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    Systems and methods for relative positioning
    1.
    发明授权
    Systems and methods for relative positioning 有权
    用于相对定位的系统和方法

    公开(公告)号：US08582195B2

    公开(公告)日：2013-11-12

    申请号：US13306261

    申请日：2011-11-29

    申请人： James Gerard Lopez ,  Mark Allen Cheverton

    发明人： James Gerard Lopez ,  Mark Allen Cheverton

    IPC分类号： G02B26/00 ,  B64D39/00

    CPC分类号： G01S5/16

    摘要： Systems and methods for generating a position reference grid and relative positioning of an object are presented. Radiation is emitted towards a digital micro-mirror device including a plurality of micro-mirrors. Additionally, one or more of a plurality of micro-mirrors are modulated such that at least a portion of the radiation reflected from the plurality of micro-mirrors is projected on to a designated location in a designated pattern representative of a position reference grid. The radiation reflected from the plurality of micro-mirrors is detected. Further, the detected radiation is interpreted as location coordinates in the position reference grid. Additionally, the location coordinates are communicated to the object moving in relation to the digital micro-mirror device for positioning the object at a designated position in the position reference grid.

    摘要翻译： 提出了用于生成位置参考网格和对象的相对定位的系统和方法。 向包括多个微镜的数字微镜装置发射辐射。 此外，多个微反射镜中的一个或多个被调制成使得从多个微反射镜反射的辐射的至少一部分以指示的位置投影到指定位置，该图案指示位置参考网格。 检测从多个微反射镜反射的辐射。 此外，检测到的辐射被解释为位置参考网格中的位置坐标。 另外，位置坐标被传送到相对于数字微镜装置移动的物体，用于将物体定位在位置参考网格中的指定位置。

    SYSTEMS AND METHODS FOR RELATIVE POSITIONING
    2.
    发明申请
    SYSTEMS AND METHODS FOR RELATIVE POSITIONING 有权
    相对定位系统与方法

    公开(公告)号：US20130135707A1

    公开(公告)日：2013-05-30

    申请号：US13306261

    申请日：2011-11-29

    申请人： James Gerard Lopez ,  Mark Allen Cheverton

    发明人： James Gerard Lopez ,  Mark Allen Cheverton

    IPC分类号： G02B26/00

    CPC分类号： G01S5/16

    摘要： Systems and methods for generating a position reference grid and relative positioning of an object are presented. Radiation is emitted towards a digital micro-mirror device including a plurality of micro-mirrors. Additionally, one or more of a plurality of micro-mirrors are modulated such that at least a portion of the radiation reflected from the plurality of micro-mirrors is projected on to a designated location in a designated pattern representative of a position reference grid. The radiation reflected from the plurality of micro-mirrors is detected. Further, the detected radiation is interpreted as location coordinates in the position reference grid. Additionally, the location coordinates are communicated to the object moving in relation to the digital micro-mirror device for positioning the object at a designated position in the position reference grid.

    摘要翻译： 提出了用于生成位置参考网格和对象的相对定位的系统和方法。 向包括多个微镜的数字微镜装置发射辐射。 此外，多个微反射镜中的一个或多个被调制成使得从多个微反射镜反射的辐射的至少一部分以指示的位置投影到指定位置，该图案指示位置参考网格。 检测从多个微反射镜反射的辐射。 此外，检测到的辐射被解释为位置参考网格中的位置坐标。 另外，位置坐标被传送到相对于数字微镜装置移动的物体，用于将物体定位在位置参考网格中的指定位置。

    METHODS FOR APPLYING FIXED IMAGES TO ELECTROCHEMICAL DEVICES
    3.
    发明申请
    METHODS FOR APPLYING FIXED IMAGES TO ELECTROCHEMICAL DEVICES 审中-公开
    将固定图像应用于电化学装置的方法

