公开(公告)号：US20060247644A1

公开(公告)日：2006-11-02

申请号：US11324765

申请日：2006-01-03

申请人： Mohit Bhatnagar ,  Jack Yeh ,  James Sack ,  Richard Woods

发明人： Mohit Bhatnagar ,  Jack Yeh ,  James Sack ,  Richard Woods

IPC分类号： A61B17/84 ,  A61F2/44 ,  A61F2/46

CPC分类号： A61B17/0642 ,  A61B17/0682 ,  A61B17/10 ,  A61B2017/0409 ,  A61B2017/0419 ,  A61F2/4611 ,  A61F2002/30131 ,  A61F2002/30841 ,  A61F2002/4435 ,  A61F2002/4627 ,  A61F2230/0013

摘要： A repair system including a closure prosthesis and deployment device, and associated methods for repairing any imperfection including a flaw, hole, tear, bulge, or, in some cases, a deliberate cut or incision in any tissue including an intervertebral disc. The prosthesis has first and second side portions with a connecting central portion, and is designed to span an imperfection with opposite ends positioned on opposite sides of the imperfection. The prosthesis may include anchoring features including barbs and/or members that extend transversely. The deployment device can include a canula for positioning the prosthesis near the imperfection, and, in some cases, a mechanism that may cause the two sides of the prosthesis to be deployed in a specific order.

摘要翻译： 包括闭合假体和展开装置的修复系统以及用于修复任何缺陷的相关方法，所述缺陷包括缺陷，孔，撕裂，凸起，或在某些情况下，在包括椎间盘的任何组织中的有意切割或切口。 假体具有连接中心部分的第一和第二侧部，并且被设计成跨越位于不完美的相对侧上的相对端的缺陷。 假体可以包括锚固特征，包括横向延伸的倒钩和/或构件。 展开装置可以包括用于在假体附近定位假体的套管，并且在一些情况下可以包括可以使假体的两侧以特定顺序部署的机构。

公开(公告)号：US07001809B2

公开(公告)日：2006-02-21

申请号：US10119327

申请日：2002-04-09

申请人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

发明人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

IPC分类号： H01L21/336

CPC分类号： H01L27/11521 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66825 ,  H01L29/7885

摘要： A split-gate flash memory cell having a three-dimensional source capable of three-dimensional coupling with the floating gate of the cell, as well as a method of forming the same are provided. This is accomplished by first forming an isolation trench, lining it with a conformal oxide, then filling with an isolation oxide and then etching the latter to form a three-dimensional coupling region in the upper portion of the trench. A floating gate is next formed by first filling the three-dimensional region of the trench with polysilicon and etching it. The control gate is formed over the floating gate with an intervening inter-poly oxide. The floating gate forms legs extending into the three-dimensional coupling region of the trench thereby providing a three-dimensional coupling with the source which also assumes a three-dimensional region. The leg or the side-wall of the floating gate forming the third dimension provides the extra area through which coupling between the source and the floating gate is increased. In this manner, a higher coupling ratio is achieved without an increase in the cell size while at the same time alleviating the punchthrough and junction break-down of source region by sharing gate voltage along the side-wall.

公开(公告)号：US20050026368A1

公开(公告)日：2005-02-03

申请号：US10929397

申请日：2004-08-31

申请人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

发明人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

IPC分类号： H01L21/28 ,  H01L21/336 ,  H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788

CPC分类号： H01L27/11521 ,  H01L21/28273 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66553 ,  H01L29/7885

摘要： A method of making the selection gate in a split-gate flash EEPROM cell forms a selection gate on a trench sidewall of a semiconductor substrate to minimize the sidewise dimension of the selection gate and to maintain the channel length. The disclosed method includes the steps of: forming a trench on a semiconductor substrate on one side of a suspending gate structure; forming an inter polysilicon dielectric layer on the sidewall of the suspending gate structure and the trench; and forming a polysilicon spacer on the inter polysilicon dielectric layer as the selection gate. Such a split-gate flash EEPROM cell can produce ballistic hot electrons, improving the data writing efficiency and lowering the writing voltage.

