摘要:
A mask assembly includes a frame including an opening part; and unit masks that are disposed on the opening part and having both ends of each of the unit masks supported by the frame in the state where tensile force is applied in one direction, each of the unit masks including: pattern opening parts disposed in the one direction; and a first groove disposed adjacent to the pattern opening parts and between the pattern opening parts and an edge of the unit mask, and formed to be depressed from a surface of the unit mask.
摘要:
A mask assembly includes a frame including an opening part; and unit masks that are disposed on the opening part and having both ends of each of the unit masks supported by the frame in the state where tensile force is applied in one direction, each of the unit masks including: pattern opening parts disposed in the one direction; and a first groove disposed adjacent to the pattern opening parts and between the pattern opening parts and an edge of the unit mask, and formed to be depressed from a surface of the unit mask.
摘要:
A mask frame assembly for thin film deposition includes a frame including an opening portion, and a plurality of unit mask strips that are fixed to the frame after a tensile force is applied to both of end portions of the unit mask strips in a lengthwise direction of the unit mask strips. Each of the plurality of unit mask strips includes a plurality of unit masking pattern portions each including a plurality of opening patterns. Before the tensile force is applied to both of the end portions of the unit mask strips in the lengthwise direction and the unit mask strips are fixed to the frame, a width of each of the unit masking pattern portions in a widthwise direction perpendicular to the lengthwise direction increases as a function of a closeness of a portion of the unit masking pattern portion where the width is measured to a central portion of each of the unit masking pattern portions.
摘要:
A mask frame assembly for thin film deposition includes a frame including an opening portion, and a plurality of unit mask strips that are fixed to the frame after a tensile force is applied to both of end portions of the unit mask strips in a lengthwise direction of the unit mask strips. Each of the plurality of unit mask strips includes a plurality of unit masking pattern portions each including a plurality of opening patterns. Before the tensile force is applied to both of the end portions of the unit mask strips in the lengthwise direction and the unit mask strips are fixed to the frame, a width of each of the unit masking pattern portions in a widthwise direction perpendicular to the lengthwise direction increases as a function of a closeness of a portion of the unit masking pattern portion where the width is measured to a central portion of each of the unit masking pattern portions.
摘要:
A porous conducting metal oxide electrode prepared by depositing a porous conducting metal oxide film containing a conducting metal oxide film layer having a network structure of nanofibers, containing nanograins or nanoparticles, on at least one surface of a current collector, and a conducting metal oxide coating layer on the network layer of the porous conducting metal oxide through a constant current method or a cyclic voltammetric method; and a high-speed charge/discharge and ultrahigh-capacity supercapacitor using the porous conducting metal oxide electrode are provided.
摘要:
A deposition mask and a method for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of the OLED to deposit an organic EML includes an opening and an indentation. The opening is opened so as to deposit the organic EML. The indentation is indented a predetermined depth from a plane facing the substrate.
摘要:
A fluorene-based polymer of the following Formula (I) and electroluminescent devices using the same. wherein, R1, R2, R3 and R4 are same or different and represent hydrogen, aliphatic or alicyclic alkyl or alkoxy groups containing 1 to 22 carbon atoms, aryl or aryloxy group containing 6 to 18 carbon atoms, cyano, cyanoethyl, or an alkyl or aryl derivative of silicon, tin or germanium; X represents diacetylene, diethynyl aryl, divinylaryl group or a single bond; and n is an integer equal to or greater than 1.
摘要:
A deposition mask for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of the OLED to deposit an organic EML includes an opening and an indentation. The opening is opened so as to deposit the organic EML. The indentation is indented a predetermined depth from a plane facing the substrate.
摘要:
Disclosed are a method for forming a metal oxide pattern and a method of manufacturing a thin film transistor using the patterned metal oxide. The method for forming a metal oxide pattern includes: preparing an ink composition including at least one metal oxide precursor or metal oxide nanoparticle, and a solvent; ejecting the ink composition on a substrate to form a pattern on the substrate; and photosintering the formed pattern. Herein, the metal oxide precursor is ionic.
摘要:
A deposition mask and a method for manufacturing an organic light emitting display (OLED) using the same are provided. The deposition mask is intended for preventing an organic film from being damaged due to touching of a blocked-off portion of the mask to an emission layer (EML), or chemical transition from being generated at the organic film. For that purpose, the deposition mask stuck to a substrate of the OLED to deposit an organic EML includes an opening and an indentation. The opening is opened so as to deposit the organic EML. The indentation is indented a predetermined depth from a plane facing the substrate.