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公开(公告)号：US20050133365A1
公开(公告)日：2005-06-23
申请号：US10942273
申请日：2004-09-16
申请人： Ilyoung Hong , Donny Young , Michael Rosenstein , Robert Lowrance , Daniel Lubben , Michael Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
发明人： Ilyoung Hong , Donny Young , Michael Rosenstein , Robert Lowrance , Daniel Lubben , Michael Miller , Peijun Ding , Sreekrishnan Sankaranarayan , Goichi Yoshidome
CPC分类号： C23C14/3407 , C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A lift mechanism for and a corresponding use of a magnetron in a plasma sputter reactor. A magnetron rotating about the target axis is controllably lifted away from the back of the target to compensate for sputter erosion, thereby maintaining a constant magnetic field and resultant plasma density at the sputtered surface, which is particularly important for stable operation with a small magnetron, for example, one executing circular or planetary motion about the target axis. The lift mechanism can include a lead screw axially fixed to the magnetron support shaft and a lead nut engaged therewith to raise the magnetron as the lead nut is turned. Alternatively, the support shaft is axially fixed to a vertically moving slider. The amount of lift may be controlled according a recipe based on accumulated power applied to the target or by monitoring electrical characteristics of the target.
摘要翻译： 用于等离子体溅射反应器中的磁控管的升降机构和相应的使用。 围绕目标轴旋转的磁控管被可控地从目标的背面提升，以补偿溅射侵蚀，从而在溅射表面保持恒定的磁场和合成的等离子体密度，这对于使用小的磁控管的稳定操作特别重要， 例如，一个执行关于目标轴的圆形或行星运动。 升降机构可以包括轴向固定到磁控管支撑轴的导螺杆和与其接合的导螺母，以在导螺母转动时升高磁控管。 或者，支撑轴轴向固定到垂直移动的滑块。 可以根据基于施加到目标的累积功率的配方或通过监视目标的电气特性来控制升力量。
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公开(公告)号：US08911193B2
公开(公告)日：2014-12-16
申请号：US13305539
申请日：2011-11-28
申请人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
发明人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
IPC分类号： B65H1/00 , H01L21/677 , G03F7/20 , H01L21/67
CPC分类号： B25J11/008 , B25J18/00 , G03F7/70991 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , H01L21/67745 , Y10S414/135
摘要： A method and apparatus for processing substrates using a multi-chamber processing system, or cluster tool, is provided. In one embodiment of the invention, a robot assembly is provided. The robot assembly includes a first motion assembly movable in a first direction, and a second motion assembly, the second motion assembly being coupled to the first motion assembly and being movable relative to the first motion assembly in a second direction that is generally orthogonal to the first direction. The robot assembly further comprises an enclosure disposed in one of the first motion assembly or the second motion assembly, the enclosure containing at least a portion of a vertical actuator assembly, a support plate coupled to the enclosure, and a first transfer robot disposed on the support plate.
摘要翻译： 提供了一种使用多室处理系统或集群工具处理衬底的方法和装置。 在本发明的一个实施例中，提供了机器人组件。 所述机器人组件包括可在第一方向上移动的第一运动组件和第二运动组件，所述第二运动组件联接到所述第一运动组件，并且可相对于所述第一运动组件在大致正交于所述第一运动组件的第二方向上移动 第一个方向 所述机器人组件还包括设置在所述第一运动组件或所述第二运动组件中的一个中的外壳，所述外壳包含垂直致动器组件的至少一部分，联接到所述外壳的支撑板和设置在所述第二运动组件上的第一传送机器人 支撑板
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公开(公告)号：US08066466B2
公开(公告)日：2011-11-29
申请号：US12840143
申请日：2010-07-20
申请人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
发明人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
IPC分类号： H01L21/677
CPC分类号： B25J11/008 , B25J18/00 , G03F7/70991 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , H01L21/67745 , Y10S414/135
摘要： A method and apparatus for processing substrates using a multi-chamber processing system, or cluster tool, is provided. In one embodiment of the invention, a robot assembly is provided. The robot assembly includes a first motion assembly movable in a first direction, and a second motion assembly, the second motion assembly being coupled to the first motion assembly and being movable relative to the first motion assembly in a second direction that is generally orthogonal to the first direction. The robot assembly further comprises an enclosure disposed in one of the first motion assembly or the second motion assembly, an actuator within the enclosure, and a fan assembly disposed in the enclosure that is adapted to generate a pressure within the enclosure that is less than a pressure outside of the enclosure.