摘要翻译： 在分裂栅极快闪EEPROM单元中形成选择栅极的方法在半导体衬底的沟槽侧壁上形成选择栅极，以最小化选择栅极的侧向尺寸并保持沟道长度。 所公开的方法包括以下步骤：在悬挂栅结构的一侧上的半导体衬底上形成沟槽; 在悬挂栅结构和沟槽的侧壁上形成多晶硅间介质层; 以及在多晶硅间介质层上形成多晶硅间隔物作为选择栅极。 这种分裂栅极快速EEPROM电池可以产生弹道热电子，提高数据写入效率并降低写入电压。

公开(公告)号：US06403494B1

公开(公告)日：2002-06-11

申请号：US09638300

申请日：2000-08-14

申请人： Wen-Ting Chu ,  Di-Son Kuo ,  Jack Yeh ,  Chia-Ta Hsieh ,  Chuan-Li Chang

发明人： Wen-Ting Chu ,  Di-Son Kuo ,  Jack Yeh ,  Chia-Ta Hsieh ,  Chuan-Li Chang

IPC分类号： H01L2100

CPC分类号： H01L27/11521 ,  H01L27/115

摘要： A method is disclosed for forming a split-gate flash memory cell where the floating gate of the cell is self-aligned to a shallow trench isolation (STI), which in turn makes it self-aligned to source and to word line. This will advantageously affect a shrinkage in the size of the memory cell. In a first embodiment, the close self-alignment is made possible through a new use of an anti-reflective coating (ARC) in the various process steps of the making of the cell. In the second embodiment, a low-viscosity material is used in such a manner so as to enable self-alignment of the floating gate to the STI in a simple way.

摘要翻译： 公开了一种用于形成分裂栅极闪存单元的方法，其中单元的浮置栅极自对准到浅沟槽隔离（STI），其又使得其自对准到源极和字线。 这将有利地影响存储器单元的尺寸的收缩。 在第一实施例中，通过在制造电池的各种工艺步骤中新的使用抗反射涂层（ARC）使得紧密的自对准成为可能。 在第二实施例中，以这样的方式使用低粘度材料，以便能够以简单的方式使浮动栅极与STI的自对准。

公开(公告)号：US6127229A

公开(公告)日：2000-10-03

申请号：US301222

申请日：1999-04-29

申请人： Wen-Ting Chu ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh ,  Chia-Ta Hsieh ,  Yai-Fen Lin

发明人： Wen-Ting Chu ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh ,  Chia-Ta Hsieh ,  Yai-Fen Lin

IPC分类号： H01L21/8247

CPC分类号： H01L27/11521

摘要： There is presented an improved method of fabricating an EEPROM device with a split gate. In the method, a silicon substrate is provided having spaced and parallel recessed oxide regions that isolate component regions where the oxide regions project above the top surface of the substrate. A thin gate oxide is formed on the substrate, and a first conformal layer is deposited over the gate oxide and projecting oxide regions. The substrate is then chemical-mechanically polished to remove the projections of polysilicon over the oxide regions. A silicon nitride layer is deposited on the resultant planar surface of the polysilicon, and elongated openings formed that will define the position of the floating gates that are perpendicular to the oxide regions. The exposed polysilicon in the openings in the silicon nitride are oxidized down to at least the level of the underlying silicon oxide regions, and the silicon nitride layer removed. The polysilicon layer is then removed using the silicon oxide layer as an etch barrier, and the edge surfaces of the resulting polysilicon floating gates oxidized. A second polysilicon layer is deposited on the substrate and elongated word lines formed that are parallel and partially overlapping the floating gates. Source lines are formed in the substrate, and gate lines are formed that overlie the floating gates.

摘要翻译： 提出了一种用分裂栅极制造EEPROM器件的改进方法。 在该方法中，提供硅衬底，其具有间隔开且平行的凹陷氧化物区域，其隔离氧化物区域突出在衬底的顶表面上方的组分区域。 在衬底上形成薄栅氧化物，并且在栅极氧化物和突出的氧化物区域上沉积第一共形层。 然后将衬底进行化学机械抛光以去除多晶硅在氧化物区域上的突起。 在所形成的多晶硅的平坦表面上沉积氮化硅层，形成将形成垂直于氧化物区域的浮栅的位置的细长开口。 氮化硅中的开口中的暴露的多晶硅被氧化到至少下面的氧化硅区域的水平，并且去除了氮化硅层。 然后使用氧化硅层作为蚀刻阻挡层去除多晶硅层，并且所得多晶硅浮栅的边缘表面被氧化。 第二多晶硅层沉积在衬底上，并且形成平行且部分地与浮动栅极重叠的细长字线。 在衬底中形成源极线，并且形成覆盖浮栅的栅极线。

