公开(公告)号：US20110305846A1

公开(公告)日：2011-12-15

申请号：US12885018

申请日：2010-09-17

申请人： JUNG-CHEN CHIEN ,  HUNG-JEN YANG ,  CHIH-CHEN CHANG ,  SHIH-CHIN LIN ,  MUH-WANG LIANG

发明人： JUNG-CHEN CHIEN ,  HUNG-JEN YANG ,  CHIH-CHEN CHANG ,  SHIH-CHIN LIN ,  MUH-WANG LIANG

IPC分类号： C23C16/503 ,  C23C16/50 ,  C23C16/02 ,  C23C16/00

CPC分类号： C23C16/407 ,  C23C16/505 ,  H01J37/32009 ,  H01L21/67126 ,  H01L21/67748

摘要： The present disclosure provides a surface processing apparatus, comprising a reaction chamber provided to form a deposition layer on a substrate, a carrying chamber connected to the reaction chamber and comprising a slot, and a plasma generator installed in the slot and providing plasma to process the substrate surface. Whereby the disclosure further provides a surface processing method, which flatten surface of a deposition layer on the substrate when the substrate is carried form the reaction chamber to the carrying chamber after the deposition process in the reaction chamber.

摘要翻译： 本公开提供了一种表面处理装置，其包括设置成在基板上形成沉积层的反应室，连接到反应室并包括槽的承载室和安装在槽中的等离子体发生器，并提供等离子体以处理 基材表面。 因此，本公开进一步提供了一种表面处理方法，当在反应室中沉积工艺之后，当衬底被承载形成反应室至承载室时，使衬底上的沉积层的表面变平。

公开(公告)号：US20090151637A1

公开(公告)日：2009-06-18

申请号：US12129009

申请日：2008-05-29

申请人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  FU-CHING TUNG ,  MUH-WANG LIANG ,  CHING-HUEI WU ,  CHAN-HSING LO ,  TEAN-MU SHEN ,  JUNG-CHEN CHIEN ,  JUNG-CHEN HO

发明人： CHIH-CHEN CHANG ,  TUNG-CHUAN WU ,  FU-CHING TUNG ,  MUH-WANG LIANG ,  CHING-HUEI WU ,  CHAN-HSING LO ,  TEAN-MU SHEN ,  JUNG-CHEN CHIEN ,  JUNG-CHEN HO

IPC分类号： C23C16/00 ,  H01L21/3065

CPC分类号： H05H1/46 ,  H01J37/32192 ,  H01J37/32229 ,  H01J37/32477

摘要： A microwave-excited plasma source using a ridged wave-guide line-type microwave plasma reactor is disclosed. The microwave-excited plasma source comprises a reaction chamber, a ridged wave-guide and a separation plate. The ridged wave-guide is disposed on the reaction chamber, and comprises a frame portion, a ridge portion and a line-shaped slot. The line-shaped slot is disposed on a first side of the frame portion, and the ridge portion facing the line-shaped slot is disposed on a second side of the frame portion. The separation plate is disposed on the line-shaped slot. Moreover, the ridged wave-guide is suitable for concentrating microwave power, which is transmitted to the reaction chamber through the line-shaped slot in order to excite plasma.

摘要翻译： 公开了一种使用脊波导线型微波等离子体反应器的微波激发等离子体源。 微波激发的等离子体源包括反应室，脊波导和分离板。 脊状波导布置在反应室上，包括框架部分，脊部分和线状槽。 线状槽设置在框架部分的第一侧上，并且面向线状槽的脊部设置在框架部分的第二侧上。 分隔板设置在线状槽上。 此外，脊状波导适用于集中微波功率，其通过线状槽传输到反应室以激发等离子体。