Methods for monitoring processing equipment
    1.
    发明授权
    Methods for monitoring processing equipment 有权
    监测加工设备的方法

    公开(公告)号:US08473247B2

    公开(公告)日:2013-06-25

    申请号:US12915260

    申请日:2010-10-29

    CPC分类号: H01L21/67276

    摘要: Methods for monitoring processing equipment are provided herein. In some embodiments, a method for monitoring processing equipment when in an idle state for a period of idle time may include selecting a test from a list of a plurality of tests to perform on the processing equipment when the processing equipment is in the idle state, wherein the test has a total run time; starting the selected test; comparing a remaining idle time of the period of idle time to a remaining run time of the total run time as the selected test is performed; and determining whether to end the selected test prior to completing the total run time in response to the comparison.

    摘要翻译: 本文提供了监控处理设备的方法。 在一些实施例中,一种用于在空闲状态下监视处理设备一段空闲时间的方法可以包括:当处理设备处于空闲状态时,从处理设备执行的多个测试的列表中选择一个测试, 其中所述测试具有总运行时间; 开始选择测试; 将执行所选择的测试的空闲时间的剩余空闲时间与总运行时间的剩余运行时间进行比较; 以及响应于所述比较,确定在完成所述总运行时间之前是否结束所选择的测试。

    Methods for processing substrates in process systems having shared resources
    2.
    发明授权
    Methods for processing substrates in process systems having shared resources 有权
    在具有共享资源的处理系统中处理衬底的方法

    公开(公告)号:US08496756B2

    公开(公告)日:2013-07-30

    申请号:US12915240

    申请日:2010-10-29

    IPC分类号: B08B6/00

    CPC分类号: H01L21/6719 H01J37/32899

    摘要: Methods for processing substrates in twin chamber processing systems having first and second process chambers and shared processing resources are provided herein. In some embodiments, a method may include flowing a process gas from a shared gas panel to a processing volume of the first process chamber and to a processing volume of the second process chamber; forming a first plasma in the first processing volume to process the first substrate and a second plasma to process the second substrate; monitoring the first processing volume and the second processing volume to determine if a process endpoint is reached in either volume; and either terminating the first and second plasma simultaneously when a first endpoint is reached; or terminating the first plasma when a first endpoint is reached in the first processing volume while continuing to provide the second plasma in the second processing volume until a second endpoint is reached.

    摘要翻译: 本文提供了具有第一处理室和第二处理室以及共享处理资源的双室处理系统中处理基板的方法。 在一些实施例中,一种方法可以包括将处理气体从共用气体面板流动到第一处理室的处理容积和第二处理室的处理容积; 在所述第一处理体积中形成第一等离子体以处理所述第一基板和第二等离子体以处理所述第二基板; 监测第一处理量和第二处理量以确定任一体积中是否达到过程终点; 并且当达到第一端点时同时终止第一和第二等离子体; 或在第一处理容积中达到第一端点时终止第一等离子体,同时继续在第二处理容积中提供第二等离子体直到达到第二端点。

    Methods for processing substrates in a dual chamber processing system having shared resources
    5.
    发明授权
    Methods for processing substrates in a dual chamber processing system having shared resources 失效
    在具有共享资源的双室处理系统中处理基板的方法

    公开(公告)号:US08097088B1

    公开(公告)日:2012-01-17

    申请号:US13088791

    申请日:2011-04-18

    IPC分类号: B08B5/00

    摘要: Methods for processing substrates in dual chamber processing systems comprising first and second process chambers that share resources may include performing a first internal chamber clean in each of the first process chamber and the second process chamber; and subsequently processing a substrate in one of the first process chamber or the second process chamber by: providing a substrate to one of the first process chamber or the second process chamber; providing a process gas to the first process chamber and the second process chamber; forming a plasma in only the one of the first process chamber or the second process chamber having the substrate contained therein; and providing an inert gas to the first process chamber and the second process chamber via one or more channels formed in a surface of respective substrate supports disposed in the first process chamber and the second process chamber while processing the substrate.