公开(公告)号：US20050207264A1

公开(公告)日：2005-09-22

申请号：US11122726

申请日：2005-05-05

申请人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

发明人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

IPC分类号： H01L21/336 ,  H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788

CPC分类号： H01L27/11521 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66825 ,  H01L29/7885

摘要： A split-gate flash memory cell having a three-dimensional source capable of three-dimensional coupling with the floating gate of the cell, as well as a method of forming the same are provided. This is accomplished by first forming an isolation trench, lining it with a conformal oxide, then filling with an isolation oxide and then etching the latter to form a three-dimensional coupling region in the upper portion of the trench. A floating gate is next formed by first filling the three-dimensional region of the trench with polysilicon and etching it. The control gate is formed over the floating gate with an intervening inter-poly oxide. The floating gate forms legs extending into the three-dimensional coupling region of the trench thereby providing a three-dimensional coupling with the source which also assumes a three-dimensional region. The leg or the side-wall of the floating gate forming the third dimension provides the extra area through which coupling between the source and the floating gate is increased. In this manner, a higher coupling ratio is achieved without an increase in the cell size while at the same time alleviating the punchthrough and junction break-down of source region by sharing gate voltage along the side-wall.

摘要翻译： 提供具有能够与电池的浮动栅极三维耦合的三维源的分裂栅极闪存单元及其形成方法。 这是通过首先形成隔离沟槽，用共形氧化物衬里，然后用隔离氧化物填充，然后对其进行蚀刻，以在沟槽的上部形成三维耦合区域。 接下来通过用多晶硅填充沟槽的三维区域并对其进行蚀刻来形成浮栅。 控制栅极通过中间多晶硅氧化物形成在浮动栅上。 浮栅形成延伸到沟槽的三维耦合区域中的支腿，从而提供与源也呈三维区域的三维耦合。 形成第三维的浮动栅的腿或侧壁提供了增加源极和浮动栅极之间的耦合的额外区域。 以这种方式，在不增加电池尺寸的同时实现更高的耦合比，同时通过沿着侧壁共享栅极电压来减轻源极区域的穿通和结断流。

公开(公告)号：US06902978B2

公开(公告)日：2005-06-07

申请号：US10929396

申请日：2004-08-31

申请人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

发明人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

IPC分类号： H01L21/28 ,  H01L21/336 ,  H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788

CPC分类号： H01L27/11521 ,  H01L21/28273 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66553 ,  H01L29/7885

摘要： A method of making the selection gate in a split-gate flash EEPROM cell forms a selection gate on a trench sidewall of a semiconductor substrate to minimize the sidewise dimension of the selection gate and to maintain the channel length. The disclosed method includes the steps of: forming a trench on a semiconductor substrate on one side of a suspending gate structure; forming an inter polysilicon dielectric layer on the sidewall of the suspending gate structure and the trench; and forming a polysilicon spacer on the inter polysilicon dielectric layer as the selection gate. Such a split-gate flash EEPROM cell can produce ballistic hot electrons, improving the data writing efficiency and lowering the writing voltage.

摘要翻译： 在分裂栅极快闪EEPROM单元中形成选择栅极的方法在半导体衬底的沟槽侧壁上形成选择栅极，以最小化选择栅极的侧向尺寸并保持沟道长度。 所公开的方法包括以下步骤：在悬挂栅结构的一侧上的半导体衬底上形成沟槽; 在悬挂栅结构和沟槽的侧壁上形成多晶硅间介质层; 以及在多晶硅间介质层上形成多晶硅间隔物作为选择栅极。 这种分裂栅极快速EEPROM电池可以产生弹道热电子，提高数据写入效率并降低写入电压。

公开(公告)号：US20050029575A1

公开(公告)日：2005-02-10

申请号：US10929396

申请日：2004-08-31

申请人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

发明人： Wen-Ting Chu ,  Jack Yeh ,  Chrong-Jung Lin

IPC分类号： H01L21/28 ,  H01L21/336 ,  H01L21/8247 ,  H01L27/115 ,  H01L29/423 ,  H01L29/788 ,  H01L29/76 ,  H01L31/062 ,  H01L31/119

CPC分类号： H01L27/11521 ,  H01L21/28273 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66553 ,  H01L29/7885

摘要： A method of making the selection gate in a split-gate flash EEPROM cell forms a selection gate on a trench sidewall of a semiconductor substrate to minimize the sidewise dimension of the selection gate and to maintain the channel length. The disclosed method includes the steps of: forming a trench on a semiconductor substrate on one side of a suspending gate structure; forming an inter polysilicon dielectric layer on the sidewall of the suspending gate structure and the trench; and forming a polysilicon spacer on the inter polysilicon dielectric layer as the selection gate. Such a split-gate flash EEPROM cell can produce ballistic hot electrons, improving the data writing efficiency and lowering the writing voltage.

