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公开(公告)号：US20150191815A1
公开(公告)日：2015-07-09
申请号：US14661958
申请日：2015-03-18
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Jeremy Cheng , Muhammad Imran , Jingyu Lao , Minh Huu Le , Daniel Schweigert , Zhi-Wen Wen Sun , Yu Wang , Yongli Xu , Guizhen Zhang
IPC: C23C14/08
CPC classification number: C23C14/08 , C03C17/36 , C03C17/3618 , C03C17/3644 , C03C17/366 , C03C17/3681 , C23C14/0036 , C23C14/083 , C23C14/185 , C23C14/3464 , G02B5/0875 , G02B5/208 , Y10T428/12611
Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include a ternary alloy of nickel, titanium, and niobium, which showed improvements in overall performance than those from binary barrier results. The percentage of nickel can be between 5 and 15 wt %. The percentage of titanium can be between 30 and 50 wt %. The percentage of niobium can be between 40 and 60 wt %.
Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括镍，钛和铌的三元合金，其显示出比来自二元屏障结果的整体性能的改善。 镍的百分比可以在5和15重量％之间。 钛的百分比可以在30-50重量％之间。 铌的百分比可以在40至60重量％之间。
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2.发明申请SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY 有权低合金玻璃生产涂层的系统，方法和装置，包括三次合金公开(公告)号：US20140268316A1
公开(公告)日：2014-09-18
申请号：US14139350
申请日：2013-12-23
Applicant: Intermolecular Inc.
Inventor： Guizhen Zhang , Brent Boyce , Jeremy Cheng , Guowen Ding , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yongli Xu
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1.
Abstract translation: 本文公开了用于形成低辐射率面板的系统，方法和装置，其可以包括衬底和形成在衬底上的反射层。 低发射率面板还可以包括在反射层上形成的顶部电介质层，使得反射层形成在顶部电介质层和衬底之间。 顶部介电层可以包括三元金属氧化物，例如锌锡氧化铝。 顶部电介质层也可以包括铝。 铝的浓度可以在约1原子％至15原子％之间或约2原子％至10原子％之间。 顶部电介质层中锌与锡的原子比可以在约0.67至约1.5之间或约0.9至约1.1之间。
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公开(公告)号：US09448345B2
公开(公告)日：2016-09-20
申请号：US13725126
申请日：2012-12-21
Applicant: Intermolecular Inc. , Guardian Industries Corp.
Inventor： Mohd Fadzli Anwar Hassan , Brent Boyce , Guowen Ding , Minh Huu Le , Zhi-Wen Wen Sun , Yu Wang , Yongli Xu
CPC classification number: G02B5/208 , C03C17/36 , C03C17/3644 , C03C17/3649 , C03C17/3652 , C03C17/366 , C03C17/40 , G02B5/282
Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.
Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta，Nb，Zr，Hf，Mn，Y，Si和Ti，第二元素可以包括可以具有低氧亲和性的Ru，Ni，Co，Mo和W。 合金阻挡层可以减少可见光范围内的光吸收，可以提供颜色中性的产品，并可以提高对银层的粘附性。
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公开(公告)号：US09410359B2
公开(公告)日：2016-08-09
申请号：US14662583
申请日：2015-03-19
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Tong Ju , Minh Huu Le , Phil Lingle , Daniel Schweigert , Yongli Xu , Guizhen Zhang
CPC classification number: E06B3/6715 , C03C17/36 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , Y10T428/24975 , Y10T428/265
Abstract: Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A low-e stack is formed above the transparent substrate. Each of the layers of the low-e stack are formed to have a specific thickness to tune the performance characteristics of the low-e panel.
Abstract translation: 本文提供的实施例描述了用于形成低e板的低e板和方法。 提供透明基板。 在透明基板的上方形成低e堆叠。 低e叠层的每个层都形成为具有特定厚度以调节低e面板的性能特性。
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5.发明申请SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS 有权低功率玻璃生产涂料的系统，方法和装置公开(公告)号：US20140308528A1
公开(公告)日：2014-10-16
申请号：US14144828
申请日：2013-12-31
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Jeremy Cheng , Jose Ferreira , Muhammad Imran , Minh Huu Le , Daniel Schweigert , Yu Wang , Yongli Xu , Guizhen Zhang
CPC classification number: C03C17/366 , C03C17/3435 , C03C17/36 , C03C17/3613 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3681 , C03C25/226 , C03C2218/155 , C23C14/0036 , C23C14/0652 , C23C14/0688 , C23C14/083 , C23C14/086
Abstract: Disclosed herein are systems, methods, and apparatus for forming a low emissivity panel. In various embodiments, a partially fabricated panel may be provided. The partially fabricated panel may include a substrate, a reflective layer formed over the substrate, and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the substrate and the top dielectric layer. The top dielectric layer may include tin having an oxidation state of +4. An interface layer may be formed over the top dielectric layer. A top diffusion layer may be formed over the interface layer. The top diffusion layer may be formed in a nitrogen plasma environment. The interface layer may substantially prevent nitrogen from the nitrogen plasma environment from reaching the top dielectric layer and changing the oxidation state of tin included in the top dielectric layer.
