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11 条记录 (耗时 0.014 秒)

    Substrate carrier having a streamlined shape and method for thin film formation
    1.
    发明授权
    Substrate carrier having a streamlined shape and method for thin film formation 失效

    公开(公告)号：US5814561A

    公开(公告)日：1998-09-29

    申请号：US799871

    申请日：1997-02-14

    申请人： Paul D. Jackson

    发明人： Paul D. Jackson

    IPC分类号： H01L21/687 ,  H01L21/44

    CPC分类号： H01L21/68735

    摘要： A structure for chemical vapor deposition processing includes a substrate carrier (10) having a streamlined shape. When placed in a mainstream flow (21), the substrate carrier (10) maintains a laminar boundary layer over a substrate (17) under high gas flow rate conditions. In a further embodiment, the substrate carrier (10) includes a device (27) for directly injecting a reactant gas stream (33) into the boundary layer.

    Dual-dipole electrostatic air filter
    2.
    发明授权
    Dual-dipole electrostatic air filter 失效
    双偶极静电空气过滤器

    公开(公告)号：US4902306A

    公开(公告)日：1990-02-20

    申请号：US230075

    申请日：1988-08-09

    申请人： Gilbert W. Burnett ,  Paul D. Jackson

    发明人： Gilbert W. Burnett ,  Paul D. Jackson

    IPC分类号： B03C3/155

    CPC分类号： B03C3/155 ,  Y10S55/31 ,  Y10S55/45

    摘要： A filter assembly (10) for removing particulate matter from air forced therethrough comprises two pairs of oppositely charged woven electrostatic filtering material. Each pair of electrostatic filtering material comprises a positively charged and a negatively charged layer (22, 24, 28 and 30). An open cell foam layer (26) is disposed between the two pairs. Metal grids (20,32) enclose the filtering elements.

    摘要翻译： 用于从强制通过的空气中除去颗粒物的过滤器组件（10）包括两对带有相反电荷的织造静电过滤材料。 每对静电过滤材料包括带正电荷和带负电荷的层（22,24,28和30）。 开放泡沫层（26）设置在两对之间。 金属网格（20,32）包围过滤元件。

    Four-sided air filter
    3.
    发明授权
    Four-sided air filter 失效
    四面空气过滤器

    公开(公告)号：US4749390A

    公开(公告)日：1988-06-07

    申请号：US19002

    申请日：1987-02-26

    申请人： Gilbert W. Burnett ,  Paul D. Jackson

    发明人： Gilbert W. Burnett ,  Paul D. Jackson

    IPC分类号： B01D46/12 ,  B01D46/30 ,  B01D50/00

    CPC分类号： B01D46/12 ,  B01D46/30 ,  Y10S55/31

    摘要： A filtering unit (10) has four filter holders (20) arranged in a rectangle around a blower (36). Each filter holder holds up to two filter elements (11). The blower draws air through the filter elements (11) and outputs filtered air through a vent (40). Refillable filter frames (16) are provided to allow the user to change the filter material (18). In one embodiment, glass chips are used as the filter material (18).

    摘要翻译： 过滤单元（10）具有围绕鼓风机（36）布置成矩形的四个过滤器保持器（20）。 每个过滤器支架最多可容纳两个过滤元件（11）。 鼓风机通过过滤元件（11）吸入空气，并通过排气口（40）输出经过滤的空气。 提供可再填充过滤器框架（16）以允许使用者改变过滤材料（18）。 在一个实施例中，使用玻璃碎片作为过滤材料（18）。

    Substrate carrier having a streamlined shape and method for thin film formation
    4.
    发明授权
    Substrate carrier having a streamlined shape and method for thin film formation 失效
    具有流线形状的基板载体和用于薄膜形成的方法

    公开(公告)号：US5944904A

    公开(公告)日：1999-08-31

    申请号：US95191

    申请日：1998-06-10

    申请人： Paul D. Jackson

    发明人： Paul D. Jackson

    IPC分类号： H01L21/687 ,  C23C16/00

    CPC分类号： H01L21/68735

    摘要： A structure for chemical vapor deposition processing includes a substrate carrier (10) having a streamlined shape. When placed in a mainstream flow (21), the substrate carrier (10) maintains a laminar boundary layer over a substrate (17) under high gas flow rate conditions. In a further embodiment, the substrate carrier (10) includes a device (27) for directly injecting a reactant gas stream (33) into the boundary layer.

    摘要翻译： 用于化学气相沉积处理的结构包括具有流线型形状的衬底载体（10）。 当放置在主流（21）中时，衬底载体（10）在高气体流量条件下在衬底（17）上保持层流边界层。 在另一实施例中，衬底载体（10）包括用于将反应气流（33）直接注入边界层的装置（27）。

    METHOD OF MAKING A CRIMP CONNECTION
    9.
    发明申请
    METHOD OF MAKING A CRIMP CONNECTION 审中-公开

    公开(公告)号：US20180274702A1

    公开(公告)日：2018-09-27

    申请号：US15920668

    申请日：2018-03-14

    申请人： PAUL D. JACKSON

    发明人： PAUL D. JACKSON

    IPC分类号： F16L13/14

    CPC分类号： F16L13/141 ,  F16L13/146

    摘要： A method of making a crimp connection comprises sliding a crimp ring over a female end of a pipe or tube, the crimp ring having an oval shape; inserting a male end of a fitting into the female end of the pipe or tube; sliding the crimp ring toward the fitting such that the crimp ring at least partly overlaps the inserted male end of the fitting; and applying a compressive force to an exterior surface of the crimp ring. Prior to applying the compressive force, the crimp ring has a first inner diameter and a second inner diameter transverse to the first inner diameter. The first inner diameter is greater than the second inner diameter. The first inner diameter is greater than an outer diameter of the pipe or tube. The second inner diameter is less than the outer diameter of the pipe or tube.

    Apparatus and method for polishing a substrate
    10.
    发明授权
    Apparatus and method for polishing a substrate 失效
    用于抛光衬底的装置和方法

    公开(公告)号：US06241591B1

    公开(公告)日：2001-06-05

    申请号：US09418819

    申请日：1999-10-15

    申请人： Paul D. Jackson ,  E. Terry Lisi ,  Lee A. Reeves

    发明人： Paul D. Jackson ,  E. Terry Lisi ,  Lee A. Reeves

    IPC分类号： B24B500

    CPC分类号： B24B37/32

    摘要： In one embodiment, a polishing apparatus (10) includes a retaining ring (12), a pressure ring (16), a first seal (18), and a second seal (20). The retaining ring (12) is movably attached to the pressure ring (16) to create a uniform pressure distribution across the retaining ring (12). In addition a positive fluid pressure is applied to the first seal (18) and the second seal (20) to create the uniform pressure distribution across the retaining ring (12). The uniform pressure distribution across the retaining ring (16) allows a semiconductor substrate (51), polished with the polishing apparatus (10), to have a reduced edge exclusion, and thus increased die yield.

    摘要翻译： 在一个实施例中，抛光装置（10）包括保持环（12），压力环（16），第一密封件（18）和第二密封件（20）。 保持环（12）可移动地附接到压力环（16），以在保持环（12）上形成均匀的压力分布。 此外，积极的流体压力被施加到第一密封件（18）和第二密封件（20）上以在保持环（12）上形成均匀的压力分布。 跨越保持环（16）的均匀的压力分布允许用抛光装置（10）抛光的半导体衬底（51）具有减小的边缘排除，从而提高了模具产量。