摘要翻译： 提供了一种使用多室处理系统或集群工具处理衬底的方法和装置。 在本发明的一个实施例中，提供了机器人组件。 所述机器人组件包括可在第一方向上移动的第一运动组件和第二运动组件，所述第二运动组件联接到所述第一运动组件，并且可相对于所述第一运动组件在大致正交于所述第一运动组件的第二方向上移动 第一个方向 机器人组件还包括设置在第一运动组件或第二运动组件中的一个中的壳体，壳体内的致动器，以及设置在外壳中的风扇组件，其适于产生外壳内的压力小于 外壳外部压力。
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公开(公告)号：US07798764B2
公开(公告)日：2010-09-21
申请号：US11553820
申请日：2006-10-27
申请人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
发明人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Dave Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
IPC分类号： H01L21/67
CPC分类号： B25J11/008 , B25J18/00 , G03F7/70991 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , H01L21/67745 , Y10S414/135
摘要： A method and apparatus for processing substrates using a cluster tool that has an increased system throughput, increased system reliability, improved device yield performance, and a reduced footprint. The various embodiments of the cluster tool may utilize two or more robot assemblies that are configured in a parallel processing configuration and adapted to move in a vertical and a horizontal direction to transfer substrates between the various processing chambers retained in the processing racks so that a desired processing sequence can be performed on the substrates. Generally, the various embodiments described herein are advantageous since each row or group of substrate processing chambers are serviced by two or more robots to allow for increased throughput and increased system reliability. Also, the various embodiments described herein are generally configured to minimize and control the particles generated by the substrate transferring mechanisms.
摘要翻译： 一种使用具有增加的系统吞吐量，增加的系统可靠性，改进的器件产量性能以及减少的占用空间的群集工具来处理衬底的方法和装置。 集群工具的各种实施例可以利用两个或更多个机器人组件，其被配置为并行处理配置并且适于在垂直和水平方向上移动以在保留在处理机架中的各种处理室之间传送衬底，使得期望的 处理顺序可以在基板上进行。 通常，这里描述的各种实施例是有利的，因为每行或一组衬底处理室由两个或更多个机器人来维护，以允许增加的生产量和增加的系统可靠性。 而且，这里描述的各种实施例通常被配置为最小化和控制由衬底转移机构产生的颗粒。
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公开(公告)号：US07374393B2
公开(公告)日：2008-05-20
申请号：US11398218
申请日：2006-04-05
申请人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Mario David Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
发明人： Mike Rice , Jeffrey Hudgens , Charles Carlson , William Tyler Weaver , Robert Lowrance , Eric Englhardt , Dean C. Hruzek , Mario David Silvetti , Michael Kuchar , Kirk Van Katwyk , Van Hoskins , Vinay Shah
IPC分类号： B65G61/00
CPC分类号： H01L21/67178 , H01L21/67173 , H01L21/67276 , H01L21/67742 , H01L21/67745 , H01L21/67748 , H01L21/68707
摘要： A method and apparatus for processing substrates using a multi-chamber processing system, or cluster tool, that has an increased system throughput, increased system reliability, improved device yield performance, a more repeatable wafer processing history (or wafer history), and a reduced footprint. The various embodiments of the cluster tool may utilize two or more robots that are configured in a parallel processing configuration to transfer substrates between the various processing chambers retained in the processing racks so that a desired processing sequence can be performed on the substrates. In one aspect, the parallel processing configuration contains two or more robot assemblies that are adapted to move in a vertical and horizontal directions, to access the various processing chambers retained in generally adjacently positioned processing racks. Generally, the various embodiments described herein are advantageous since each row or group of substrate processing chambers are serviced by two or more robots to allow for increased throughput and increased system reliability. Also, the various embodiments described herein are generally configured to minimize and control the particles generated by the substrate transferring mechanisms, to prevent device yield and substrate scrap problems that can affect the cost of ownership of the cluster tool. The flexible and modular architecture allows the user to configure the number of processing chambers, processing racks, and processing robots required to meet the throughput needs of the user.
摘要翻译： 一种使用多室处理系统或集群工具处理衬底的方法和设备，其具有增加的系统吞吐量，增加的系统可靠性，改进的器件产量性能，更可重复的晶片处理历史（或晶片历史）以及减少的 脚印。 群集工具的各种实施例可以使用以并行处理配置配置的两个或更多个机器人，以在保留在处理机架中的各种处理室之间传送衬底，使得可以在衬底上执行期望的处理顺序。 在一个方面，并行处理配置包括两个或更多个机器人组件，其适于在垂直和水平方向上移动，以访问保持在通常相邻定位的处理机架中的各种处理室。 通常，这里描述的各种实施例是有利的，因为每行或一组衬底处理室由两个或更多个机器人来维护，以允许增加的生产量和增加的系统可靠性。 此外，本文所述的各种实施例通常被配置为最小化和控制由衬底传送机构产生的颗粒，以防止可能影响群集工具的所有权成本的装置产量和衬底废料问题。 灵活和模块化的架构允许用户配置满足用户吞吐量需求所需的处理室，处理机架和处理机器人的数量。
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公开(公告)号：US20070278067A1
公开(公告)日：2007-12-06
申请号：US11838354
申请日：2007-08-14
IPC分类号： B65G29/00
CPC分类号： H01L21/67706 , B65G17/20 , B65G37/02 , B65G2201/0297 , H01L21/67727 , H01L21/6773 , H01L21/67769 , H01L21/67778 , Y10S414/135
摘要： According to a first aspect, a first conveyor system is provided that is adapted to deliver substrate carriers within a semiconductor device manufacturing facility. The first conveyor system includes a ribbon that forms a closed loop along at least a portion of the semiconductor device manufacturing facility. The ribbon is adapted to (1) be flexible in a horizontal plane and rigid in a vertical plane; and (2) transport a plurality of substrate carriers within at least a portion of the semiconductor device manufacturing facility. Numerous other aspects are provided, as are systems, methods and computer program products in accordance with these and other aspects.