    公开(公告)号：US20140037857A1

    公开(公告)日：2014-02-06

    申请号：US13562622

    申请日：2012-07-31

    申请人： Mark Allen Cheverton ,  Neil Anthony Johnson

    发明人： Mark Allen Cheverton ,  Neil Anthony Johnson

    IPC分类号： B05D5/12 ,  C23C16/50 ,  B41J2/01 ,  C23C4/12

    CPC分类号： C04B41/87 ,  C04B41/009 ,  C04B41/5031 ,  C04B2111/00853 ,  C23C4/02 ,  H01M2/145 ,  H01M2/18 ,  H01M10/399 ,  C04B35/10 ,  C04B41/4539 ,  C04B41/4572 ,  C04B41/4578 ,  C04B2103/54

    摘要： A method for applying a fixed image onto at least one surface of a component in an electrochemical device is described. The component is usually formed of an alumina material. An image-forming material is first applied onto the component surface in its green state. The mark or image is applied in a desired pattern by an additive process, such as direct-write or screen-printing. The component is then heated at a sintering temperature sufficient to ensure conversion from the green state into a fired ceramic state. The sintering temperatures are also sufficient to fix the image upon the surface of the component. The image can be read by the human eye, or by various machine-readable techniques. Related methods for monitoring the location and status of a ceramic electrochemical cell component during its manufacture and during other processing steps are also described.

    摘要翻译： 描述了将固定图像施加到电化学装置中的部件的至少一个表面上的方法。 该组分通常由氧化铝材料形成。 首先将图像形成材料以其绿色状态施加到部件表面上。 标记或图像通过添加过程（例如直写或丝网印刷）以期望的图案施加。 然后将该组分在足以确保从绿色状态转变为烧制陶瓷状态的烧结温度下加热。 烧结温度也足以将图像固定在部件的表面上。 该图像可以由人眼读取，或者通过各种机器可读技术读取。 还描述了在其制造期间和在其它加工步骤期间监测陶瓷电化学电池组件的位置和状态的相关方法。

    Integrated inspection system and defect correction method
    7.
    发明授权
    Integrated inspection system and defect correction method 失效
    综合检测系统和缺陷校正方法

    公开(公告)号：US07371590B2

    公开(公告)日：2008-05-13

    申请号：US11285331

    申请日：2005-11-21

    申请人： Kevin Patrick Capaldo ,  Mark Allen Cheverton ,  Dennis Joseph Coyle ,  Michael John Davis ,  Sameer Kirti Talsania ,  Masako Yamada ,  Chung-hei Yeung

    发明人： Kevin Patrick Capaldo ,  Mark Allen Cheverton ,  Dennis Joseph Coyle ,  Michael John Davis ,  Sameer Kirti Talsania ,  Masako Yamada ,  Chung-hei Yeung

    IPC分类号： H01L21/66

    CPC分类号： G01N21/95 ,  G01N21/8422 ,  G01N21/8806

    摘要： A system for the inspection of and a process for the correction of defects in a microreplicated optical display film manufacturing process. The process steps of manufacturing a master, a plurality of shims from the master, and a multiplicity of display films from each shim are integrated with a systemic defect identification and correction process. Each primary manufacturing step has its own inspection system and correction process where defect information for that step of the process is fed back and analyzed; and from that analysis the subprocess is adjusted to eliminate or reduce the detected defect. The systemic defect is identified as to its source and then fed back and analyzed in the correction step of the respective subprocess in order to cure the root of the defect.

    摘要翻译： 用于微复制光学显示膜制造工艺中的缺陷校正的检查系统和校正处理。 制造主机，来自主机的多个垫片以及来自每个垫片的多个显示胶片的工艺步骤与系统缺陷识别和校正处理相结合。 每个主要制造步骤都有自己的检测系统和校正过程，其中反馈和分析该过程的缺陷信息; 并从该分析中调整子过程以消除或减少检测到的缺陷。 将系统缺陷确定为其源，然后在相应子过程的校正步骤中反馈并分析，以固化缺陷的根部。