摘要:
A hanger assembly for securing insulation or refractory linings to walls includes a circular stud which includes a flattened locking section of relatively short axial extent forming laterally projecting lugs, a somewhat less flattened anti-rotation section of substantial axial extent inwardly adjacent the locking section, and an unflattened or rotation section of short axial extent inwardly adjacent the anti-rotation section, whereby a quarter-turn retaining washer may be positioned over the stud to the rotation section, rotated a quarter turn and then moved outwardly along the anti-rotation section to engage and lock against the underside of the locking section. The locking and anti-rotation sections may be repeated throughout the length of the stud by a selective flattening of round metal stock so that insulation layers of various thickness may be held to the wall without the possibility of vibration permitting the retaining washer to vibrate free of the locking section, rotate, and become disengaged from the stud.
摘要:
An analysis method for analyzing height-scanning interferometry data from a test surface, the method including: calculating a coherence profile and a phase profile for the test surface based on the data; calculating an experimental phase gap map based on a difference between the phase profile and the coherence profile; filtering the experimental phase gap map to remove noise; and using the filtered phase gap map to improve an estimate for a height profile of the test surface.
摘要:
The invention features a surface profiling method including: collecting interferometric data related to a surface profile of a measurement object; and calculating the surface profile based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object. The invention also features a surface profiling system including: an interferometry system which during operation provides interferometric data related to a surface profile of a measurement object; and an electronic processor coupled the interferometry system, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and at least one parameter indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.