Abstract translation: 本文公开了用于形成低发射率面板的系统，方法和装置。 在各种实施例中，可以提供部分制造的面板。 部分制造的面板可以包括衬底，在衬底上形成的反射层，以及形成在反射层上的顶部电介质层，使得反射层形成在衬底和顶部电介质层之间。 顶部电介质层可以包括具有+4的氧化态的锡。 界面层可以形成在顶部介电层上。 可以在界面层上形成顶部扩散层。 顶部扩散层可以在氮等离子体环境中形成。 界面层可以基本上防止来自氮等离子体环境的氮到达顶部电介质层并改变顶部电介质层中包含的锡的氧化态。
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Patent Agency Ranking
6.发明授权公开(公告)号：US09518319B2
公开(公告)日：2016-12-13
申请号：US14203182
申请日：2014-03-10
Applicant: Intermolecular Inc. , Guardian Industries Corp.
Inventor： Guowen Ding , Jeremy Cheng , Tong Ju , Minh Huu Le , Daniel Schweigert , Zhi-Wen Sun , Yongli Xu , Guizhen Zhang
IPC: B32B15/04 , B32B17/06 , C23C14/08 , G02F1/09 , B29D11/00 , G02B5/26 , C03C17/36 , C23C14/14 , E06B9/24
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels. A first dielectric layer is disposed over a substrate and includes a bi-metal oxide having tin and bismuth or niobium. A seed layer is disposed directly on the first dielectric layer. A reflective layer including silver is disposed directly on the seed layer. A barrier layer is disposed above the reflective layer. The barrier layer includes one of a nickel chromium titanium aluminum alloy or a nickel chromium titanium aluminum oxide. The nickel chromium titanium aluminum alloy or the nickel chromium titanium aluminum oxide includes between about 5% and about 10% by weight nickel, between about 25% and about 30% by weight chromium, between about 30% and about 35% by weight titanium, and between about 30% and about 35% by weight aluminum.
Abstract translation: 本文公开了用于形成低发射率面板的系统，方法和装置。 第一电介质层设置在衬底上并且包括具有锡和铋或铌的双金属氧化物。 种子层直接设置在第一介电层上。 包括银的反射层直接设置在种子层上。 阻挡层设置在反射层上。 阻挡层包括镍铬钛铝合金或镍铬钛氧化铝中的一种。 镍铬钛铝合金或镍铬钛铝氧化物包括约5重量％至约10重量％的镍，约25重量％至约30重量％的铬，约30重量％至约35重量％的钛， 和约30重量％至约35重量％的铝。
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公开(公告)号：US20150191965A1
公开(公告)日：2015-07-09
申请号：US14662583
申请日：2015-03-19
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Tong Ju , Minh Huu Le , Phil Lingle , Daniel Schweigert , Yongli Xu , Guizhen Zhang
CPC classification number: E06B3/6715 , C03C17/36 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , Y10T428/24975 , Y10T428/265
Abstract: Embodiments provided herein describe low-e panels and methods for forming low-e panels. A transparent substrate is provided. A low-e stack is formed above the transparent substrate. Each of the layers of the low-e stack are formed to have a specific thickness to tune the performance characteristics of the low-e panel.
Abstract translation: 本文提供的实施例描述了用于形成低e板的低e板和方法。 提供透明基板。 在透明基板的上方形成低e堆叠。 低e叠层的每个层都形成为具有特定厚度以调节低e面板的性能特性。
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8.发明申请公开(公告)号：US20140272395A1
公开(公告)日：2014-09-18
申请号：US14203182
申请日：2014-03-10
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Jeremy Cheng , Tong Ju , Minh Huu Le , Daniel Schweigert , Zhi-Wen Wen Sun , Yongli Xu , Guizhen Zhang
IPC: C03C17/36
CPC classification number: G02B5/208 , B29D11/00865 , C03C17/36 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C23/007 , C03C2217/43 , C03C2217/48 , C03C2218/154 , C23C14/083 , C23C14/085 , C23C14/14 , C23C14/22 , E06B9/24 , E06B2009/2417 , E06B2009/2464 , G02B5/26 , G02F1/091 , G02F2001/094 , Y10T428/24975 , Y10T428/265
Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a first reflective layer, a second reflective layer, and a spacer layer disposed between the first reflective layer and the second reflective layer. In some embodiments, the spacer layer may have a thickness of between about 20 nm and 90 nm. The spacer layer may include a bi-metal oxide that may include tin, and may further include one of zinc, aluminum, or magnesium. The spacer layer may have a substantially amorphous structure. Moreover, the spacer layer may have a substantially uniform composition throughout the thickness of the spacer layer. The low emissivity panel may be configured to have a color change as determined by Rg ΔE (i.e. as determined on the glass side) that is less than about 1.7 in response to an application of a heat treatment to the low emissivity panel.