    摘要翻译: 在包括共享资源的第一和第二处理室的双室处理系统中处理衬底的方法可以包括在第一处理室和第二处理室中的每一个中执行第一内室清洁; 并且随后通过以下步骤来处理第一处理室或第二处理室之一中的衬底:将衬底提供到第一处理室或第二处理室中的一个; 向所述第一处理室和所述第二处理室提供处理气体; 仅在其中包含基板的第一处理室或第二处理室中的一个中形成等离子体; 以及通过形成在设置在第一处理室和第二处理室中的相应基板支撑件的表面中的一个或多个通道,在处理基板的同时,向第一处理室和第二处理室提供惰性气体。

    Ballistic projectile velocity measurement apparatus

    公开(公告)号:US11442075B2

    公开(公告)日:2022-09-13

    申请号:US16750161

    申请日:2020-01-23

    申请人: Charles Hardy

    发明人: Charles Hardy

    IPC分类号: G01P3/36 G01P3/68 G01S17/00

    摘要: The present disclosure relates to a ballistic projectile velocity measurement apparatus that senses and records the times in which a projectile travels through two vertical planes represented by two sensor gates which are spaced horizontally from each other. The sensor gates each utilize an LED laser that emits a laser light through a diffuser along a diffusion angle into a plurality of laser light sensors to create a wall of laser light, and the sensor gates register a break in the wall of light when a ballistic projectile obstructs the light received by at least one laser light sensor. The ballistics apparatus then determines the velocity of the projectile based on the distance between the two gates and difference in time between the two plane-breaking events.

    BALLISTIC PROJECTILE VELOCITY MEASUREMENT APPARATUS

    公开(公告)号:US20210080481A1

    公开(公告)日:2021-03-18

    申请号:US16750161

    申请日:2020-01-23

    申请人: Charles Hardy

    发明人: Charles Hardy

    IPC分类号: G01P3/68

    摘要: The present disclosure relates to a ballistic projectile velocity measurement apparatus that senses and records the times in which a projectile travels through two vertical planes represented by two sensor gates which are spaced horizontally from each other. The sensor gates each utilize an LED laser that emits a laser light through a diffuser along a diffusion angle into a plurality of laser light sensors to create a wall of laser light, and the sensor gates register a break in the wall of light when a ballistic projectile obstructs the light received by at least one laser light sensor. The ballistics apparatus then determines the velocity of the projectile based on the distance between the two gates and difference in time between the two plane-breaking events.

    Apparatus and method for deodorizing confined air spaces which utilize baking soda
    9.
    发明申请
    Apparatus and method for deodorizing confined air spaces which utilize baking soda 审中-公开
    使用小苏打除臭密闭空气的设备和方法

    公开(公告)号:US20070065332A1

    公开(公告)日:2007-03-22

    申请号:US11599975

    申请日:2006-11-15

    IPC分类号: A61L9/00

    摘要: Apparatus and methods for removing malodor from the air, particularly from confined spaces are disclosed. Such devices and methods are useful for example for storing and preserving food in closed compartments such as refrigerators. The apparatus and methods utilize baking soda as the odor removing substance, either alone, or in combination with another odor removing substance, which may include activated carbon. In one embodiment, the apparatus has a detachable cartridge member which contains baking soda. In one version of this embodiment, the detachable cartridge member is used with an air moving member that draws air through the detachable cartridge member. In one embodiment, the method involves using a detachable cartridge member with an air moving member in one confined space, and using another cartridge member without the air moving member in another compartment of the confined space. In another embodiment, may also be used for emitting a scent, or other substance (including, but not limited to insecticides, air fresheners, deodorants, aromacology, aromatherapy, or any other odor that acts to condition, modify, or otherwise charge the atmosphere or to modify the environment) into the air.

    摘要翻译: 公开了用于从空气中除去恶臭的装置和方法,特别是从密闭空间中去除恶臭。 这种装置和方法可用于例如用于在诸如冰箱的封闭隔室中储存和保存食物。 该装置和方法单独使用小苏打作为除臭物质,或者与可以包括活性炭的另一除臭物质组合使用。 在一个实施例中,该装置具有包含小苏打的可拆卸的盒构件。 在该实施例的一个版本中,可拆卸的盒构件与空气移动构件一起使用,空气移动构件通过可拆卸的盒构件吸入空气。 在一个实施例中,该方法包括在一个密闭的空间中使用具有空气移动构件的可拆卸的盒构件,并且在密闭空间的另一隔室中使用没有空气移动构件的另一个盒构件。 在另一个实施方案中,还可以用于发出香味或其它物质(包括但不限于杀虫剂,空气清新剂,除臭剂,芳香剂,芳香疗法或用于调节,改变或以其他方式对气氛充电的任何其它气味 或修改环境)进入空气。