公开(公告)号：US09354523B2

公开(公告)日：2016-05-31

申请号：US14795153

申请日：2015-07-09

申请人： JSR Corporation

发明人： Yuuko Kiridoshi ,  Hiroyuki Nii ,  Tsuyoshi Furukawa ,  Takeo Shioya

IPC分类号： G03F7/40 ,  G03F7/004 ,  G03F7/039 ,  G03F7/30 ,  G03F7/32 ,  G03F7/20

CPC分类号： G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/405

摘要： A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.

摘要翻译： 抗蚀剂图案精制用组合物包括由式（1-1）表示的离子，由式（1-2）表示的离子，式（2-1）表示的离子，式（2-2）表示的离子 ）和溶剂。 相对于溶剂以外的成分的总和，共混的离子的总量不小于50质量％。 R1表示碳原子数为1〜30的一价有机基团或氟原子; Z表示单键或二价连接基团; R2表示单键，碳原子数1〜10的二价烃基或碳原子数1〜10的2价氟代烃基。 M +表示一价阳离子; R 3表示碳原子数为1〜30的1价有机基团。

公开(公告)号：US11429024B2

公开(公告)日：2022-08-30

申请号：US16893460

申请日：2020-06-05

申请人： JSR CORPORATION

发明人： Ryuichi Nemoto ,  Tsuyoshi Furukawa

IPC分类号： G03F7/004 ,  C07C69/712 ,  G03F7/038 ,  G03F7/039 ,  C08F220/28 ,  C08F220/38 ,  C08F220/18 ,  C07D327/04 ,  C07D309/12 ,  C07D319/20 ,  C07C65/21 ,  C07C323/12 ,  C07C25/02 ,  C07C381/12 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/38

摘要： The radiation-sensitive resin composition contains: a polymer having a structural unit that includes an acid-labile group; and a compound represented by formula (1). In the formula (1), Ar1 represents a group obtained by removing (m+n+2) hydrogen atoms from an aromatic ring of an arene having 6 to 30 carbon atoms; —OH and —COO— are bonded at ortho positions to each other on a same benzene ring on Ar1; and RG represents a group represented by formula (V-1), a group represented by formula (V-2), a group including a lactone structure, a group including a cyclic carbonate structure, a group including a sultone structure, a group including a ketonic carbonyl group, a group including a thiocarbonate group, or a group including a group represented by formula (V-3), or the like.

公开(公告)号：US20160011513A1

公开(公告)日：2016-01-14

申请号：US14795153

申请日：2015-07-09

申请人： JSR Corporation

发明人： Yuuko Kiridoshi ,  Hiroyuki Nii ,  Tsuyoshi Furukawa ,  Takeo Shioya

IPC分类号： G03F7/16

CPC分类号： G03F7/40 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/405

摘要： A composition for resist pattern-refinement includes an ion represented by formula (1-1), an ion represented by formula (1-2), an ion represented by formula (2-1), an ion represented by formula (2-2) and a solvent. A total amount of the ions blended is no less than 50% by mass with respect to a sum of components other than the solvent. R1 represents a monovalent organic group having 1 to 30 carbon atoms or a fluorine atom; Z represents a single bond or a divalent linking group; R2 represents a single bond, a divalent hydrocarbon group having 1 to 10 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 10 carbon atoms; M+ represents a monovalent cation; and R3 represents a monovalent organic group having 1 to 30 carbon atoms.

摘要翻译： 抗蚀剂图案精制用组合物包括由式（1-1）表示的离子，由式（1-2）表示的离子，式（2-1）表示的离子，式（2-2）表示的离子 ）和溶剂。 相对于溶剂以外的成分的总和，共混的离子的总量不小于50质量％。 R1表示碳原子数为1〜30的一价有机基团或氟原子; Z表示单键或二价连接基团; R2表示单键，碳原子数1〜10的二价烃基或碳原子数1〜10的2价氟代烃基。 M +表示一价阳离子; R 3表示碳原子数为1〜30的1价有机基团。

公开(公告)号：US09150962B2

公开(公告)日：2015-10-06

申请号：US14159444

申请日：2014-01-21

申请人： JSR Corporation

发明人： Tatsuya Sakai ,  Hideki Nishimura ,  Masahiro Yamamoto ,  Hisashi Nakagawa ,  Ryuuichi Saitou ,  Hideyuki Aoki ,  Tsuyoshi Furukawa

IPC分类号： C23C16/06 ,  H01L21/285 ,  H01L21/3205 ,  H01L21/768 ,  C23C16/18

CPC分类号： C23C16/06 ,  C23C16/18 ,  H01L21/28556 ,  H01L21/32051 ,  H01L21/76843 ,  H01L21/76877

摘要： Provided is a method for producing a substrate with a metal body. This method provides excellent film-forming properties (reflectance and adhesion), is easy to be used on a large substrate, and can be carried out at a low cost. The method includes the steps of: (A) heating a complex to a first temperature so as to generate a vapor of the complex; and (B) contacting the vapor with a substrate heated to a second temperature that is not higher than the first temperature so as to form a metal body containing a central metal of the complex, either in uncombined form or as a compound thereof (exclusive of the complex), on at least part of a surface of the substrate. The second temperature in step (B) is lower than the decomposition temperature of the complex. The central metal of the complex is aluminum or titanium.

摘要翻译： 提供一种用金属体制造衬底的方法。 该方法提供优异的成膜性（反射率和粘合性），易于在大的基板上使用，并且可以以低成本进行。 该方法包括以下步骤：（A）将络合物加热至第一温度以产生复合物的蒸气; 和（B）使蒸气与加热到不高于第一温度的第二温度的基底接触，以形成含有复合体的中心金属的金属体，或者以未组合的形式或作为其化合物（不包括 该复合物）在基材的表面的至少一部分上。 步骤（B）中的第二温度低于络合物的分解温度。 复合体的中心金属是铝或钛。