公开(公告)号：US06248509B1

公开(公告)日：2001-06-19

申请号：US09362276

申请日：1999-07-27

申请人： James E. Sanford

发明人： James E. Sanford

IPC分类号： G03B2742

CPC分类号： G03F7/70383 ,  G02B26/02 ,  G03F7/70291

摘要： A maskless exposure system for selectively exposing a photosensitive work surface, such as a photoresist layer, includes a semiconductor substrate having an elongated aperture. A series of shutters and associated guides are formed upon the substrate using conventional wafer processing methods. The shutters move between a first position covering the aperture and a second position exposing the aperture. A corresponding series of computer-controlled actuators, in the form of electromagnetic coils, cooperate with the shutters for selectively sliding each shutter between its first and second positions. A light beam is directed toward the aperture, and the shutters create a patterned light beam exiting the aperture. A computer-controlled stepper is synchronized with the shutter actuators and adjusts the relationship between the patterned light beam and the photosensitive work surface to direct the patterned light beam at different portions of the work material.

摘要翻译： 用于选择性地曝光光敏性工作表面（例如光致抗蚀剂层）的无掩模曝光系统包括具有细长孔的半导体衬底。 使用常规的晶片处理方法在基板上形成一系列百叶窗和相关的导向件。 百叶窗在覆盖孔的第一位置和暴露孔之间的第二位置之间移动。 电磁线圈形式的相应的一系列计算机控制致动器与快门配合，用于在其第一和第二位置之间选择性地滑动每个活门。 光束被引向孔，并且快门形成离开孔的图案化光束。 计算机控制的步进器与快门致动器同步，并调整图案化光束和感光工作表面之间的关系，以将图案化的光束引导到工件材料的不同部分。

公开(公告)号：US5456627A

公开(公告)日：1995-10-10

申请号：US148906

申请日：1993-12-20

申请人： Paul D. Jackson ,  Stephen C. Schultz ,  James E. Sanford ,  Glen Ong ,  Richard B. Rice ,  Parag S. Modi ,  John G. Baca

发明人： Paul D. Jackson ,  Stephen C. Schultz ,  James E. Sanford ,  Glen Ong ,  Richard B. Rice ,  Parag S. Modi ,  John G. Baca

IPC分类号： B24B49/18 ,  B24B53/007 ,  B24B53/017 ,  B24B53/02

CPC分类号： B24B53/017 ,  B24B49/18

摘要： An axially rotating circular polishing pad is conditioned by a rotating end effector that has an abrasion disc in contact with a polishing surface of the pad. The end effector moves along a radius of the polishing pad surface at a velocity that varies to compensate for locations on the polishing pad surface having linear velocities that are directly related to their respective radii. A desired contact force is maintained between the end effector and the polishing pad surface.

摘要翻译： 轴向旋转的圆形抛光垫由旋转的末端执行器调节，旋转末端执行器具有与垫的抛光表面接触的磨盘。 末端执行器沿着抛光垫表面的半径以改变的速度移动，以补偿抛光垫表面上的具有与其相应半径直接相关的线速度的位置。 在末端执行器和抛光垫表面之间保持期望的接触力。

公开(公告)号：US07106493B2

公开(公告)日：2006-09-12

申请号：US10224882

申请日：2002-08-20

申请人： James E. Sanford

发明人： James E. Sanford

IPC分类号： G02B26/08

CPC分类号： F16K99/0001 ,  F15C5/00 ,  F16K99/0011 ,  F16K99/0028 ,  F16K99/0046 ,  F16K2099/0074 ,  F16K2099/008 ,  G02B26/004 ,  G02B26/02 ,  G03F7/70291 ,  G03F7/70383

摘要： A valve device formed of MEMS devices includes a generally-planar semiconductor substrate having one or more apertures to provide passages for fluids, gases, or light. Movable gate elements alternately cover or expose such apertures to either block or open such passages. Actuators in the form of miniature electromagnets repel or attract the gate elements to open or close the passages. The valve device may be used to control fluid delivery systems dispensing pressurized fluid, or in aspiration systems used to suction fluids. Alternatively, the gate elements may serve as light valves for selectively passing light from a light source through the substrate to a light-responsive surface.

公开(公告)号：US06436610B2

公开(公告)日：2002-08-20

申请号：US09866371

申请日：2001-05-25

申请人： James E. Sanford

发明人： James E. Sanford

IPC分类号： G03C500

CPC分类号： G03F7/70383 ,  G02B26/02 ,  G03F7/70291

摘要： A maskless exposure system for selectively exposing a photosensitive work surface, such as a photoresist layer, includes a semiconductor substrate having an elongated aperture. A series of shutters and associated guides are formed upon the substrate using conventional wafer processing methods. The shutters move between a first position covering the aperture and a second position exposing the aperture. A corresponding series of computer-controlled actuators, in the form of electromagnetic coils, cooperate with the shutters for selectively sliding each shutter between its first and second positions. A light beam is directed toward the aperture, and the shutters create a patterned light beam exiting the aperture. A computer-controlled stepper is synchronized with the shutter actuators and adjusts the relationship between the patterned light beam and the photosensitive work surface to direct the patterned light beam at different portions of the work material.

摘要翻译： 用于选择性地曝光光敏性工作表面（例如光致抗蚀剂层）的无掩模曝光系统包括具有细长孔的半导体衬底。 使用常规的晶片处理方法在基板上形成一系列百叶窗和相关的导向件。 百叶窗在覆盖孔的第一位置和暴露孔之间的第二位置之间移动。 电磁线圈形式的相应的一系列计算机控制致动器与快门配合，用于在其第一和第二位置之间选择性地滑动每个活门。 光束被引向孔，并且快门形成离开孔的图案化光束。 计算机控制的步进器与快门致动器同步，并调整图案化光束和感光工作表面之间的关系，以将图案化的光束引导到工件材料的不同部分。