Abstract translation: 本文公开了用于形成低辐射率面板的系统，方法和装置，其可以包括设置在第一反射层和第二反射层之间的第一反射层，第二反射层和间隔层。 在一些实施例中，间隔层可以具有在约20nm和90nm之间的厚度。 间隔层可以包括可以包括锡的双金属氧化物，并且还可以包括锌，铝或镁中的一种。 间隔层可以具有基本上无定形的结构。 此外，间隔层可以在间隔层的整个厚度上具有基本均匀的组成。 低发射率面板可以被配置为响应于对低发射率面板的热处理的应用而具有小于约1.7的由Rg＆Dgr; E（即，在玻璃面上确定）确定的颜色变化。
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9.发明申请Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance 有权基层由低e涂层中具有极高/低折射率的两层材料层组成，以改善中性色和透光性能公开(公告)号：US20140186598A1
公开(公告)日：2014-07-03
申请号：US13728042
申请日：2012-12-27
Applicant: Intermolecular Inc.
Inventor： Guowen Ding , Brent Boyce , Muhammad Imran , Minh Huu Le , Zhi-Wen Wen Sun , Yu Wang , Yongli Xu
IPC: C03C17/34
CPC classification number: C03C17/36 , C03C17/3618 , C03C17/3644 , C03C17/366 , C03C17/3681 , C03C2217/734 , Y10T428/24975
Abstract: Low emissivity coated panels can be fabricated using a base layer having a low refractive index layer on a high refractive index layer. The low refractive index layer can have refractive index less than 1.5, and can include Mg F2, CaF2, SiO2, or BO. The high refractive index layer can have refractive index greater than 2.3, and can include TiOx, NbOx, or BiOx. The multilayer base structure can allow color tuning with enhanced transmission, for example, as compared to similar structures having single layer base layer.
Abstract translation: 可以使用在高折射率层上具有低折射率层的基底层来制造低发射率涂层面板。 低折射率层可以具有小于1.5的折射率，并且可以包括MgF 2，CaF 2，SiO 2或BO。 高折射率层可以具有大于2.3的折射率，并且可以包括TiO x，NbO x或BiO x。 与具有单层基底层的类似结构相比，多层基底结构可以允许具有增强的透射率的颜色调节。
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公开(公告)号：US20140177042A1
公开(公告)日：2014-06-26
申请号：US13725126
申请日：2012-12-21
Applicant: Guardian Industries Corp. , Intermolecular Inc.
Inventor： Mohd Fadzli Anwar Hassan , Brent Boyce , Guowen Ding , Minh Huu Le , Zhi-Wen Wen Sun , Yu Wang , Yongli Xu
IPC: G02B5/20
CPC classification number: G02B5/208 , C03C17/36 , C03C17/3644 , C03C17/3649 , C03C17/3652 , C03C17/366 , C03C17/40 , G02B5/282
Abstract: A method for making low emissivity panels, including control the composition of a barrier layer formed on a thin conductive silver layer. The barrier structure can include an alloy of a first element having high oxygen affinity with a second element having low oxygen affinity. The first element can include Ta, Nb, Zr, Hf, Mn, Y, Si, and Ti, and the second element can include Ru, Ni, Co, Mo, and W, which can have low oxygen affinity property. The alloy barrier layer can reduce optical absorption in the visible range, can provide color-neutral product, and can improve adhesion to the silver layer.
Abstract translation: 一种制造低发射率面板的方法，包括控制形成在薄导电银层上的阻挡层的组成。 阻挡结构可以包括具有高氧亲和力的第一元素与具有低氧亲合力的第二元素的合金。 第一元素可以包括Ta，Nb，Zr，Hf，Mn，Y，Si和Ti，第二元素可以包括可以具有低氧亲和性的Ru，Ni，Co，Mo和W。 合金阻挡层可以减少可见光范围内的光吸收，可以提供颜色中性的产品，并可以提高对银层的粘附性。
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