公开(公告)号：US07417278B2

公开(公告)日：2008-08-26

申请号：US11122726

申请日：2005-05-05

申请人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

发明人： Chia-Ta Hsieh ,  Yai-Fen Lin ,  Di-Son Kuo ,  Hung-Cheng Sung ,  Jack Yeh

IPC分类号： H01L29/788

CPC分类号： H01L27/11521 ,  H01L27/115 ,  H01L29/42324 ,  H01L29/66825 ,  H01L29/7885

摘要： A split-gate flash memory cell having a three-dimensional source capable of three-dimensional coupling with the floating gate of the cell, as well as a method of forming the same are provided. This is accomplished by first forming an isolation trench, lining it with a conformal oxide, then filling with an isolation oxide and then etching the latter to form a three-dimensional coupling region in the upper portion of the trench. A floating gate is next formed by first filling the three-dimensional region of the trench with polysilicon and etching it. The control gate is formed over the floating gate with an intervening inter-poly oxide. The floating gate forms legs extending into the three-dimensional coupling region of the trench thereby providing a three-dimensional coupling with the source which also assumes a three-dimensional region. The leg or the side-wall of the floating gate forming the third dimension provides the extra area through which coupling between the source and the floating gate is increased. In this manner, a higher coupling ratio is achieved without an increase in the cell size while at the same time alleviating the punchthrough and junction break-down of source region by sharing gate voltage along the side-wall.

摘要翻译： 提供具有能够与电池的浮动栅极三维耦合的三维源的分裂栅极闪存单元及其形成方法。 这是通过首先形成隔离沟槽，用共形氧化物衬里，然后用隔离氧化物填充，然后对其进行蚀刻，以在沟槽的上部形成三维耦合区域。 接下来通过用多晶硅填充沟槽的三维区域并对其进行蚀刻来形成浮栅。 控制栅极通过中间多晶硅氧化物形成在浮动栅上。 浮栅形成延伸到沟槽的三维耦合区域中的支腿，从而提供与源也呈三维区域的三维耦合。 形成第三维的浮动栅的腿或侧壁提供了增加源极和浮动栅极之间的耦合的额外区域。 以这种方式，在不增加电池尺寸的同时实现更高的耦合比，同时通过沿着侧壁共享栅极电压来减轻源极区域的穿通和结断流。

公开(公告)号：US20060247643A1

公开(公告)日：2006-11-02

申请号：US11117704

申请日：2005-04-29

申请人： Mohit Bhatnagar ,  Jack Yeh ,  James Sack ,  Richard Woods

发明人： Mohit Bhatnagar ,  Jack Yeh ,  James Sack ,  Richard Woods

IPC分类号： A61B17/84 ,  A61F2/44

CPC分类号： A61B17/0642 ,  A61B17/0682 ,  A61B17/10 ,  A61B2017/0409 ,  A61B2017/0419 ,  A61F2/4611 ,  A61F2002/30131 ,  A61F2002/30841 ,  A61F2002/4435 ,  A61F2002/4627 ,  A61F2230/0013

摘要： A repair system including a closure prosthesis and deployment device, and associated methods for repairing any imperfection including a flaw, hole, tear, bulge, or, in some cases, a deliberate cut or incision in any tissue including an intervertebral disc. The prosthesis has first and second side portions with a connecting central portion, and is designed to span an imperfection with opposite ends positioned on opposite sides of the imperfection. The prosthesis may include anchoring features including barbs and/or members that extend transversely. The deployment device can include a canula for positioning the prosthesis near the imperfection, and, in some cases, a mechanism that may cause the two sides of the prosthesis to be deployed in a specific order.

摘要翻译： 包括闭合假体和展开装置的修复系统以及用于修复任何缺陷的相关方法，所述缺陷包括缺陷，孔，撕裂，凸起，或在某些情况下，在包括椎间盘的任何组织中的有意切割或切口。 假体具有连接中心部分的第一和第二侧部，并且被设计成跨越位于不完美的相对侧上的相对端的缺陷。 假体可以包括锚固特征，包括横向延伸的倒钩和/或构件。 展开装置可以包括用于在假体附近定位假体的套管，并且在一些情况下可以包括可以使假体的两侧以特定顺序部署的机构。