant: Ilika Technologies Limited

Inventor： David Michael Laughman ,  Christopher Edward Lee ,  Laura Mary Perkins ,  Isabel Alexandra Domingues Tarroso Gomes ,  Brian Elliott Hayden

IPC: H01M10/0562 ,  H01M4/131 ,  H01M4/66 ,  C03C3/064 ,  H01M4/04 ,  H01M4/134 ,  H01M4/1391 ,  H01M4/1395 ,  H01M4/38 ,  H01M4/505 ,  H01M10/0525

Abstract: A lithium borosilicate composition, consisting essentially of a system of lithium oxide in combination with silicon oxide and boron oxide, wherein said lithium borosilicate comprises between 70-83 atomic % lithium based on the combined atomic percentages of lithium, boron and silicon, and wherein said lithium borosilicate is a glass, is disclosed.

公开(公告)号：US20160336583A1

公开(公告)日：2016-11-17

申请号：US15110598

申请日：2015-01-07

Applicant: Ilika Technologies Limited

Inventor： Duncan Clifford Alan Smith ,  Brian Elliott Hayden ,  Christopher Edward Lee ,  Alexandros Anastasopoulos ,  Laura Mary Perkins ,  Kyle James Hutchings

IPC: H01M4/04 ,  C23C14/58 ,  H01M4/1391 ,  H01M4/525 ,  H01M10/0525 ,  H01M10/0585 ,  H01M4/505 ,  C23C14/06 ,  H01M10/0562

CPC classification number: H01M4/0423 ,  C03C4/18 ,  C23C14/0021 ,  C23C14/0676 ,  C23C14/08 ,  C23C14/58 ,  H01M4/0421 ,  H01M4/1391 ,  H01M4/505 ,  H01M4/525 ,  H01M10/052 ,  H01M10/0525 ,  H01M10/0562 ,  H01M10/058 ,  H01M10/0585 ,  H01M2004/028 ,  H01M2300/0071

Abstract: A vapour deposition method for preparing a multi-layered thin film structure comprises providing a vapour source of each component element of a compound intended for a first layer and a compound intended for a second layer, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source or sources of one or more glass-forming elements, and a source or sources of one or more transition metals; heating a substrate to a first temperature; co-depositing component elements from at least the vapour sources of lithium, oxygen and the one or more transition metals onto the heated substrate wherein the component elements react on the substrate to form a layer of a crystalline lithium-containing transition metal oxide compound; heating the substrate to a second temperature within a temperature range of substantially 170° C. or less from the first temperature; and co-depositing component elements from at least the vapour sources of lithium, oxygen and the one or more glass-forming elements onto the heated substrate wherein the component elements react on the substrate to form a layer of an amorphous lithium-containing oxide or oxynitride compound.

Abstract translation: 一种用于制备多层薄膜结构的气相沉积方法包括提供旨在用于第一层的化合物的每个组分元素的蒸气源和用于第二层的化合物，其中所述蒸气源至少包含锂源 ，氧源，一种或多种玻璃形成元素的源或源，以及一种或多种过渡金属的源或源; 将基底加热至第一温度; 将至少来自锂，氧和一种或多种过渡金属的蒸汽源的组分元素共沉淀到加热的衬底上，其中组分元素在衬底上反应以形成结晶的含锂过渡金属氧化物化合物的层; 将基板加热到与第一温度基本上为170℃以下的温度范围内的第二温度; 以及将至少来自锂，氧和一种或多种玻璃形成元素的蒸汽源的组分元素共沉积到加热的衬底上，其中组分元素在衬底上反应以形成无定形含锂氧化物或氮氧化物的层 复合。

公开(公告)号：US20160340784A1

公开(公告)日：2016-11-24

申请号：US15110638

申请日：2015-01-07

Applicant: ILIKA TECHNOLOGIES LIMITED ,  TOYOTA MOTOR CORPORATION

Inventor： Brian Elliott Hayden ,  Duncan Clifford Alan Smith ,  Christopher Edward Lee ,  Alexandros Anastasopoulos ,  Chihiro Yada ,  Laura Mary Perkins ,  David Michael Laughman

IPC: C23C16/505 ,  C03C4/18 ,  C23C16/452 ,  H01M10/0562 ,  C23C16/30 ,  C23C16/40 ,  C03C3/04 ,  H01M10/0525

CPC classification number: C23C16/505 ,  C03C3/04 ,  C03C3/089 ,  C03C4/18 ,  C03C2204/00 ,  C23C14/0021 ,  C23C14/0676 ,  C23C14/08 ,  C23C14/24 ,  C23C16/308 ,  C23C16/40 ,  C23C16/452 ,  H01M10/052 ,  H01M10/0525 ,  H01M10/0562 ,  H01M2300/0071

Abstract: A vapour deposition method for preparing an amorphous lithium-containing oxide or oxynitride compound not containing phosphorous comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, a source of nitrogen in the case of an oxynitride compound, and a source or sources of one or more glass-forming elements; heating a substrate to substantially 180° C. or above; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the amorphous compound.

Abstract translation: 用于制备不含磷的无定形含锂氧化物或氮氧化物的气相沉积方法包括提供化合物的每个组分元素的蒸气源，其至少包括锂源，氧源，氮源 氧氮化合物的情况，以及一种或多种玻璃形成元素的来源或来源; 将基底加热至基本上180℃或更高; 并将来自蒸汽源的组分元素共沉积到加热的基底上，其中组分元素在基底上反应以形成无定形化合物。

公开(公告)号：US20160340772A1

公开(公告)日：2016-11-24

申请号：US15110553

申请日：2015-01-07

Applicant: ILIKA TECHNOLOGIES LIMITED

Inventor： Duncan Clifford Alan Smith ,  Brian Elliott Hayden ,  Laura Mary Perkins ,  Christopher Edward Lee ,  Alexandros Anastasopoulos ,  Kyle James Hutchings ,  Sergey Yakovlev

IPC: C23C14/28 ,  H01M4/04 ,  H01M10/0525 ,  H01M4/1391 ,  H01M4/505 ,  H01M4/525 ,  C23C14/08 ,  H01M4/131

Abstract: A vapour deposition method for preparing a crystalline lithium-containing transition metal oxide compound comprises providing a vapour source of each component element of the compound, including at least a source of lithium, a source of oxygen, and a source or sources of one or more transition metals; heating a substrate to between substantially 150° C. and substantially 450° C.; and co-depositing the component elements from the vapour sources onto the heated substrate wherein the component elements react on the substrate to form the crystalline compound.

Abstract translation: 用于制备结晶含锂过渡金属氧化物化合物的气相沉积方法包括提供化合物的每个组分元素的蒸气源，其包括至少一种锂源，氧源，以及一种或多种 过渡金属; 将基底加热到基本上150℃和基本上450℃之间; 并将来自蒸汽源的组分元素共沉积到加热的基底上，其中组分元素在基底上反应以形成结晶化合物。