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公开(公告)号：US20070235287A1
公开(公告)日：2007-10-11
申请号：US11761363
申请日：2007-06-11
IPC分类号： B65G47/26
CPC分类号： H01L21/67769 , H01L21/67724 , H01L21/6773 , H01L21/67733 , H01L21/67736
摘要： In a semiconductor fabrication facility, a conveyor transports substrate carriers. The substrate carriers are unloaded from the conveyor and loaded onto the conveyor without stopping the conveyor. A load and/or unload mechanism lifts the substrate carriers from the conveyor during unloading operations, while matching the horizontal speed of the conveyor. Similarly, during loading operations, the load/unload mechanism lowers a substrate carrier into engagement with the conveyor while matching the horizontal speed of the conveyor. Individual substrates, without carriers, may be similarly loaded and/or unloaded from a conveyor.
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公开(公告)号：US20060260909A1
公开(公告)日：2006-11-23
申请号：US11495052
申请日：2006-07-28
IPC分类号： B65G29/00
CPC分类号： H01L21/68707 , H01L21/6773 , H01L21/67733
摘要： A break-away mounting system for a continuous-motion, high-speed position conveyor system is disclosed. A support cradle may be suspended from a conveyor belt such that the support cradle maintains a fixed position and orientation relative to at least one point on the conveyor belt without inducing appreciable stress on the conveyor belt, the support cradle, or the coupling between the conveyor belt and the support cradle. The mount may include a leading rotatable bearing attached to the support cradle which may releasably engage a first key attached to the conveyor belt, the rotatable bearing adapted to accommodate rotational forces applied to the support cradle by the conveyor belt. The mount may also include a slide bearing attached to the support cradle which may releasably engage a second key attached to the conveyor belt, the slide bearing adapted to accommodate longitudinal forces applied to the support cradle by the conveyor belt.
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9.发明申请Substrate carrier handler that unloads substrate carriers directly from a moving conveyor 有权基板载体处理器，可直接从移动的输送机卸载基板托架公开(公告)号：US20060259196A1
公开(公告)日：2006-11-16
申请号：US11488873
申请日：2006-07-18
IPC分类号： G06F19/00
CPC分类号： B65G37/02 , B65G47/61 , B65G2201/0297 , H01L21/67769 , H01L21/67775 , H01L21/67778
摘要： In a first aspect, a substrate loading station is served by a conveyor which continuously transports substrate carriers. A substrate carrier handler that is part of the substrate loading station operates to exchange substrate carriers with the conveyor while the conveyor is in motion. A carrier exchange procedure may include moving an end effector of the substrate carrier handler at a velocity that substantially matches a velocity of the conveyor. Numerous other aspects are provided.
摘要翻译： 在第一方面中，基板装载站由连续输送基板载体的输送机供给。 作为基板装载站的一部分的基板载体处理器在输送机运动的同时与输送机交换基板载体。 载体交换过程可以包括以基本匹配输送机速度的速度移动基底载体处理器的端部执行器。 提供了许多其他方面。
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公开(公告)号：US5447409A
公开(公告)日：1995-09-05
申请号：US226101
申请日：1994-04-11
申请人： Howard Grunes , Avi Tepman , Robert Lowrance
发明人： Howard Grunes , Avi Tepman , Robert Lowrance
IPC分类号： B25J9/10 , B25J9/12 , B25J21/00 , H01L21/673 , H01L21/677 , B25J18/00
CPC分类号： B25J9/107 , B25J21/005 , B25J9/126 , H01L21/67742 , Y10S414/13 , Y10S414/135 , Y10S414/139 , Y10T74/20317
摘要： A robot assembly, including a central hub, has two arms arranged for independent rotation about the hub. Two carriers, oriented 180.degree. apart from each other, are coupled to an end of each of the arms. A drive is provided for rotating the arms in opposite directions to extend one or the other of said carriers radially from said central hub, and for rotating the arms in the same direction to effect rotation of the carriers.
摘要翻译： 包括中心轮毂的机器人组件具有布置成围绕轮毂独立旋转的两个臂。 两个彼此相隔180度的载体被联接到每个臂的端部。 提供驱动器用于沿相反方向旋转臂以使所述载体中的一个或另一个从所述中心毂径向延伸，并且用于沿相同方向旋转臂以实现载体的旋转。
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