METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESSING
    4.
    发明申请
    METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESSING 审中-公开
    半导体加工方法与装置

    公开(公告)号:US20080073031A1

    公开(公告)日:2008-03-27

    申请号:US11929230

    申请日:2007-10-30

    IPC分类号: H01L21/67 H01L21/00

    摘要: A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.

    摘要翻译: 公开了一种用于半导体处理的方法和装置。 在一个实施例中,一种在群集工具内传送晶片的方法包括将晶片放置在真空封壳的第一段中,真空外壳附接到处理室和工厂接口。 使用垂直传送机构将晶片传送到真空外壳的第二部分,其中第二部分在第一部分之上或之下。

    A METHOD AND APPARATUS FOR SEMCONDUCTOR PROCESSING
    5.
    发明申请
    A METHOD AND APPARATUS FOR SEMCONDUCTOR PROCESSING 有权
    一种用于半导体加工的方法和装置

    公开(公告)号:US20080089774A1

    公开(公告)日:2008-04-17

    申请号:US11929357

    申请日:2007-10-30

    IPC分类号: H01L21/677

    摘要: A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.

    摘要翻译: 公开了一种用于半导体处理的方法和装置。 在一个实施例中,一种在群集工具内传送晶片的方法包括将晶片放置在真空封壳的第一段中,真空外壳附接到处理室和工厂接口。 使用垂直传送机构将晶片传送到真空外壳的第二部分,其中第二部分在第一部分之上或之下。

    METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESSING
    6.
    发明申请
    METHOD AND APPARATUS FOR SEMICONDUCTOR PROCESSING 审中-公开
    半导体加工方法与装置

    公开(公告)号:US20100221915A1

    公开(公告)日:2010-09-02

    申请号:US12776235

    申请日:2010-05-07

    IPC分类号: H01L21/677 H01L21/465

    摘要: A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.

    摘要翻译: 公开了一种用于半导体处理的方法和装置。 在一个实施例中,一种在群集工具内传送晶片的方法包括将晶片放置在真空封壳的第一段中,真空外壳附接到处理室和工厂接口。 使用垂直传送机构将晶片传送到真空外壳的第二部分,其中第二部分在第一部分之上或之下。

    Method and apparatus for semiconductor processing
    7.
    发明授权
    Method and apparatus for semiconductor processing 有权
    用于半导体处理的方法和装置

    公开(公告)号:US07748944B2

    公开(公告)日:2010-07-06

    申请号:US11929357

    申请日:2007-10-30

    IPC分类号: B65G49/07

    摘要: A method and apparatus for semiconductor processing is disclosed. In one embodiment, a method of transporting a wafer within a cluster tool, comprises placing the wafer into a first segment of a vacuum enclosure, the vacuum enclosure being attached to a processing chamber and a factory interface. The wafer is transported to a second segment of the vacuum enclosure using a vertical transport mechanism, wherein the second segment is above or below the first segment.

    摘要翻译: 公开了一种用于半导体处理的方法和装置。 在一个实施例中,一种在群集工具内传送晶片的方法包括将晶片放置在真空封壳的第一段中,真空外壳附接到处理室和工厂接口。 使用垂直传送机构将晶片传送到真空外壳的第二部分,其中第二部分在第一部分之上或之下。